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| 國立成功大學 |
2020 |
Topological Hall Effect in Single Thick SrRuO3 Layers Induced by Defect Engineering
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Wang, C.;Chang, Chang C.-H.;Herklotz, A.;Chen, Chen C.;Ganss, F.;Kentsch, U.;Chen, D.;Gao, X.;Zeng, Y.-J.;Hellwig, O.;Helm, M.;Gemming, S.;Chu, Y.-H.;Zhou, S. |
| 國立交通大學 |
2014-12-08T15:09:49Z |
Conduction at domain walls in oxide multiferroics
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Seidel, J.; Martin, L. W.; He, Q.; Zhan, Q.; Chu, Y. -H.; Rother, A.; Hawkridge, M. E.; Maksymovych, P.; Yu, P.; Gajek, M.; Balke, N.; Kalinin, S. V.; Gemming, S.; Wang, F.; Catalan, G.; Scott, J. F.; Spaldin, N. A.; Orenstein, J.; Ramesh, R. |
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