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Showing items 121-145 of 182  (8 Page(s) Totally)
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Institution Date Title Author
國立成功大學 2003-04-17 HfO2/HfSixOy high-K gate stack with very low leakage current for low-power poly-Si gated CMOS application Yang, Chih-Wei; Fang, Yean-Kuen; Chen, S. F.; Wang, M. F.; Hou, T. H.; Lin, Y. M.; Yao, Liang-Gi; Chen, S. C.; Liang, M. S.
國立成功大學 2003-04 High performance 12 GHz enhancement-mode pseudomorphic HEMT prepared by He plus reactive ion etching Lin, C. S.; Fang, Yean-Kuen; Ting, S. F.; Wang, C. C.; Huang, H. K.; Wu, C. L.; Chang, C. S.
國立成功大學 2003-04 Modeling of the gate leakage current reduction in MOSFET with ultra-thin nitrided gate oxide Yang, Chih-Wei; Fang, Yean-Kuen; Ting, S. F.; Chen, C. H.; Wang, W. D.; Lin, T. Y.; Wang, M. F.; Yu, M. C.; Chen, C. L.; Yao, Liang-Gi; Chen, S. C.; Yu, C. H.; Liang, M. S.
國立成功大學 2003-04 Hot-carrier-induced degradation on 0.1 mu m partially depleted silicon-on-insulator complementary metal-oxide-semiconductor field-effect-transistor Yeh, Wen-Kuan; Wang, Wen-Han; Fang, Yean-Kuen; Yang, Fu-Liang
國立成功大學 2003-03-06 Effective improvement of high-k Hf-silicate/silicon interface with thermal nitridation Yang, Chih-Wei; Fang, Yean-Kuen; Chen, Shih-Fang; Lin, Chun-Yu; Wang, Ming-Fang; Lin, Yeou-Ming; Hou, Tuo-Hung; Yao, Liang-Gi; Chen, Shih-Chang; Liang, Mong-Song
國立成功大學 2003-02 A novel etching technology with reactive ion etching system for GaAs via-hole etching applications Lin, C. S.; Fang, Yean-Kuen; Ting, S. F.; Wu, C. L.; Chang, C. S.
國立成功大學 2003-01 Improvement of short-channel characteristics of a 0.1-mu m PMOSFET with ultralow-temperature nitride spacer by using a novel oxide capped boron uphill treatment Yang, Chih-Wei; Fang, Yean-Kuen; Chen, C. H.; Wang, W. D.; Ting, S. F.; Cheng, J. Y.; Wang, M. F.; Chen, C. L.; Yao, Liang-Gi; Lee, T. L.; Chen, S. C.; Yu, C. H.; Liang, M. S.
國立成功大學 2002-12 Hot-carrier-induced degradation for partially depleted SOI 0.25-0.1 mu m CMOSFET with 2-nm thin gate oxide Yeh, Wen-Kuan; Wang, Wen-Han; Fang, Yean-Kuen; Chen, Mao-Chieh; Yang, Fu-Liang
國立成功大學 2002-12 Optimizing indium tin oxide thin films with bipolar d.c.-pulsed magnetron sputtering for electrochromic device applications Lee, William J.; Fang, Yean-Kuen; Ho, Jyh-Jier; Chen, Chin-Ying; Chen, Shin-Fu; Tsai, Rung-Ywan; Huang, Daoyang; Ho, Fang C.
國立成功大學 2002-11 Modeling of abnormal capacitance-voltage characteristics observed in MOS transistor with ultra-thin gate oxide Hsu, Yung-Lung; Fang, Yean-Kuen; Tsao, Feng-Cherng; Kuo, Fu-Jung; Ho, Yens
國立成功大學 2002-11 Improving high temperature characteristic of SiGeC/Si heterojunction diode with propane carbon source Hsieh, Wen-Tse; Fang, Yean-Kuen; Ting, Shyh-Fann; Tsair, Yong-Shiuan; Lee, William J.; Wang, H. P.
