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Institution Date Title Author
臺大學術典藏 2022-01-03T08:01:26Z Method for calibrating a Manufacturing process model Kuen-Yu Tsai*; Alek C. Chen;  Jia-Han Li; JIA-HAN LI
臺大學術典藏 2022-01-03T08:01:20Z Simulation and fabrication results of electron optical systems for massively parallel maskless lithography Hoi-Tou Ng; Chien-Chieh Huang; Hsing-Hong Chen; Shin-Chuan Chen; Ken-Hsien Hsieh; Kuen-Yu Tsai*;  Jia-Han Li; JIA-HAN LI
臺大學術典藏 2022-01-03T08:01:19Z Effects of Fresnel zone plate fabrication errors on focusing performances Ting-Hang Pei; Kuen-Yu Tsai*;  Jia-Han Li; JIA-HAN LI
臺大學術典藏 2022-01-03T08:01:18Z High spatial resolution and large field intensity by a set of two modified zone plates Zhan-Yu Liu; Yao-Jen Tsai;  Jia-Han Li; Kuen-Yu Tsai; JIA-HAN LI
臺大學術典藏 2022-01-03T08:01:17Z Iterative finite-difference method for analyzing fabrication errors of lens-misaligned electron-beam direct-write lithography system Yen-Min Lee;  Jia-Han Li*; Sheng-Yung Chen; Shiau-Yi Ma; Kuen-Yu Tsai; Tony Wen-Hann Sheu; Jia-Yush Yen; JIA-HAN LI
臺大學術典藏 2022-01-03T08:01:17Z Fabrication of metrology test structures with programmed line edge roughness using electron beam direct write Fu-Min Wang; Kuen-Yu Tsai;  Jia-Han Li; Alek C. Chen; Yen-Min Lee; Yu-Tian Shen; Hsin-Hung Cheng; Chieh-Hsiang Kuan; JIA-HAN LI
臺大學術典藏 2022-01-03T08:01:15Z Optical metrology of shape-varying nano-patterned gratings by analyzing the scattering signals in their pupil images Yen-Min Lee;  Jia-Han Li*; Fu-Min Wang; Hsin-Hung Cheng; Yu-Tian Shen;   Kuen-Yu Tsai; Alek C. Chen; JIA-HAN LI
臺大學術典藏 2022-01-03T08:01:14Z Solution-refined method for solving large-scale computation problems: Taking the Laplace’s equation as an example Yen-Min Lee;  Jia-Han Li*; Tony Wen-Hann Sheu; Kuen-Yu Tsai; Jia-Yush Yen; JIA-HAN LI
臺大學術典藏 2022-01-03T08:01:13Z Solution-refined method for solving large-scale electrostatic problems: Taking the electron-beam direct-write lithography system as an example Yen-Min Lee;  Jia-Han Li; Tony Wen-Hann Sheu; Kuen-Yu Tsai; Jia-Yu Yen; JIA-HAN LI
臺大學術典藏 2022-01-03T08:01:10Z A new EUV mask blank defect inspection method with coherent diffraction imaging Ding Qi; Kuen-Yu Tsai;  Jia-Han Li; JIA-HAN LI

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