臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)

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臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)

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機構	日期	題名	作者
臺大學術典藏	2018-09-10T08:18:22Z	10 nm lines with 14 nm half pitch grating written in HSQ by electron beam direct write at 5 keV	Fu-Min Wang;Susumu Ono;Hsin-Hung Su;Kuen-Yu Tsai;Chieh-Hsiung Kuan; Fu-Min Wang; Susumu Ono; Hsin-Hung Su; Kuen-Yu Tsai; Chieh-Hsiung Kuan; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:22Z	A non-delta-chrome OPC methodology for nonlinear process models	Philip C. W. Ng;Kuen-Yu Tsai;Lawrence S. Melvin III; Philip C. W. Ng; Kuen-Yu Tsai; Lawrence S. Melvin III; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:22Z	A non-delta-chrome OPC methodology for nonlinear process models	Philip C. W. Ng;Kuen-Yu Tsai;Lawrence S. Melvin III; Philip C. W. Ng; Kuen-Yu Tsai; Lawrence S. Melvin III; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:22Z	A non-delta-chrome OPC methodology for nonlinear process models	Philip C. W. Ng;Kuen-Yu Tsai;Lawrence S. Melvin III; Philip C. W. Ng; Kuen-Yu Tsai; Lawrence S. Melvin III; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:21Z	Stochastic simulation of photon scattering for EUV mask defect inspection	Ting-Hang Pei;Kuen-Yu Tsai;Jia-Han Li; Ting-Hang Pei; Kuen-Yu Tsai; Jia-Han Li; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:21Z	Stochastic simulation of photon scattering for EUV mask defect inspection	Ting-Hang Pei;Kuen-Yu Tsai;Jia-Han Li; Ting-Hang Pei; Kuen-Yu Tsai; Jia-Han Li; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:21Z	Stochastic simulation of photon scattering for EUV mask defect inspection	Ting-Hang Pei;Kuen-Yu Tsai;Jia-Han Li; Ting-Hang Pei; Kuen-Yu Tsai; Jia-Han Li; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:21Z	Model-based proximity effect correction for electron-beam direct-write lithography	Yu-Tian Shen; Kuen-Yu Tsai; KUEN-YU TSAI; Chun-Hung Liu;Pei-Lin Tien;Philip C. W. Ng;Yu-Tian Shen;Kuen-Yu Tsai; Chun-Hung Liu; Pei-Lin Tien; Philip C. W. Ng
臺大學術典藏	2018-09-10T08:18:21Z	Model-based proximity effect correction for electron-beam direct-write lithography	Yu-Tian Shen; Kuen-Yu Tsai; KUEN-YU TSAI; Chun-Hung Liu;Pei-Lin Tien;Philip C. W. Ng;Yu-Tian Shen;Kuen-Yu Tsai; Chun-Hung Liu; Pei-Lin Tien; Philip C. W. Ng
臺大學術典藏	2018-09-10T08:18:21Z	Model-based proximity effect correction for electron-beam direct-write lithography	Yu-Tian Shen; Kuen-Yu Tsai; KUEN-YU TSAI; Chun-Hung Liu;Pei-Lin Tien;Philip C. W. Ng;Yu-Tian Shen;Kuen-Yu Tsai; Chun-Hung Liu; Pei-Lin Tien; Philip C. W. Ng

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