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| 國立交通大學 |
2014-12-08T15:46:15Z |
Characterization and modeling of out-diffusion of manganese and zinc impurities from deep ultraviolet photoresist
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Wang, MY; Ko, FH; Wang, TK; Yang, CC; Huang, TY |
| 國立交通大學 |
2014-12-08T15:45:57Z |
Evaluation of metal migration and determination of trace metals after microwave digestion for lithographic materials
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Ko, FH; Wang, MY; Wang, TK |
| 國立交通大學 |
2014-12-08T15:45:40Z |
Evaluation of cleaning efficiency with a radioactive tracer and development of a microwave digestion method for semiconductor processes
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Lu, JK; Ko, FH; Chu, TC; Sun, YC; Wang, MY; Wang, TK |
| 國立交通大學 |
2014-12-08T15:44:48Z |
Migration-adsorption mechanism of metallic impurities out of chemically amplified photoresist onto silicon-based substrates
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Yang, CC; Ko, FH; Wang, MY; Wang, TK; Wu, SC |
| 國立交通大學 |
2014-12-08T15:43:51Z |
Characterization and modeling of the metal diffusion from deep ultraviolet photoresist and silicon-based substrate
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Wang, TK; Wang, MY; Ko, FH; Tseng, CL |
| 國立交通大學 |
2014-12-08T15:43:50Z |
One-step cleaning solution to replace the conventional RCA two-step cleaning recipe for pregate oxide cleaning
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Pan, TM; Lei, TF; Chao, TS; Liaw, MC; Ko, FH; Lu, CP |
| 國立交通大學 |
2014-12-08T15:43:18Z |
Comparison of novel cleaning solutions, with various chelating agents for post-CMP cleaning on poly-Si film
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Pan, TM; Lei, TF; Ko, FH; Chao, TS; Chiu, TH; Lee, YH; Lu, CP |
| 國立交通大學 |
2014-12-08T15:42:23Z |
Performance evaluation of cleaning solutions enhanced with tetraalkylammonium hydroxide substituents for post-CMP cleaning on poly-Si film
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Pan, TM; Lei, TF; Ko, FH; Chao, TS; Liaw, MC; Lee, YH; Lu, CP |
| 國立交通大學 |
2014-12-08T15:40:48Z |
Mechanism and modeling of ring pattern formation for electron beam exposure on Zwitterresist
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Chen, JK; Ko, FH; Chen, HL; Chang, FC |
| 國立交通大學 |
2014-12-08T15:39:00Z |
Fabrication of sub-60-nm contact holes in silicon dioxide layers
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Ko, FH; You, HC; Chu, TC; Lei, TF; Hsu, CC; Chen, HL |
Showing items 1-10 of 34 (4 Page(s) Totally)
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