臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)

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	2019臺灣學術機構典藏研討會
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Institution	Date	Title	Author
國立成功大學	2009-05-07	Origins of flash lamp annealing induced p-n junction leakages in a 45 nm p-MOSFET with strained SiGe source/drain	Cheng, C. Y.; Fang, Yean-Kuen; Hsieh, J. C.; Hsia, H.; Lin, S. S.; Hou, C. S.; Ku, K. C.; Sheu, Y. M.
國立成功大學	2009-04	Hot-Carrier and Fowler-Nordheim (FN) Tunneling Stresses on RF Reliability of 40-nm PMOSFETs With and Without SiGe Source/Drain	Tang, Mao-Chyuan; Fang, Yean-Kuen; Chen, David C.; Yeh, Chune-Sin
國立成功大學	2009-04	Narrow Width and Length Dependence of SiGe and Sallow-Trench-Isolation Stress Induced Defects in 45 nm p-Type Metal-Oxide-Semiconductor Field-Effect Transistors with Strained SiGe Source/Drain	Cheng, Chung-Yun; Fang, Yean-Kuen; Hsieh, Jang-Cheng; Sheu, Yi-Ming; Hsia, Harry; Chen, Wei-Ming; Lin, Shyue-Shyh; Hou, Chin-Shan
國立成功大學	2008-11-21	Effect of hot carrier stress on RF reliability of 40 nm PMOSFETs with and without SiGe source/drain	Tang, Mao-Chyuan; Fang, Yean-Kuen; Wei, Sun-Chin; Chen, David C.; Yeh, Chune-Sin; Huang-Lu, Shiang
國立成功大學	2008-11-10	The influence of nitrogen incorporation on performance and bias temperature instability of metal oxide semiconductor field effect transistors with ultrathin high-k gate stacks	Liao, Jia-Ching; Fang, Yean-Kuen; Chen, C. H.; Hou, Y. T.; Hsu, P. F.; Lin, K. C.; Huang, K. T.; Lee, T. L.; Liang, M. S.
國立成功大學	2008-11	Significantly improving sub-90 nm CMOSFET performances with notch-gate enhanced high tensile-stress contact etch stop layer	Hsu, Chia-Wei; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lin, Chien-Ting
國立成功大學	2008-11	Effect of the pre-gate oxide cleaning temperature on the reliability of GOI and devices performances in deep submicron CMOS technology	Chiang, Yen-Ting; Fang, Yean-Kuen; Huang, Y. J.; Chou, T. H.; Yeh, S. Y.; Lin, C. S.
國立成功大學	2008-11	The Pd/TiO2/n-LTPS Thin-Film Schottky Diode on Glass Substrate for Hydrogen Sensing Applications	Chou, Tse-Heng; Fang, Yean-Kuen; Chiang, Yen-Ting; Lin, Kung-Cheng; Lin, Cheng-I; Kao, Chyuan-Haur; Lin, Hsiao-Yi
國立成功大學	2008-10-07	Effect of STI stress on leakage and V-ccmin of a sub-65nm node low-power SRAM	Lee, Tung-Hsing; Fang, Yean-Kuen; Chiang, Yen-Ting; Chiu, Hua-Yueh; Chen, Ming-Shing; Cheng, Osbert
國立高雄大學	2008-10	Significant improvement of 45 nm and beyond complementary metal oxide semiconductor field effect transistor performance with fully silicided and ultimate spacer process technology	Hsu, Chia-Wei; Fang, Yean-Kuen; Lin, Chien-Ting; Yeh, Wen-Kuan; Hsu, Che-Hua; Lai, Chieh-Ming; Cheng, Li-Wei; Ma, Mike
國立成功大學	2008-09-25	Improving hydrogen detecting performance of a Pd/n-LTPS/glass thin film Schottky diode with a TiO2 interface layer	Chou, Tse-Heng; Fang, Yean-Kuen; Chiang, Yen-Ting; Lin, Cheng-I; Lin, Kung-Cheng
國立成功大學	2008-09-15	A low cost n-SiCN/p-SiCN homojunction for high temperature and high gain ultraviolet detecting applications	Chou, Tse-Heng; Fang, Yean-Kuen; Chiang, Yen-Ting; Lin, Cheng-I; Yang, Che-Yun
國立成功大學	2008-09-15	GaN UV MSM photodetector on porous beta-SiC/(111)Si substrates	Chang, Shiuan-Ho; Fang, Yean-Kuen; Hsu, Kai-Chun; Wei, Tzu-Chieh
國立成功大學	2008-09-01	Significant improvement of 45 nm and beyond complementary metal oxide semiconductor field effect transistor performance with fully silicided and ultimate spacer process technology	Hsu, Chia-Wei; Fang, Yean-Kuen; Lin, Chien-Ting; Yeh, Wen-Kuan; Hsu, Che-Hua; Lai, Chieh-Ming; Cheng, Li-Wei; Ma, Mike
國立成功大學	2008-09-01	Strain effect and channel length dependence of bias temperature instability on complementary metal-oxide-semiconductor field effect transistors with high-k/SiO2 gate stacks	Liao, J. C.; Fang, Yean-Kuen; Hou, Y. T.; Hung, C. L.; Hsu, P. F.; Lin, K. C.; Huang, K. T.; Lee, T. L.; Liang, M. S.
