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Institution Date Title Author
國立交通大學 2014-12-08T15:43:24Z Impact of silicide formation on the resistance of common source/drain region Tsui, BY; Wu, MD; Gan, TC
國立交通大學 2014-12-08T15:25:51Z A novel fully self-aligned process for high cell density trench gate power MOSFETs Tsui, BY; Gan, TC; Wu, MD; Chou, HH; Wu, ZL; Sune, CT
國立交通大學 2014-12-08T15:25:51Z Trench gate power MOSFETs with retrograde body profile Tsui, BY; Wu, MD; Gan, TC; Chou, HH; Wu, ZL; Sune, CT

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