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教育部委託研究計畫 計畫執行:國立臺灣大學圖書館
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"h l chen"的相關文件
顯示項目 6-15 / 60 (共6頁)
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| 臺大學術典藏 |
2018-09-10T07:42:38Z |
Hexamethyldisiloxane Film as the Bottom Antireflective Coating Layer for ArF Excimer Laser Lithography
|
H. L. Chen; L. A. Wang; LON A. WANG |
| 臺大學術典藏 |
2018-09-10T07:09:07Z |
Beyond the 130 nm-Generation by Employing DUV Lithography
|
LON A. WANG; C. H. Lin; H. L. Chen; L. A. Wang |
| 臺大學術典藏 |
2018-09-10T07:09:07Z |
Fabrication of Sub-Quarter-Micron Grating Patterns by Employing DUV Holographic Lithography
|
L. A. Wang; C. H. Lin; H. L. Chen; LON A. WANG |
| 臺大學術典藏 |
2018-09-10T07:09:07Z |
Fabrication of Phase Shifting Mask Patterns by Utilizing Top Surface Imaging Technique
|
L. A. Wang,; H. L. Chen,; C. H. Lin,; LON A. WANG |
| 臺大學術典藏 |
2018-09-10T07:09:07Z |
Optical Characteristics and Irradiation Stability of PECVD-Grown Sinx Films Prepared for DUV Attenuated Phase Shifting Masks
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L. A. Wang,; H. L. Chen,; C. W. Hsu,; L. S. Yeh,; LON A. WANG |
| 臺大學術典藏 |
2018-09-10T07:09:06Z |
Characteristics of deuterium-loaded fiber bragg gratings
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L. A. Wang; C. W. Hsu; H. L. Chen; LON A. WANG |
| 臺大學術典藏 |
2018-09-10T07:09:06Z |
Characteristics of plasma enhanced chemical vapor deposition-grown SiNx films prepared for deep ultraviolet attenuated phase-shifting masks
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H. L. Chen; L. A. Wang; C. W. Hsu; LON A. WANG |
| 臺大學術典藏 |
2018-09-10T07:09:06Z |
Etching Characteristics of SiNx Films for DUV Lithography Applications
|
L. A. Wang; LON A. WANG; H. L. Chen |
| 臺大學術典藏 |
2018-09-10T06:37:33Z |
Fabrication of Sub-Half-Micron Patterns by Employing DUV Lithography
|
C. H. Lin,; H. L. Chen,; C. W. Hsu,; L. S. Yeh,; L. A. Wang,; LON A. WANG |
| 臺大學術典藏 |
2018-09-10T06:37:33Z |
Development of SiNx Films for Attenuated Phase Shifting Masks
|
H. L. Chen; L. A. Wang; L. S. Yeh; C. W. Hsu; LON A. WANG |
顯示項目 6-15 / 60 (共6頁)
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