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Showing items 21-26 of 26 (2 Page(s) Totally)
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| 國立成功大學 |
2007-05 |
Impacts of notched-gate structure on contact etch stop layer (CESL) stressed 90-nm nMOSFET
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Lin, Chien-Ting; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lai, Chieh-Ming; Hsu, Che-Hua; Cheng, Li-Wei; Ma, Guang-Hwa |
| 國立成功大學 |
2007-04 |
Extra bonus on transistor optimization with stress enhanced notched-gate technology for sub-90 nm complementary metal oxide semiconductor field effect transistor
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Lin, Chien-Ting; Fang, Yean-Kuen; Lai, Chieh-Ming; Yeh, Wen-Kuan; Hsu, Che-Hua; Cheng, Li-Wei; Huang, Yao-Tsung; Ma, Guang Hwa |
| 國立高雄大學 |
2007-02 |
A novel strain method for enhancement of 90-nm node and beyond FUSI-gated CMOS performance
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Lin, Chien-Ting; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lee, Tung-Hsing; Chen, Ming-Shing; Lai, Chieh-Ming; Hsu, Che-Hua; Chen, Liang-Wei; Cheng, Li-Wei; Ma, Mike |
| 國立成功大學 |
2007-02 |
A novel strain method for enhancement of 90-nm node and beyond FUSI-gated CMOS performance
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Lin, Chien-Ting; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lee, Tung-Hsing; Chen, Ming-Shing; Lai, Chieh-Ming; Hsu, Che-Hua; Chen, Liang-Wei; Cheng, Li-Wei; Ma, Mike |
| 國立成功大學 |
2006-12 |
Effect of silicon thickness on contact-etch-stop-layer-induced silicon/buried-oxide interface stress for partially depleted SOI
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Lin, Chien-Ting; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lee, Tung-Hsing; Chen, Ming-Shing; Hsu, Che-Hua; Chen, Liang-Wei; Cheng, Li-Wei; Ma, Mike |
| 國立成功大學 |
2006-04 |
Investigation and modeling of stress interactions on 90 nm silicon on insulator complementary metal oxide semiconductor by various mobility enhancement approaches
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Lin, Chien-Ting; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lee, Tung-Hsing; Chen, Ming-Hing; Hsu, Che-Hua; Chen, Liang-Wei; Chang, Hui-Chen; Tsai, Cheng-Tzung; Ma, Mike |
Showing items 21-26 of 26 (2 Page(s) Totally)
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