臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)

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Institution	Date	Title	Author
義守大學	2012-05	Improvement on Interface Quality and Reliability Properties of HfAlOx MIS Capacitor with Dual Plasma Treatment	Kow-Ming Chang;Ting-Chia Chang;Po-Chun Chang;Bo-Wen Huang;Chien-Hung Wu;I-Chung Deng
義守大學	2012-04	Characteristics of IGZO TFT Prepared by Atmospheric Pressure Plasma Jet Using PE-ALD Al2O3 Gate Dielectric	Chien-Hung Wu;Kow-Ming Chang;Sung-Hung Huang;I-Chung Deng;Chin-Jyi Wu;Wei-Han Chiang;Chia-Chiang Chang
義守大學	2012-01	Resistance Switching in Ni/HfOx/Ni Nonvolatile Memory Device with CF4/O2 Plasma Post-treatment	Chiung-Hui Lai;Te-Shun Chang;Wen-Hsien Tzeng;Kow-Ming Chang
義守大學	2011-07	Bipolar resistive switching effect in Gd2O3 films for transparent memory application	Kou-Chen Liu;Wen-Hsien Tzeng;Kow-Ming Chang;Yi-Chun Chan;Chun-Chih Kuo
義守大學	2011-05	Transparent conductive indium-doped zinc oxide films prepared by atmospheric pressure plasma jet	Kow-Ming Chang;Sung-Hung Huang;Chin-Jyi Wu;Wei-Li Lin;Wei-Chiang Chen;Chia-Wei Chi;Je-Wei Lin;Chia-Chiang Chang
義守大學	2011-05	The Effect of Different Carrier Gases and Channel Thicknesses on the Characteristics of ZnO TFTs Prepared by Atmospheric Pressure Plasma Jet	Kow-Ming Chang;Sung-Hung Huang;Chia-Wei Chi;Chin-Jyi Wu;Je-Wei Lin;Chia-Chiang Chang
義守大學	2011-05	Bipolar resistive switching characteristics of Gd2O3 thin film structure	Kow-Ming Chang;Wen-Hsien Tzeng;Kou-Chen Liu;Yi-Chun Chan;Chun-Chih Kuo
義守大學	2011-05	The α-Si/SiGe Core/Shell Nano-Wire as Highly Sensitive Bio-Sensor	Kow-Ming Chang;Chu-Feng Chen;Chiung-Hui Lai;Chung-Hsien Liu;Yu-Bin Wang;Chin-Ning Wu;Cheng-Ting Hsieh
義守大學	2011-05	Performance Improvement of Pentacene-Based Organic Thin-Film Transistor with HfO2 Gate Dielectrics Treated by CF4 Plasma	Kow-Ming Chang;Sung-Hung Huang;Yi-Wen Tseng
義守大學	2011-05	Effect of the Mixed N2/O2 Oxidation Process on Improvement of the Sensitivity of the SiGe Nano-Wire	Kow-Ming Chang;Chu-Feng Chen;Chiung-Hui Lai;Yu-Bin Wang;Chung-Hsien Liu;Cheng-Ting Hsieh;Chin-Ning Wu
義守大學	2011-05	Improvement on Electrical Characteristics of HfO2 MIS Capacitor with Dual Plasma Treatment	Kow-Ming Chang;Ting-Chia Chang;Hshu-Wei Chen

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