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臺大學術典藏 2021-08-03T00:39:52Z Aluminum Oxide at the Monolayer Limit via Oxidant-Free Plasma-Assisted Atomic Layer Deposition on GaN A. Henning; J. D. Bartl; A. Zeidler; S. Qian; O. Bienek; C.-M. Jiang; C. Paulus; B. Rieger; M. Stutzmann; I. D. Sharp; CHANG-MING JIANG

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