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Showing items 96-105 of 110 (11 Page(s) Totally) << < 2 3 4 5 6 7 8 9 10 11 > >> View [10|25|50] records per page
| 臺大學術典藏 |
2018-09-10T03:44:48Z |
Ultra-thin gate oxides prepared by alternating current anodization of silicon followed by rapid thermal anneal
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Chen, Y.-C.; Lee, C.-Y.; Hwu, J.-G.; JENN-GWO HWU |
| 臺大學術典藏 |
2018-09-10T03:44:48Z |
Stress effect on the kinetics of silicon thermal oxidation
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Yen, J.-Y.; Hwu, J.-G.; JENN-GWO HWU |
| 臺大學術典藏 |
2011 |
Comprehensive study on negative capacitance effect observed in MOS(n) capacitors with ultrathin gate oxides
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Chang, S.-J.;Hwu, J.-G.; Chang, S.-J.; Hwu, J.-G.; JENN-GWO HWU |
| 國立臺灣大學 |
2009 |
Effect of Tensile Stress on MOS Capacitors with Ultra-thin Gate Oxide
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Chen, H.L.; Lee, C.J.; Hwu, J.G. |
| 國立臺灣大學 |
2009 |
Characteristics and Reliability of Hafnium Oxide Dielectric Stacks with Room Temperature Grown Interfacial Anodic Oxide
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Chang, C.-H.; Hwu, J.-G. |
| 臺大學術典藏 |
2002 |
Silicon metal-oxide-semiconductor solar cells with oxide prepared by room temperature anodization in hydrofluosilicic acid solution
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Hwu J.-G.; Hong C.-C.; CHIH-HAO CHEN |
| 臺大學術典藏 |
2001 |
Anomalous low-voltage tunneling current characteristics of ultrathin gate oxide (∼2 nm) after high-field stress
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JENN-GWO HWU; Hwu, J.-G.; Huang, C.-H. |
| 臺大學術典藏 |
2001 |
An on-chip temperature sensor by utilizing a MOS tunneling diode
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Shih, Y.-H.; Hwu, J.-G.; JENN-GWO HWU |
| 國立臺灣大學 |
1997-06 |
Improvement in radiation-hard CMOS logic gates for noise margin
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Yih, S.-J.; Chang, M.-L.; Hwu, J.-G.; Feng, W.-S. |
| 臺大學術典藏 |
1996 |
Reliable fluorinated thin gate oxides prepared by liquid phase deposition following rapid thermal process
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JENN-GWO HWU; Hwu, J.-G.; Lu, W.-S.; Lu, W.-S.;Hwu, J.-G. |
Showing items 96-105 of 110 (11 Page(s) Totally) << < 2 3 4 5 6 7 8 9 10 11 > >> View [10|25|50] records per page
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