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Showing items 61-70 of 210  (21 Page(s) Totally)
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Institution Date Title Author
國立臺灣大學 2003 Stress Distribution on (100) Si Wafer Mapped by Novel I-V Analysis of MOS Tunneling Diodes Hong, Chao-Chi; Hwu, Jenn-Gwo
國立臺灣大學 2003 Electrical Characterization and Process Control of Cost Effective High-k Aluminum Oxide Gate Dielectrics Prepared by Anodization Followed by Furnace Annealing Huang, Szu-Wei; Hwu, Jenn-Gwo
國立臺灣大學 2003 Using Anodization to Oxidize Ultrathin Aluminum Film for High-k Gate Dielectric Application Lin, Yen-Po; Hwu, Jenn-Gwo
國立臺灣大學 2002-01 Reduction in Leakage Current of Low-Temperature Thin-Gate Oxide by Repeated Spike Oxidation Technique Hong, Chao-Chi; Chang, Chang-Yun; Lee, Chaung-Yuan; Hwu, Jenn-Gwo
臺大學術典藏 2002-01 Reduction in Leakage Current of Low-Temperature Thin-Gate Oxide by Repeated Spike Oxidation Technique Hong, Chao-Chi; Chang, Chang-Yun; Lee, Chaung-Yuan; Hwu, Jenn-Gwo; Hong, Chao-Chi; Chang, Chang-Yun; Lee, Chaung-Yuan; Hwu, Jenn-Gwo
國立臺灣大學 2002 Ultralow leakage characteristics of ultrathin gate oxides (~3 nm) prepared by anodization followed by high-temperature annealing Ting, Chieh-Chih; Shih, Yen-Hao; Hwu, Jenn-Gwo
國立臺灣大學 2002 Local Thinning-Induced Oxide Nonuniformity Effect on the Tunneling Current of Ultrathin Gate Oxide Hong, Chao-Chi; Chen, Wei-Ren; Hwu, Jenn-Gwo
國立臺灣大學 2002 Effect of Mechanical Stress on Characteristics of Silicon Thermal Oxides Yen, Jui-Yuan; Huang, Chia-Hong; Hwu, Jenn-Gwo
國立臺灣大學 2002 Improvement in Ultrathin Rapid Thermal Oxide Uniformity by the Control of Gas Flow Hong, Chao-Chi; Yen, Yuh-Ren; Su, Jiann-Liang; Hwu, Jenn-Gwo
國立臺灣大學 2002 Improvement of oxide thickness uniformity by high then low O2 pressure oxidation in rapid thermal processing Hong, Chao-Chi; Chen, Jenn-Long; Hwu, Jenn-Gwo

Showing items 61-70 of 210  (21 Page(s) Totally)
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