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Institution	Date	Title	Author
義守大學	2014-04	Parallel 2D Axisymmetric Fluid Modeling of CF4 Discharge in an Inductively Coupled Plasma Source During SiO2 Etching	Yuan-Ming Chiu;Chung-Hua Chiang;Chieh-Tsan Hung;Meng-Hua Hu;Jong-Shinn Wu;Feng-Nan Hwang

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