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Showing items 186-195 of 313  (32 Page(s) Totally)
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Institution Date Title Author
臺大學術典藏 2018-09-10T08:18:26Z Impact of process effects correction strategies on critical dimension and electrical characteristics variabilities in extreme ultraviolet lithography Philip C. W. Ng;Sheng-Wei Chien;Bo-Sen Chang;Kuen-Yu Tsai;Yi-Chang Lu; Philip C. W. Ng; Sheng-Wei Chien; Bo-Sen Chang; Kuen-Yu Tsai; Yi-Chang Lu; KUEN-YU TSAI
臺大學術典藏 2018-09-10T08:18:26Z Impact of process effects correction strategies on critical dimension and electrical characteristics variabilities in extreme ultraviolet lithography Philip C. W. Ng;Sheng-Wei Chien;Bo-Sen Chang;Kuen-Yu Tsai;Yi-Chang Lu; Philip C. W. Ng; Sheng-Wei Chien; Bo-Sen Chang; Kuen-Yu Tsai; Yi-Chang Lu; KUEN-YU TSAI
臺大學術典藏 2018-09-10T08:18:26Z Impact of process effects correction strategies on critical dimension and electrical characteristics variabilities in extreme ultraviolet lithography Philip C. W. Ng;Sheng-Wei Chien;Bo-Sen Chang;Kuen-Yu Tsai;Yi-Chang Lu; Philip C. W. Ng; Sheng-Wei Chien; Bo-Sen Chang; Kuen-Yu Tsai; Yi-Chang Lu; KUEN-YU TSAI
臺大學術典藏 2018-09-10T08:18:26Z Fabrication of metrology test structures with programmed line edge roughness using electron beam direct write Fu-Min Wang;Kuen-Yu Tsai;Jia-Han Li;Alek C. Chen;Yen-Min Lee;Yu-Tian Shen;Hsin-Hung Cheng;Chieh-Hsiang Kuan; Fu-Min Wang; Kuen-Yu Tsai; Jia-Han Li; Alek C. Chen; Yen-Min Lee; Yu-Tian Shen; Hsin-Hung Cheng; Chieh-Hsiang Kuan; KUEN-YU TSAI
臺大學術典藏 2018-09-10T08:18:26Z Fabrication of metrology test structures with programmed line edge roughness using electron beam direct write Fu-Min Wang;Kuen-Yu Tsai;Jia-Han Li;Alek C. Chen;Yen-Min Lee;Yu-Tian Shen;Hsin-Hung Cheng;Chieh-Hsiang Kuan; Fu-Min Wang; Kuen-Yu Tsai; Jia-Han Li; Alek C. Chen; Yen-Min Lee; Yu-Tian Shen; Hsin-Hung Cheng; Chieh-Hsiang Kuan; KUEN-YU TSAI
臺大學術典藏 2018-09-10T08:18:26Z Fabrication of metrology test structures with programmed line edge roughness using electron beam direct write Fu-Min Wang;Kuen-Yu Tsai;Jia-Han Li;Alek C. Chen;Yen-Min Lee;Yu-Tian Shen;Hsin-Hung Cheng;Chieh-Hsiang Kuan; Fu-Min Wang; Kuen-Yu Tsai; Jia-Han Li; Alek C. Chen; Yen-Min Lee; Yu-Tian Shen; Hsin-Hung Cheng; Chieh-Hsiang Kuan; KUEN-YU TSAI
臺大學術典藏 2018-09-10T08:18:26Z Iterative finite-difference method for analyzing fabrication errors of lens-misaligned electron-beam direct-write lithography system Yen-Min Lee;Jia-Han Li;Sheng-Yung Chen;Shiau-Yi Ma;Kuen-Yu Tsai;Tony W. H. Sheu;Jia-Yush Yen; Yen-Min Lee; Jia-Han Li; Sheng-Yung Chen; Shiau-Yi Ma; Kuen-Yu Tsai; Tony W. H. Sheu; Jia-Yush Yen; KUEN-YU TSAI
臺大學術典藏 2018-09-10T08:18:26Z Iterative finite-difference method for analyzing fabrication errors of lens-misaligned electron-beam direct-write lithography system Yen-Min Lee;Jia-Han Li;Sheng-Yung Chen;Shiau-Yi Ma;Kuen-Yu Tsai;Tony W. H. Sheu;Jia-Yush Yen; Yen-Min Lee; Jia-Han Li; Sheng-Yung Chen; Shiau-Yi Ma; Kuen-Yu Tsai; Tony W. H. Sheu; Jia-Yush Yen; KUEN-YU TSAI
臺大學術典藏 2018-09-10T08:18:26Z Iterative finite-difference method for analyzing fabrication errors of lens-misaligned electron-beam direct-write lithography system Yen-Min Lee;Jia-Han Li;Sheng-Yung Chen;Shiau-Yi Ma;Kuen-Yu Tsai;Tony W. H. Sheu;Jia-Yush Yen; Yen-Min Lee; Jia-Han Li; Sheng-Yung Chen; Shiau-Yi Ma; Kuen-Yu Tsai; Tony W. H. Sheu; Jia-Yush Yen; KUEN-YU TSAI
臺大學術典藏 2018-09-10T08:18:25Z High spatial resolution and large field intensity by a set of two modified zone plates Zhan-Yu Liu;Yao-Jen Tsai;Jia-Han Li;Kuen-Yu Tsai; Zhan-Yu Liu; Yao-Jen Tsai; Jia-Han Li; Kuen-Yu Tsai; KUEN-YU TSAI

Showing items 186-195 of 313  (32 Page(s) Totally)
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