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Institution Date Title Author
國立交通大學 2014-12-08T15:43:20Z Surface-processing-enhanced copper diffusion into fluorosilicate glass Tsui, BY; Fang, KL; Lee, SD
國立交通大學 2014-12-08T15:40:53Z Metal drift induced electrical instability of porous low dielectric constant film Fang, KL; Tsui, BY
國立交通大學 2014-12-08T15:39:47Z Anisotropic thermal conductivity of nanoporous silica film Tsui, BY; Yang, CC; Fang, KL
國立交通大學 2014-12-08T15:37:09Z Electrical stability and reliability of ultralow dielectric constant porous carbon-doped oxide film for copper interconnect Fang, KL; Tsui, BY
國立交通大學 2014-12-08T15:27:01Z Electrical reliability issues of integrating low-K dielectrics with Cu metallization Wu, ZC; Shiung, ZW; Wang, CC; Fang, KL; Wu, RG; Liu, YL; Tsui, BY; Chen, MC; Chang, W; Chou, PF; Jang, SM; Yu, CH; Liang, MS
國立交通大學 2014-12-08T15:26:46Z Electrical reliability of low dielectric constant diffusion barrier (a-SiC : H) for copper interconnect Fang, KL; Tsui, BY; Yang, CC; Lee, SD
國立交通大學 2014-12-08T15:26:35Z Electrical and material stability of Orion(TM) CVD ultra low-k dielectric film for copper interconnection Fang, KL; Tsui, BY; Yang, CC; Chen, MC; Lee, SD; Beekmann, K; Tony, W; Giles, K; Ishaq, S
國立交通大學 2014-12-08T15:26:21Z Anisotropic thermal conductivity of nano-porous silica film Tsui, BY; Yang, CC; Fang, KL
國立交通大學 2014-12-08T15:26:19Z A novel wafer reclaim method for silicon carbide film Tsui, BY; Fang, KL; Wu, CH; Li, YH
國立交通大學 2014-12-08T15:18:11Z A novel wafer reclaim method for amorphous SiC and carbon doped oxide films Tsui, BY; Fang, KL
國立臺灣大學 2006-02 Mach-Zehnder interferometer by utilizing phase modulation of transmitted light through magnetic fluid films possessing tunable refractive index Hong, CY; Yang, SY; Fang, KL

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