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教育部委託研究計畫      計畫執行:國立臺灣大學圖書館
 
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機構 日期 題名 作者
義守大學 2012-05 Improvement on Interface Quality and Reliability Properties of HfAlOx MIS Capacitor with Dual Plasma Treatment Kow-Ming Chang;Ting-Chia Chang;Po-Chun Chang;Bo-Wen Huang;Chien-Hung Wu;I-Chung Deng
義守大學 2012-04 Characteristics of IGZO TFT Prepared by Atmospheric Pressure Plasma Jet Using PE-ALD Al2O3 Gate Dielectric Chien-Hung Wu;Kow-Ming Chang;Sung-Hung Huang;I-Chung Deng;Chin-Jyi Wu;Wei-Han Chiang;Chia-Chiang Chang
義守大學 2012-01 Resistance Switching in Ni/HfOx/Ni Nonvolatile Memory Device with CF4/O2 Plasma Post-treatment Chiung-Hui Lai;Te-Shun Chang;Wen-Hsien Tzeng;Kow-Ming Chang
義守大學 2011-07 Bipolar resistive switching effect in Gd2O3 films for transparent memory application Kou-Chen Liu;Wen-Hsien Tzeng;Kow-Ming Chang;Yi-Chun Chan;Chun-Chih Kuo
義守大學 2011-05 Transparent conductive indium-doped zinc oxide films prepared by atmospheric pressure plasma jet Kow-Ming Chang;Sung-Hung Huang;Chin-Jyi Wu;Wei-Li Lin;Wei-Chiang Chen;Chia-Wei Chi;Je-Wei Lin;Chia-Chiang Chang
義守大學 2011-05 The Effect of Different Carrier Gases and Channel Thicknesses on the Characteristics of ZnO TFTs Prepared by Atmospheric Pressure Plasma Jet Kow-Ming Chang;Sung-Hung Huang;Chia-Wei Chi;Chin-Jyi Wu;Je-Wei Lin;Chia-Chiang Chang
義守大學 2011-05 Bipolar resistive switching characteristics of Gd2O3 thin film structure Kow-Ming Chang;Wen-Hsien Tzeng;Kou-Chen Liu;Yi-Chun Chan;Chun-Chih Kuo
義守大學 2011-05 The α-Si/SiGe Core/Shell Nano-Wire as Highly Sensitive Bio-Sensor Kow-Ming Chang;Chu-Feng Chen;Chiung-Hui Lai;Chung-Hsien Liu;Yu-Bin Wang;Chin-Ning Wu;Cheng-Ting Hsieh
義守大學 2011-05 Performance Improvement of Pentacene-Based Organic Thin-Film Transistor with HfO2 Gate Dielectrics Treated by CF4 Plasma Kow-Ming Chang;Sung-Hung Huang;Yi-Wen Tseng
義守大學 2011-05 Effect of the Mixed N2/O2 Oxidation Process on Improvement of the Sensitivity of the SiGe Nano-Wire Kow-Ming Chang;Chu-Feng Chen;Chiung-Hui Lai;Yu-Bin Wang;Chung-Hsien Liu;Cheng-Ting Hsieh;Chin-Ning Wu
義守大學 2011-05 Improvement on Electrical Characteristics of HfO2 MIS Capacitor with Dual Plasma Treatment Kow-Ming Chang;Ting-Chia Chang;Hshu-Wei Chen

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