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Showing items 36-45 of 206  (21 Page(s) Totally)
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Institution Date Title Author
國立交通大學 2014-12-08T15:46:43Z Leakage current reduction of chemical-vapor-deposited Ta2O5 films on rugged polycrystalline silicon electrode for dynamic random access memory application Lin, M; Chang, CY; Huang, TY; Shieh, WY
國立交通大學 2014-12-08T15:46:37Z Reliability of ultrathin gate oxides for ULSI devices Chang, CY; Chen, CC; Lin, HC; Liang, MS; Chien, CH; Huang, TY
國立交通大學 2014-12-08T15:46:29Z Temperature-accelerated dielectric breakdown in ultrathin gate oxides Chen, CC; Chang, CY; Chien, CH; Huang, TY; Lin, HC; Liang, MS
國立交通大學 2014-12-08T15:46:25Z Highly (111) textured titanium nitride layers for sub- quarter-micrometer Al metallization Wu, WF; Lin, CC; Huang, CC; Lin, HC; Chang, TC; Yang, RP; Huang, TY
國立交通大學 2014-12-08T15:46:20Z A novel lightly doped drain polysilicon thin-film transistor with oxide sidewall spacer formed by one-step selective liquid phase deposition Shih, PS; Chang, CY; Chang, TC; Huang, TY; Peng, DZ; Yeh, CF
國立交通大學 2014-12-08T15:46:15Z Characterization and modeling of out-diffusion of manganese and zinc impurities from deep ultraviolet photoresist Wang, MY; Ko, FH; Wang, TK; Yang, CC; Huang, TY
國立交通大學 2014-12-08T15:46:05Z A multilevel interconnect technology with intrametal air gap for high-performance 0.25-mu m-and-beyond devices manufacturing Lin, M; Chang, CY; Huang, TY; Lin, ML
國立交通大學 2014-12-08T15:46:00Z The combined effects of nitrogen implantation at S/D extension and N2O oxide on 0.18 mu m N- and P-metal oxide field effect transistors (MOSFETs) Chao, TS; Chang, SJ; Chien, CH; Lin, HC; Huang, TY; Chang, CY
國立交通大學 2014-12-08T15:45:52Z Improved immunity to plasma damage in ultrathin nitrided oxides Chen, CC; Lin, HC; Chang, CY; Liang, MS; Chien, CH; Hsien, SK; Huang, TY
國立交通大學 2014-12-08T15:45:46Z Effects of polysilicon gate doping concentration on plasma charging damage in ultrathin gate oxides Chen, CC; Lin, HC; Chang, CY; Huang, TY; Chien, CH; Liang, MS

Showing items 36-45 of 206  (21 Page(s) Totally)
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