臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)

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Institution	Date	Title	Author
臺大學術典藏	2018-09-10T07:42:38Z	Hexamethyldisiloxane Film as the Bottom Antireflective Coating Layer for ArF Excimer Laser Lithography	H. L. Chen; L. A. Wang; LON A. WANG
臺大學術典藏	2018-09-10T07:09:07Z	Beyond the 130 nm-Generation by Employing DUV Lithography	LON A. WANG; C. H. Lin; H. L. Chen; L. A. Wang
臺大學術典藏	2018-09-10T07:09:07Z	Fabrication of Sub-Quarter-Micron Grating Patterns by Employing DUV Holographic Lithography	L. A. Wang; C. H. Lin; H. L. Chen; LON A. WANG
臺大學術典藏	2018-09-10T07:09:07Z	Fabrication of Phase Shifting Mask Patterns by Utilizing Top Surface Imaging Technique	L. A. Wang,; H. L. Chen,; C. H. Lin,; LON A. WANG
臺大學術典藏	2018-09-10T07:09:07Z	Optical Characteristics and Irradiation Stability of PECVD-Grown Sinx Films Prepared for DUV Attenuated Phase Shifting Masks	L. A. Wang,; H. L. Chen,; C. W. Hsu,; L. S. Yeh,; LON A. WANG
臺大學術典藏	2018-09-10T07:09:06Z	Characteristics of deuterium-loaded fiber bragg gratings	L. A. Wang; C. W. Hsu; H. L. Chen; LON A. WANG
臺大學術典藏	2018-09-10T07:09:06Z	Characteristics of plasma enhanced chemical vapor deposition-grown SiNx films prepared for deep ultraviolet attenuated phase-shifting masks	H. L. Chen; L. A. Wang; C. W. Hsu; LON A. WANG
臺大學術典藏	2018-09-10T07:09:06Z	Etching Characteristics of SiNx Films for DUV Lithography Applications	L. A. Wang; LON A. WANG; H. L. Chen
臺大學術典藏	2018-09-10T06:37:33Z	Fabrication of Sub-Half-Micron Patterns by Employing DUV Lithography	C. H. Lin,; H. L. Chen,; C. W. Hsu,; L. S. Yeh,; L. A. Wang,; LON A. WANG
臺大學術典藏	2018-09-10T06:37:33Z	Development of SiN_x Films for Attenuated Phase Shifting Masks	H. L. Chen; L. A. Wang; L. S. Yeh; C. W. Hsu; LON A. WANG

Showing items 6-15 of 60 (6 Page(s) Totally)
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