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显示项目 146-170 / 313 (共13页)
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机构	日期	题名	作者
臺大學術典藏	2018-09-10T08:46:35Z	Charged-Particle-Beam Patterning Without Resist	Kuen-Yu Tsai;Miin-Jang Chen;Samuel C. Pan; Kuen-Yu Tsai; Miin-Jang Chen; Samuel C. Pan; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:35Z	Multilayer Mirror Structure	Jia-Han Li;Yen-Min Lee;Kuen-Yu Tsai; Jia-Han Li; Yen-Min Lee; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:35Z	Multilayer Mirror Structure	Jia-Han Li;Yen-Min Lee;Kuen-Yu Tsai; Jia-Han Li; Yen-Min Lee; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:35Z	Multilayer Mirror Structure	Jia-Han Li;Yen-Min Lee;Kuen-Yu Tsai; Jia-Han Li; Yen-Min Lee; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:34Z	Method for Adjusting Status of Particle Beams for Patterning A Substrate And System Using The Same	Kuen-Yu Tsai;Sheng-Yung Chen; Kuen-Yu Tsai; Sheng-Yung Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:34Z	Method for Adjusting Status of Particle Beams for Patterning A Substrate And System Using The Same	Kuen-Yu Tsai;Sheng-Yung Chen; Kuen-Yu Tsai; Sheng-Yung Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:34Z	Method for Adjusting Status of Particle Beams for Patterning A Substrate And System Using The Same	Kuen-Yu Tsai;Sheng-Yung Chen; Kuen-Yu Tsai; Sheng-Yung Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:34Z	Apparatus and Method for Estimating Change of Status of Particle Beams	Kuen-Yu Tsai;Sheng-Yung Chen; Kuen-Yu Tsai; Sheng-Yung Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:34Z	Apparatus and Method for Estimating Change of Status of Particle Beams	Kuen-Yu Tsai;Sheng-Yung Chen; Kuen-Yu Tsai; Sheng-Yung Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:34Z	Apparatus and Method for Estimating Change of Status of Particle Beams	Kuen-Yu Tsai;Sheng-Yung Chen; Kuen-Yu Tsai; Sheng-Yung Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:34Z	Method and Computer-Aided Design System Of Manufacturing An Optical System	Kuen-Yu Tsai;Sheng-Yung Chen;Shih-Chuan Chen; Kuen-Yu Tsai; Sheng-Yung Chen; Shih-Chuan Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:34Z	Method and Computer-Aided Design System Of Manufacturing An Optical System	Kuen-Yu Tsai;Sheng-Yung Chen;Shih-Chuan Chen; Kuen-Yu Tsai; Sheng-Yung Chen; Shih-Chuan Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:34Z	Method and Computer-Aided Design System Of Manufacturing An Optical System	Kuen-Yu Tsai;Sheng-Yung Chen;Shih-Chuan Chen; Kuen-Yu Tsai; Sheng-Yung Chen; Shih-Chuan Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:34Z	Method and System for Establishing Parametric Model (參數化模型的建立方法及系統)	Kuen-Yu Tsai;Chun-Hung Liu; Kuen-Yu Tsai; Chun-Hung Liu; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:34Z	Method and System for Establishing Parametric Model (參數化模型的建立方法及系統)	Kuen-Yu Tsai;Chun-Hung Liu; Kuen-Yu Tsai; Chun-Hung Liu; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:34Z	Method and System for Establishing Parametric Model (參數化模型的建立方法及系統)	Kuen-Yu Tsai;Chun-Hung Liu; Kuen-Yu Tsai; Chun-Hung Liu; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:34Z	Method for Calibrating A Manufacturing Process Model (National Taiwan University/ASML Holding N.V.)	Kuen-Yu Tsai;Alek C. Chen;Jia-Han Li; Kuen-Yu Tsai; Alek C. Chen; Jia-Han Li; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:34Z	Method for Calibrating A Manufacturing Process Model (National Taiwan University/ASML Holding N.V.)	Kuen-Yu Tsai;Alek C. Chen;Jia-Han Li; Kuen-Yu Tsai; Alek C. Chen; Jia-Han Li; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:34Z	Method for Calibrating A Manufacturing Process Model (National Taiwan University/ASML Holding N.V.)	Kuen-Yu Tsai;Alek C. Chen;Jia-Han Li; Kuen-Yu Tsai; Alek C. Chen; Jia-Han Li; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:34Z	Projection Patterning With Exposure Mask	Kuen-Yu Tsai;Miin-Jang Chen;Si-Chen Lee; Kuen-Yu Tsai; Miin-Jang Chen; Si-Chen Lee; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:34Z	Projection Patterning With Exposure Mask	Kuen-Yu Tsai;Miin-Jang Chen;Si-Chen Lee; Kuen-Yu Tsai; Miin-Jang Chen; Si-Chen Lee; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:34Z	Projection Patterning With Exposure Mask	Kuen-Yu Tsai;Miin-Jang Chen;Si-Chen Lee; Kuen-Yu Tsai; Miin-Jang Chen; Si-Chen Lee; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:33Z	Non-delta-chrome optical proximity correction methodology for process models with three-dimensional mask effects	Philip C. W. Ng; Kuen-Yu Tsai; Lawrence S. Melvin III; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:33Z	Non-delta-chrome optical proximity correction methodology for process models with three-dimensional mask effects	Philip C. W. Ng; Kuen-Yu Tsai; Lawrence S. Melvin III; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:33Z	Lithography-patterning-fidelity-aware electron-optical system design optimization	Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; Hsing-Hong Chen; Chun-Hung Liu; Kuen-Yu Tsai; KUEN-YU TSAI

显示项目 146-170 / 313 (共13页)
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