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Showing items 111-120 of 206  (21 Page(s) Totally)
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Institution Date Title Author
國立交通大學 2014-12-08T15:39:33Z Oxygen quenching effect in ultra-deep X-ray lithography with SU-8 resist Shew, BY; Huang, TY; Liu, KP; Chou, CP
國立交通大學 2014-12-08T15:39:32Z A dual-gate-controlled single-electron transistor using self-aligned polysilicon sidewall spacer gates on silicon-on-insulator nanowire Hu, SF; Wu, YC; Sung, CL; Chang, CY; Huang, TY
國立交通大學 2014-12-08T15:39:25Z Hot carrier degradations of dynamic threshold silicon on insulator p-type metal-oxide-semiconductor field effect transistors Chao, TS; Lee, YJ; Huang, CY; Lin, HC; Li, YM; Huang, TY
國立交通大學 2014-12-08T15:39:17Z A new method to extract MOSFET threshold voltage, effective channel length, and channel mobility using S-parameter measurement Chen, HY; Chen, KM; Huang, GW; Chang, CY; Huang, TY
國立交通大學 2014-12-08T15:39:11Z Pooling spaces and non-adaptive pooling designs Huang, TY; Weng, CW
國立交通大學 2014-12-08T15:39:08Z Hot-carrier effects on power characteristics of SiGeHBTs Huang, SY; Chen, KM; Huang, GW; Tseng, HC; Hsu, TL; Chang, CY; Huang, TY
國立交通大學 2014-12-08T15:37:26Z The characteristics of hole trapping in HfO2/SiO2 gate dielectrics with TiN gate electrode Lu, WT; Lin, PC; Huang, TY; Chien, CH; Yang, MJ; Huang, IJ; Lehnen, P
國立交通大學 2014-12-08T15:37:15Z HfO2 MIS capacitor with copper gate electrode Perng, TH; Chien, CH; Chen, CW; Yang, MJ; Lehnen, P; Chang, CY; Huang, TY
國立交通大學 2014-12-08T15:37:09Z Effects of low-temperature NH3 treatment on the characteristics of HfO2/SiO2 gate stack Lu, WT; Chien, CH; Huang, IJ; Yang, MJ; Lehnen, P; Huang, TY
國立交通大學 2014-12-08T15:37:08Z Automated information. mining on multimedia TV news archives Lai, PS; Cheng, SS; Sun, SY; Huang, TY; Su, JM; Xu, YY; Chen, YH; Chuang, SC; Tseng, CL; Hsieh, CL; Lu, YL; Shen, YC; Chen, JR; Niel, JB; Tsai, FP; Huang, HC; Pao, HT; Fu, HC

Showing items 111-120 of 206  (21 Page(s) Totally)
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