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| 臺大學術典藏 |
2020-04-24T08:53:11Z |
High-quality nanothickness single-crystal [formula omitted] film grown on Si(111)
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Gustafsson, T.; Garfunkel, E.; Goncharova, L.V.; Chen, C.H.; Chu, M.-W.; Kwo, J.; Hong, M.; Kortan, A.R.; Chang, P.; Huang, Y.L.; Chen, C.P.; Chou, H.Y.; Lee, H.Y. |
| 臺大學術典藏 |
2019-12-27T07:49:51Z |
Advances in high 庥 gate dielectrics for Si and III-V semiconductors
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Kwo, J.;Hong, M.;Busch, B.;Muller, D.A.;Chabal, Y.J.;Kortan, A.R.;Mannaerts, J.P.;Yang, B.;Ye, P.;Gossmann, H.;Sergent, A.M.;Ng, K.K.;Bude, J.;Schulte, W.H.;Garfunkel, E.;Gustafsson, T.; Kwo, J.; Hong, M.; Busch, B.; Muller, D.A.; Chabal, Y.J.; Kortan, A.R.; Mannaerts, J.P.; Yang, B.; Ye, P.; Gossmann, H.; Sergent, A.M.; Ng, K.K.; Bude, J.; Schulte, W.H.; Garfunkel, E.; Gustafsson, T.; MINGHWEI HONG |
| 臺大學術典藏 |
2019-12-27T07:49:51Z |
Advances in high 庥 gate dielectrics for Si and III-V semiconductors
|
Kwo, J.;Hong, M.;Busch, B.;Muller, D.A.;Chabal, Y.J.;Kortan, A.R.;Mannaerts, J.P.;Yang, B.;Ye, P.;Gossmann, H.;Sergent, A.M.;Ng, K.K.;Bude, J.;Schulte, W.H.;Garfunkel, E.;Gustafsson, T.; Kwo, J.; Hong, M.; Busch, B.; Muller, D.A.; Chabal, Y.J.; Kortan, A.R.; Mannaerts, J.P.; Yang, B.; Ye, P.; Gossmann, H.; Sergent, A.M.; Ng, K.K.; Bude, J.; Schulte, W.H.; Garfunkel, E.; Gustafsson, T.; MINGHWEI HONG |
| 臺大學術典藏 |
2018-09-10T05:56:12Z |
Structure, Composition and Order at Interfaces of Crystalline Oxides and Other High $κ$ Materials on Si
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Schlom, DG; others; MINGHWEI HONG; Lysaght, P; Foran, B; Bersuker, G; Dalponte, M; Barnes, R; Starodub, D; Gustafsson, T; Garfunkel, E; Goncharova, L |
| 臺大學術典藏 |
2018-09-10T05:56:09Z |
Magnetic Properties of Co-doped HfO2
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Lee, WC; Huang, ML; Yang, ZK; Hong, M; Lee, SF; Goncharova, L; Gustafsson, T; Hang, MC; Soo, YL; others; MINGHWEI HONG; Chang, YS |
| 臺大學術典藏 |
2018-09-10T03:46:47Z |
Interface reactions of high-k Y2O3 gate oxides with Si
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Busch, BW;Kwo, J;Hong, M;Mannaerts, JP;Sapjeta, BJ;Schulte, WH;Garfunkel, E;Gustafsson, T; Busch, BW; Kwo, J; Hong, M; Mannaerts, JP; Sapjeta, BJ; Schulte, WH; Garfunkel, E; Gustafsson, T; MINGHWEI HONG |
| 臺大學術典藏 |
2018-09-10T03:46:47Z |
Interface reactions of high-k Y2O3 gate oxides with Si
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Busch, BW;Kwo, J;Hong, M;Mannaerts, JP;Sapjeta, BJ;Schulte, WH;Garfunkel, E;Gustafsson, T; Busch, BW; Kwo, J; Hong, M; Mannaerts, JP; Sapjeta, BJ; Schulte, WH; Garfunkel, E; Gustafsson, T; MINGHWEI HONG |
Showing items 1-7 of 7 (1 Page(s) Totally)
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