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机构 日期 题名 作者
臺大學術典藏 2022-01-03T08:01:20Z Simulation and fabrication results of electron optical systems for massively parallel maskless lithography Hoi-Tou Ng; Chien-Chieh Huang; Hsing-Hong Chen; Shin-Chuan Chen; Ken-Hsien Hsieh; Kuen-Yu Tsai*;  Jia-Han Li; JIA-HAN LI
臺大學術典藏 2018-09-10T08:46:33Z Lithography-patterning-fidelity-aware electron-optical system design optimization Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; Hsing-Hong Chen; Chun-Hung Liu; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏 2018-09-10T08:46:33Z Lithography-patterning-fidelity-aware electron-optical system design optimization Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏 2018-09-10T08:18:19Z Manufacturability analysis of a micro-electro-mechanical systems–based electron-optical system design for direct-write lithography Sheng-Yung Chen;Shin-Chuan Chen;Hsing-Hong Chen;Kuen-Yu Tsai;Hsin-Hung Pan; Sheng-Yung Chen; Shin-Chuan Chen; Hsing-Hong Chen; Kuen-Yu Tsai; Hsin-Hung Pan; KUEN-YU TSAI
臺大學術典藏 2018-09-10T08:18:19Z Manufacturability analysis of a micro-electro-mechanical systems–based electron-optical system design for direct-write lithography Sheng-Yung Chen;Shin-Chuan Chen;Hsing-Hong Chen;Kuen-Yu Tsai;Hsin-Hung Pan; Sheng-Yung Chen; Shin-Chuan Chen; Hsing-Hong Chen; Kuen-Yu Tsai; Hsin-Hung Pan; KUEN-YU TSAI
臺大學術典藏 2018-09-10T07:42:07Z Determination of Gaussian beam and raster scan parameters in electron-beam-direct-write lithography considering device patterning and performance variability Hoi-Tou Ng;Chun-Hung Liu;Hsing-Hong Chen;Kuen-Yu Tsai; Hoi-Tou Ng; Chun-Hung Liu; Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏 2018-09-10T07:42:07Z Determination of Gaussian beam and raster scan parameters in electron-beam-direct-write lithography considering device patterning and performance variability Hoi-Tou Ng;Chun-Hung Liu;Hsing-Hong Chen;Kuen-Yu Tsai; Hoi-Tou Ng; Chun-Hung Liu; Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏 2018-09-10T07:42:07Z Manufacturability analysis of a MEMS-based electron-optical system design for direct-write lithography Sheng-Yung Chen;Shin-Chuan Chen;Hsing-Hong Chen;Ting-Han Pei;Kuen-Yu Tsai;Hsin-Hung Pan; Sheng-Yung Chen; Shin-Chuan Chen; Hsing-Hong Chen; Ting-Han Pei; Kuen-Yu Tsai; Hsin-Hung Pan; KUEN-YU TSAI
臺大學術典藏 2018-09-10T07:42:07Z Manufacturability analysis of a MEMS-based electron-optical system design for direct-write lithography Sheng-Yung Chen;Shin-Chuan Chen;Hsing-Hong Chen;Ting-Han Pei;Kuen-Yu Tsai;Hsin-Hung Pan; Sheng-Yung Chen; Shin-Chuan Chen; Hsing-Hong Chen; Ting-Han Pei; Kuen-Yu Tsai; Hsin-Hung Pan; KUEN-YU TSAI
臺大學術典藏 2018-09-10T07:42:05Z Selection of Gaussian-beam and raster-scan parameters in electron-beam direct-write lithography considering device patterning and performance variability Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI; Chun-Hung Liu; Hoi-Tou Ng;Chun-Hung Liu;Hsing-Hong Chen;Kuen-Yu Tsai; Hoi-Tou Ng
臺大學術典藏 2018-09-10T07:42:05Z Selection of Gaussian-beam and raster-scan parameters in electron-beam direct-write lithography considering device patterning and performance variability Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI; Chun-Hung Liu; Hoi-Tou Ng;Chun-Hung Liu;Hsing-Hong Chen;Kuen-Yu Tsai; Hoi-Tou Ng

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