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Institution Date Title Author
臺大學術典藏 2018-09-10T15:26:03Z Design of an electron-optical system with a ball-tip emission source through a numerical optimization method for high-throughput electron-beam–direct-write lithography Yu-Tian Shen; Kuen-Yu Tsai; KUEN-YU TSAI; Hsuan-Ping Lee;Sheng-Yung Chen;Chun-Hung Liu;Ding-Qi;Yu-Tian Shen;Kuen-Yu Tsai; Hsuan-Ping Lee; Sheng-Yung Chen; Chun-Hung Liu; Ding-Qi
臺大學術典藏 2018-09-10T15:26:03Z Design of an electron-optical system with a ball-tip emission source through a numerical optimization method for high-throughput electron-beam–direct-write lithography Yu-Tian Shen; Kuen-Yu Tsai; KUEN-YU TSAI; Hsuan-Ping Lee;Sheng-Yung Chen;Chun-Hung Liu;Ding-Qi;Yu-Tian Shen;Kuen-Yu Tsai; Hsuan-Ping Lee; Sheng-Yung Chen; Chun-Hung Liu; Ding-Qi
臺大學術典藏 2018-09-10T15:00:24Z Improvement in electron-beam lithography throughput by exploiting relaxed patterning fidelity requirements with directed self-assembly Hao-Yun Yu;Chun-Hung Liu;Yu-Tian Shen;Hsuan-Ping Lee;Kuen-Yu Tsai; Hao-Yun Yu; Chun-Hung Liu; Yu-Tian Shen; Hsuan-Ping Lee; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏 2018-09-10T15:00:24Z Improvement in electron-beam lithography throughput by exploiting relaxed patterning fidelity requirements with directed self-assembly Hao-Yun Yu;Chun-Hung Liu;Yu-Tian Shen;Hsuan-Ping Lee;Kuen-Yu Tsai; Hao-Yun Yu; Chun-Hung Liu; Yu-Tian Shen; Hsuan-Ping Lee; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏 2018-09-10T15:00:24Z Direct-scatterometry-enabled PEC model calibration with two-dimensional layouts Yi-Yeh Yang;Hsuan-Ping Lee;Chun-Hung Liu;Hao-Yun Yu;Kuen-Yu Tsai;Jia-Han Li; Yi-Yeh Yang; Hsuan-Ping Lee; Chun-Hung Liu; Hao-Yun Yu; Kuen-Yu Tsai; Jia-Han Li; KUEN-YU TSAI
臺大學術典藏 2018-09-10T15:00:24Z Direct-scatterometry-enabled PEC model calibration with two-dimensional layouts Yi-Yeh Yang;Hsuan-Ping Lee;Chun-Hung Liu;Hao-Yun Yu;Kuen-Yu Tsai;Jia-Han Li; Yi-Yeh Yang; Hsuan-Ping Lee; Chun-Hung Liu; Hao-Yun Yu; Kuen-Yu Tsai; Jia-Han Li; KUEN-YU TSAI

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