國立成功大學 2002-10 Heteroepitaxial silicon-carbide nitride films with different carbon sources on silicon substrates prepared by rapid-thermal chemical-vapor deposition Ting, Shyh-Fann; Fang, Yean-Kuen; Hsieh, Wen-Tse; Tsair, Yong-Shiuan; Chang, Chang-Nan; Lin, Chun-Sheng; Hsieh, Ming-Chun; Chiang, Hsin-Che; Ho, Jyh-Jier
國立成功大學 2002-09-26 Dramatic reduction of gate leakage current in 1.61 nm HfO2 high-k dielectric poly-silicon gate with AI(2)O(3) capping layer Yang, Chih-Wei; Fang, Yean-Kuen; Chen, Chien-Hao; Wang, Wen-De; Lin, Tin-Yu; Wang, Ming-Fang; Hou, Tuo-Hung; Cheng, Juing-Yi; Yao, Liang-Gi; Chen, Shyh-Chang; Yu, Chen-Hua; Liang, Mong-Song
國立成功大學 2002-07 Temperature dependence of hot-carrier-induced degradation in 0.1 mu m SOI nMOSFETs with thin oxide Yeh, Wen-Kuan; Wang, Wen-Han; Fang, Yean-Kuen; Yang, Fu-Liang
國立成功大學 2002-05-01 New observations on hot-carrier degradation in 0.1 mu m silicon-on-insulator n-type metal oxide semiconductor field effect transistors Yeh, Wen-Kuan; Wang, Wen-Han; Fang, Yean-Kuen; Yang, Fu-Liang
國立成功大學 2002-05 Interfacial reactions and electrical properties of Hf/p-Si0.85Ge0.15 Chung, Ming-Shaw; Wang, Ming-Jun; Lin, Wen-Tai; Chang, Tao-Chih; Fang, Yean-Kuen
國立成功大學 2002-05 Downscaling limit of equivalent oxide thickness in formation of ultrathin gate dielectric by thermal-enhanced remote plasma nitridation Chen, Chien-Hao; Fang, Yean-Kuen; Ting, Shyh-Fann; Hsieh, Wen-Tse; Yang, Chih-Wei; Hsu, Tzu-Hsuan; Yu, Mo-Chiun; Lee, Tze-Liang; Chen, Shih-Chang; Yu, Chen-Hua; Liang, Mong-Song
國立成功大學 2002-04 Organic light-emitting diode on indium zinc oxide film prepared by ion assisted deposition dc sputtering system Lee, William J.; Fang, Yean-Kuen; Ho, Jyh-Jier; Chen, Chin-Ying; Chiou, L. H.; Wang, Shui-Jinn; Dai, F; Hsieh, T; Tsai, Rung-Ywan; Huang, Daoyang; Ho, Fang C.
國立成功大學 2002-04 The 1.3-1.6 nm nitrided oxide prepared by NH3 nitridation and rapid thermal annealing for 0.1 mu m and beyond CMOS technology application Chen, Chung-Hui; Fang, Yean-Kuen; Yang, Chih-Wei; Tsair, Yong-Shiuan; Wang, Ming-Fang; Yao, Liang-Gi; Chen, S. C.; Yu, Chen-Hua; Liang, Mong-Song
國立成功大學 2002-04 Improved current drivability and poly-gate depletion of submicron PMOSFET with poly-SiGe gate and ultra-thin nitride gate dielectric Chen, Chung-Hui; Fang, Yean-Kuen; Yang, Chih-Wei; Ting, Shyh-Fann; Tsair, Yong-Shiuan; Chang, Cheng-Nan; Hou, Tuo-Hong; Wang, Ming-Fang; Yu, Mo-Chiun; Lin, Chuing-Liang; Chen, S. C.; Yu, Chen-Hua; Liang, Mong-Song
國立成功大學 2002-04 Determination of deep ultrathin equivalent oxide thickness (EOT) from measuring flat-band C-V curve Chen, Chung-Hui; Fang, Yean-Kuen; Yang, Chih-Wei; Ting, Shyh-Fann; Tsair, Yong-Shiuan; Wang, Ming-Fang; Yao, Liang-Gi; Chen, S. C.; Yu, Chen-Hua; Liang, Mong-Song
國立成功大學 2002-04 Cu3Ge Schottky contacts on n-GaN Hsin, Hui-Ching; Lin, Wen-Tai; Gong, J. R.; Fang, Yean-Kuen
國立成功大學 2002-03 A high breakdown-voltage SiCN/Si heterojunction diode for high-temperature applications Ting, Shyh-Fann; Fang, Yean-Kuen; Hsieh, Wen-Tse; Tsair, Yong-Shiuan; Chang, Cheng-Nan; Lin, Chun-Sheng; Hsieh, Ming-Chun; Chiang, Hsin-Che; Ho, Jyh-Jier
國立成功大學 2002-02 Pulsed-magnetron-sputtered low-temperature indium tin oxide films for flat-panel display applications Lee, William J.; Fang, Yean-Kuen; Ho, Jyh-Jier; Chen, Chin-Ying; Tsai, Rung-Ywan; Huang, Dao-Yang; Ho, Fang C.; Chou, H. W.; Chen, C. C.
國立成功大學 2001-12 To optimize electrical properties of the ultrathin (1.6 nm) nitride/oxide gate stacks with bottom oxide materials and post-deposition treatment Chen, Chein-Hao; Fang, Yean-Kuen; Yang, Chih-Wei; Ting, Shyh-Fann; Tsair, Yong-Shiuan; Wang, Ming-Fang; Hou, Tuo-Hong; Yu, Mo-Chiun; Chen, Shih-Chang; Jang, Syun-Ming; Yu, D. C. H.; Liang, Mong-Song

Showing items 121-145 of 182  (8 Page(s) Totally)
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