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Institution Date Title Author
臺大學術典藏 2018-09-10T07:42:05Z Selection of Gaussian-beam and raster-scan parameters in electron-beam direct-write lithography considering device patterning and performance variability Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI; Chun-Hung Liu; Hoi-Tou Ng;Chun-Hung Liu;Hsing-Hong Chen;Kuen-Yu Tsai; Hoi-Tou Ng

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