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Taiwan Academic Institutional Repository >
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"huang ty"
Showing items 106-130 of 209 (9 Page(s) Totally)
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| 國立交通大學 |
2014-12-08T15:40:21Z |
The effects of dielectric type and thickness on the characteristics of dynamic threshold metal oxide semiconductor transistors
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Lee, YJ; Chao, TS; Huang, TY |
| 國立交通大學 |
2014-12-08T15:40:05Z |
H-2 and NH3 plasma passivation on poly-Si TFTs with bottom-sub-gate induced electrical junctions
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Yu, CM; Lin, HC; Huang, TY; Lei, TF |
| 國立交通大學 |
2014-12-08T15:39:55Z |
Short-channel poly-Si thin-film transistors with ultrathin channel and self-aligned tungsten-clad source/drain
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Zan, HW; Chang, TC; Shih, PS; Peng, DZ; Kuo, PY; Huang, TY; Chang, CY; Liu, PT |
| 國立交通大學 |
2014-12-08T15:39:42Z |
Effects of process and gate doping species on negative-bias-temperature instability of p-channel MOSFETs
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Lee, DY; Huang, TY; Lin, HC; Chiang, WJ; Huang, GW; Wanga, T |
| 國立交通大學 |
2014-12-08T15:39:39Z |
High-voltage and high-temperature applications of DTMOS with reverse Schottky barrier on substrate contacts
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Chao, TS; Lee, YJ; Huang, TY |
| 國立交通大學 |
2014-12-08T15:39:33Z |
Oxygen quenching effect in ultra-deep X-ray lithography with SU-8 resist
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Shew, BY; Huang, TY; Liu, KP; Chou, CP |
| 國立交通大學 |
2014-12-08T15:39:32Z |
A dual-gate-controlled single-electron transistor using self-aligned polysilicon sidewall spacer gates on silicon-on-insulator nanowire
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Hu, SF; Wu, YC; Sung, CL; Chang, CY; Huang, TY |
| 國立交通大學 |
2014-12-08T15:39:25Z |
Hot carrier degradations of dynamic threshold silicon on insulator p-type metal-oxide-semiconductor field effect transistors
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Chao, TS; Lee, YJ; Huang, CY; Lin, HC; Li, YM; Huang, TY |
| 國立交通大學 |
2014-12-08T15:39:17Z |
A new method to extract MOSFET threshold voltage, effective channel length, and channel mobility using S-parameter measurement
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Chen, HY; Chen, KM; Huang, GW; Chang, CY; Huang, TY |
| 國立交通大學 |
2014-12-08T15:39:11Z |
Pooling spaces and non-adaptive pooling designs
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Huang, TY; Weng, CW |
| 國立交通大學 |
2014-12-08T15:39:08Z |
Hot-carrier effects on power characteristics of SiGeHBTs
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Huang, SY; Chen, KM; Huang, GW; Tseng, HC; Hsu, TL; Chang, CY; Huang, TY |
| 國立交通大學 |
2014-12-08T15:37:26Z |
The characteristics of hole trapping in HfO2/SiO2 gate dielectrics with TiN gate electrode
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Lu, WT; Lin, PC; Huang, TY; Chien, CH; Yang, MJ; Huang, IJ; Lehnen, P |
| 國立交通大學 |
2014-12-08T15:37:15Z |
HfO2 MIS capacitor with copper gate electrode
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Perng, TH; Chien, CH; Chen, CW; Yang, MJ; Lehnen, P; Chang, CY; Huang, TY |
| 國立交通大學 |
2014-12-08T15:37:09Z |
Effects of low-temperature NH3 treatment on the characteristics of HfO2/SiO2 gate stack
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Lu, WT; Chien, CH; Huang, IJ; Yang, MJ; Lehnen, P; Huang, TY |
| 國立交通大學 |
2014-12-08T15:37:08Z |
Automated information. mining on multimedia TV news archives
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Lai, PS; Cheng, SS; Sun, SY; Huang, TY; Su, JM; Xu, YY; Chen, YH; Chuang, SC; Tseng, CL; Hsieh, CL; Lu, YL; Shen, YC; Chen, JR; Niel, JB; Tsai, FP; Huang, HC; Pao, HT; Fu, HC |
| 國立交通大學 |
2014-12-08T15:37:06Z |
Determination of effective density-of-states using a novel Schottky barrier poly-Si thin-film transistor
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Lin, HC; Lee, MH; Yeh, KL; Huang, TY |
| 國立交通大學 |
2014-12-08T15:37:06Z |
Localized lateral growth of single-walled carbon nanotubes for field-effect transistors by a cobalt-mix-TEOS method
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Chen, BH; Lo, PY; Wei, JH; Tsai, MJ; Hwang, CL; Chao, TS; Lin, HC; Huang, TY |
| 國立交通大學 |
2014-12-08T15:37:00Z |
Estimating driving performance based on EEG spectrum analysis
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Lin, CT; Wu, RC; Jung, TP; Liang, SF; Huang, TY |
| 國立交通大學 |
2014-12-08T15:36:15Z |
Modeling mechanical stress effect on dopant diffusion in scaled MOSFETs
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Sheu, YM; Yang, SJ; Wang, CC; Chang, CS; Huang, LP; Huang, TY; Chen, MJ; Diaz, CH |
| 國立交通大學 |
2014-12-08T15:36:00Z |
Low-temperature growth of polycrystalline ge films on SiO2 substrate by HDPCVD
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Yang, MJ; Shieh, J; Hsu, SL; Huang, IJ; Leu, CC; Shen, SW; Huang, TY; Lehnen, P; Chien, CH |
| 國立交通大學 |
2014-12-08T15:27:25Z |
A model for photoresist-induced charging damage in ultra-thin gate oxides
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Lin, HC; Chien, CH; Wang, MF; Huang, TY; Chang, CY |
| 國立交通大學 |
2014-12-08T15:27:09Z |
Breakdown characteristics of ultra-thin gate oxides caused by plasma charging
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Chen, CC; Lin, HC; Chang, CY; Chien, CH; Huang, TY |
| 國立交通大學 |
2014-12-08T15:27:08Z |
Characterization and lithographic parameters extraction for the modified resists
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Ko, FH; Lu, JK; Chu, TC; Huang, TY; Yang, CC; Sheu, JT; Huang, HL |
| 國立交通大學 |
2014-12-08T15:27:07Z |
New insights on RF CMOS stability related to bias, scaling, and temperature
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Su, JG; Wong, SC; Chang, CY; Chiu, KY; Huang, TY; Ou, CT; Kao, CH; Chao, CJ |
| 國立交通大學 |
2014-12-08T15:27:02Z |
Plasma process induced damage in sputtered TiN metal gate capacitors with ultra-thin nitrided oxide
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Chen, CC; Lin, HC; Chang, CY; Chao, TS; Huang, SC; Wu, WF; Huang, TY; Liang, MS |
Showing items 106-130 of 209 (9 Page(s) Totally)
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