國立成功大學	2008-08	A high current gain gate-controlled lateral bipolar junction transistor with 90 nm CMOS technology for future RF SoC applications	Chen, Shuo-Mao; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lee, I. C.; Chiang, Yen-Ting
國立高雄大學	2008-07	Significantly improving sub-90 nm CMOSFET performances with notch-gate enhanced high tensile-stress contact etch stop layer	Hsu, Chia-Wei; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lin, Chien-Ting
國立成功大學	2008-06	Investigation and modeling of hot carrier effects on performance of 45-and 55-nm NMOSFETs with RF automatic measurement	Tang, Mao-Chyuan; Fang, Yean-Kuen; Liao, Wen-Shiang; Chen, David C.; Yeh, Chune-Sin; Chien, Shan-Chieh
國立成功大學	2008-05	Dynamic negative bias temperature instability (NBTI) of low-temperature polycrystalline silicon (LTPS) thin-film transistors	Liao, J. C.; Fang, Yean-Kuen; Kao, C. H.; Cheng, C. Y.
國立成功大學	2008-05	Investigation of bulk traps enhanced gate-induced leakage current in Hf-based MOSFETs	Liao, Jia-Ching; Fang, Yean-Kuen; Hou, Y. T.; Tseng, W. H.; Hsu, P. F.; Lin, K. C.; Huang, K. T.; Lee, T. L.; Liang, M. S.
國立成功大學	2008-04-30	Observations in trapping characteristics of positive bias temperature instability on high-k/metal gate n-type metal oxide semiconductor field effect transistor with the complementary multi-pulse technique	Liao, J. C.; Fang, Yean-Kuen; Hou, Y. T.; Wu, W. H.; Hung, C. L.; Hsu, P. F.; Lin, K. C.; Huang, K. T.; Lee, T. L.; Liang, M. S.
國立成功大學	2008-04	Observation of reliability of HfZrOX gate dielectric devices with different Zr/Hf ratios	Liao, Jing-Chyi; Fang, Yean-Kuen; Hou, Yong Tian; Tseng, Wei Hsiung; Yang, Chih I.; Hsu, Peng Fu; Chao, Yuen Shun; Lin, Kang Cheng; Huang, Kuo Tai; Lee, Tzu Liang; Liang, Meng Sung
國立成功大學	2008-04	Effect of etch stop layer stress on negative bias temperature instability of deep submicron p-type metal-oxide-semiconductor field effect transistors with dual gate oxide	Chen, Ming-Shing; Fang, Yean-Kuen; Lee, Tung-Hsing; Lin, Chien-Ting; Chiang, Yen-Ting; Ko, Joe; Sheu, Yau Kae; Shen, Tsong Lin; Liao, Wen Yi
國立成功大學	2008-03-31	Impact of the strained SiGe source/drain on hot carrier reliability for 45 nm p-type metal-oxide-semiconductor field-effect transistors	Cheng, C. Y.; Fang, Yean-Kuen; Hsieh, J. C.; Hsia, H.; Chen, W. M.; Lin, S. S.; Hou, C. S.
國立成功大學	2008-02-21	Mechanism and modelling of source/drain asymmetry variation in 65nm CMOS devices for SRAM and logic applications	Lee, Tung-Hsing; Fang, Yean-Kuen; Chiang, Yen-Ting; Lin, C. T.; Chen, Ming-Shing; Cheng, Osbert

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