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Showing items 16-25 of 118  (12 Page(s) Totally)
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Institution Date Title Author
國立交通大學 2014-12-08T15:47:22Z Process optimization of plasma-enhanced chemical vapor deposited passivation thin films for improving nonvolatile memory IC performance Lin, CF; Tseng, WT; Feng, MS
國立交通大學 2014-12-08T15:46:44Z Optimization of multilayer thin film passivation processes for improving cache memory device performance Lin, CF; Tseng, WT; Feng, MS
國立交通大學 2014-12-08T15:46:40Z Process optimization and integration for silicon oxide intermetal dielectric planarized by chemical mechanical polish Lin, CF; Tseng, WT; Feng, MS
國立交通大學 2014-12-08T15:46:28Z A ULSI shallow trench isolation process through the integration of multilayered dielectric process and chemical-mechanical planarization Lin, CF; Tseng, WT; Feng, MS; Wang, YL
國立交通大學 2014-12-08T15:46:27Z Effects of O-2- and N2O-plasma treatments on properties of plasma-enhanced-chemical-vapor-deposition tetraethylorthosilicate oxide Chen, YC; Yang, MZ; Tung, IC; Chen, MP; Feng, MS; Cheng, HC; Chang, CY
國立交通大學 2014-12-08T15:46:11Z The novel improvement of low dielectric constant methylsilsesquioxane by N2O plasma treatment Chang, TC; Liu, PT; Mor, YS; Sze, SM; Yang, YL; Feng, MS; Pan, FM; Dai, BT; Chang, CY
國立交通大學 2014-12-08T15:46:08Z Nitric acid-based slurry with citric acid as an inhibitor for copper chemical mechanical polishing Hu, TC; Chiu, SY; Dai, BT; Tsai, MS; Tung, IC; Feng, MS
國立交通大學 2014-12-08T15:46:07Z Effects of methyl silsesquioxane electron-beam curing on device characteristics of logic and four-transistor static random-access memory Lin, CF; Tung, IC; Feng, MS
國立交通大學 2014-12-08T15:45:24Z Improved contact performance of GaN film using Si diffusion Lin, CF; Cheng, HC; Chi, GC; Bu, CJ; Feng, MS
國立交通大學 2014-12-08T15:44:44Z Characterization of excimer-laser-annealed polycrystalline silicon films grown by ultrahigh-vacuum chemical vapor deposition Chen, YC; Wu, YCS; Tung, IC; Chao, CW; Feng, MS; Chen, HC

Showing items 16-25 of 118  (12 Page(s) Totally)
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