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"fang jau shiung"
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| 國立成功大學 |
2016-08-16 |
Effect of annealing temperature on electrical and reliability characteristics of HfO2/porous low-k dielectric stacks
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Cheng, Yi-Lung; Kao, Kai-Chieh; Chen, Giin-Shan; Fang, Jau-Shiung; Sun, Chung-Ren; Lee, Wen-Hsi |
| 國立交通大學 |
2015-07-21T08:27:56Z |
STRUCTURES AND PROPERTIES OF THE CRYSTALLINE Si-C-N USING ADDITIONAL Si-SOURCE AND Co-CATALYST
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Chang, Hui Lin; Fang, Jau Shiung; Kuo, Cheng Tzu |
| 國立虎尾科技大學 |
2007 |
5-nm-thick TaSiC amorphous films stable up to 750 °C as a diffusion barrier for copper metallization
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Lin, Ting-Yi;Cheng, Huai-Yu;Chin, Tsung-Shune;Chiu, Chin-Fu;Fang, Jau-Shiung |
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