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Showing items 1-4 of 4 (1 Page(s) Totally)
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| 臺大學術典藏 |
2020-06-16T06:31:26Z |
Overlay-Aware Detailed Routing for Self-Aligned Double Patterning Lithography Using the Cut Process
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Liu, Iou-Jen;Fang, Shao-Yun;Chang, Yao-Wen; Liu, Iou-Jen; Fang, Shao-Yun; Chang, Yao-Wen; YAO-WEN CHANG |
| 臺大學術典藏 |
2020-06-16T06:31:26Z |
Overlay-Aware Detailed Routing for Self-Aligned Double Patterning Lithography Using the Cut Process
|
Liu, Iou-Jen;Fang, Shao-Yun;Chang, Yao-Wen; Liu, Iou-Jen; Fang, Shao-Yun; Chang, Yao-Wen; YAO-WEN CHANG |
| 臺大學術典藏 |
2020-05-04T07:53:56Z |
Simultaneous OPC- and CMP-aware routing based on accurate closed-form modeling.
|
Fang, Shao-Yun;Lin, Chung-Wei;Liao, Guang-Wan;Chang, Yao-Wen; Fang, Shao-Yun; Lin, Chung-Wei; Liao, Guang-Wan; Chang, Yao-Wen; CHUNG-WEI LIN |
| 臺大學術典藏 |
2020-05-04T07:53:56Z |
Simultaneous OPC- and CMP-aware routing based on accurate closed-form modeling.
|
Fang, Shao-Yun;Lin, Chung-Wei;Liao, Guang-Wan;Chang, Yao-Wen; Fang, Shao-Yun; Lin, Chung-Wei; Liao, Guang-Wan; Chang, Yao-Wen; CHUNG-WEI LIN |
Showing items 1-4 of 4 (1 Page(s) Totally)
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