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"huang ty"的相關文件
顯示項目 126-135 / 206 (共21頁)
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| 國立交通大學 |
2014-12-08T15:27:25Z |
A model for photoresist-induced charging damage in ultra-thin gate oxides
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Lin, HC; Chien, CH; Wang, MF; Huang, TY; Chang, CY |
| 國立交通大學 |
2014-12-08T15:27:09Z |
Breakdown characteristics of ultra-thin gate oxides caused by plasma charging
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Chen, CC; Lin, HC; Chang, CY; Chien, CH; Huang, TY |
| 國立交通大學 |
2014-12-08T15:27:08Z |
Characterization and lithographic parameters extraction for the modified resists
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Ko, FH; Lu, JK; Chu, TC; Huang, TY; Yang, CC; Sheu, JT; Huang, HL |
| 國立交通大學 |
2014-12-08T15:27:07Z |
New insights on RF CMOS stability related to bias, scaling, and temperature
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Su, JG; Wong, SC; Chang, CY; Chiu, KY; Huang, TY; Ou, CT; Kao, CH; Chao, CJ |
| 國立交通大學 |
2014-12-08T15:27:02Z |
Plasma process induced damage in sputtered TiN metal gate capacitors with ultra-thin nitrided oxide
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Chen, CC; Lin, HC; Chang, CY; Chao, TS; Huang, SC; Wu, WF; Huang, TY; Liang, MS |
| 國立交通大學 |
2014-12-08T15:27:02Z |
Improved plasma charging immunity in ultra-thin gate oxide with fluorine and nitrogen implantation
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Chen, CC; Lin, HC; Chang, CY; Huang, CC; Chien, CH; Huang, TY; Liang, MS |
| 國立交通大學 |
2014-12-08T15:26:58Z |
Characterization and modeling of out-diffusion of cesium, manganese and zinc impurities from deep ultraviolet photoresist
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Ko, FH; Wang, MY; Wang, TK; Yang, CC; Huang, TY; Wu, CS |
| 國立交通大學 |
2014-12-08T15:26:56Z |
Film characterization and evaluation of process performance for the modified electron beam resist
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Ko, FH; Ting, JH; Chou, CT; Hsiao, LT; Huang, TY; Dai, BT |
| 國立交通大學 |
2014-12-08T15:26:54Z |
Thermal stability of PVD TiN gate and its impacts on characteristics of CMOS transistors
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Wang, MF; Kao, YC; Huang, TY; Lin, HC; Chang, CY |
| 國立交通大學 |
2014-12-08T15:26:48Z |
Investigations of bulk dynamic threshold-voltage MOSFET with 65GHz "normal-mode" Ft and 220GHz "over-drive mode" Ft for RF applications
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Chang, CY; Su, JG; Hsu, HM; Wong, SC; Huang, TY; Sun, YC |
顯示項目 126-135 / 206 (共21頁)
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