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机构 日期 题名 作者
國立交通大學 2019-04-02T06:00:17Z Effects of direct current and pulse-reverse copper plating incubation behavior of self-annealing Cheng, Min-Yuan; Chen, Kei-Wei; Liu, Tzeng-Feng; Wang, Ying-Lang; Feng, Hsien-Ping
國立交通大學 2014-12-08T15:48:11Z Effects of direct current and pulse-reverse copper plating incubation behavior of self-annealing Cheng, Min-Yuan; Chen, Kei-Wei; Liu, Tzeng-Feng; Wang, Ying-Lang; Feng, Hsien-Ping
國立交通大學 2014-12-08T15:12:50Z Behavior of copper removal by CMP and its correlation to deposit structure and impurity content Feng, Hsien-Ping; Lin, Jeng-Yu; Cheng, Ming-Yung; Wang, Yung-Yun; Wan, Chi-Chao

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