| 臺大學術典藏 |
2018-09-10T08:18:21Z |
Analysis of fabrication misalignment effects in a MEMS-based electron-optical system design for direct-write lithography
|
Sheng-Yung Chen;Chieh-Chien Huang;Shin-Chuan Chen;Ting-Han Pei;Kuen-Yu Tsai; Sheng-Yung Chen; Chieh-Chien Huang; Shin-Chuan Chen; Ting-Han Pei; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:20Z |
Fresnel zone plate manufacturability analysis for direct-write lithography by simulating focusing and patterning performance versus fabrication errors
|
Kuen-Yu Tsai; Sheng-Yung Chen; Ting-Han Pei; Jia-Han Li; KUEN-YU TSAI; Kuen-Yu Tsai;Sheng-Yung Chen;Ting-Han Pei;Jia-Han Li |
| 臺大學術典藏 |
2018-09-10T08:18:20Z |
Fresnel zone plate manufacturability analysis for direct-write lithography by simulating focusing and patterning performance versus fabrication errors
|
Kuen-Yu Tsai; Sheng-Yung Chen; Ting-Han Pei; Jia-Han Li; KUEN-YU TSAI; Kuen-Yu Tsai;Sheng-Yung Chen;Ting-Han Pei;Jia-Han Li |
| 臺大學術典藏 |
2018-09-10T08:18:20Z |
Fresnel zone plate manufacturability analysis for direct-write lithography by simulating focusing and patterning performance versus fabrication errors
|
Kuen-Yu Tsai; Sheng-Yung Chen; Ting-Han Pei; Jia-Han Li; KUEN-YU TSAI; Kuen-Yu Tsai;Sheng-Yung Chen;Ting-Han Pei;Jia-Han Li |
| 臺大學術典藏 |
2018-09-10T08:18:20Z |
Efficient scattering simulations for equivalent extreme ultraviolet mask multilayer structures by modified transmission line theory and finite-difference time-domain method
|
Yen-Min Lee;Jia-Han Li;Philip C. W. Ng;Ting-Hang Pei;Fu-Min Wang;Kuen-Yu Tsai;Alek C. Chen; Yen-Min Lee; Jia-Han Li; Philip C. W. Ng; Ting-Hang Pei; Fu-Min Wang; Kuen-Yu Tsai; Alek C. Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:20Z |
Efficient scattering simulations for equivalent extreme ultraviolet mask multilayer structures by modified transmission line theory and finite-difference time-domain method
|
Yen-Min Lee;Jia-Han Li;Philip C. W. Ng;Ting-Hang Pei;Fu-Min Wang;Kuen-Yu Tsai;Alek C. Chen; Yen-Min Lee; Jia-Han Li; Philip C. W. Ng; Ting-Hang Pei; Fu-Min Wang; Kuen-Yu Tsai; Alek C. Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:20Z |
Efficient scattering simulations for equivalent extreme ultraviolet mask multilayer structures by modified transmission line theory and finite-difference time-domain method
|
Yen-Min Lee;Jia-Han Li;Philip C. W. Ng;Ting-Hang Pei;Fu-Min Wang;Kuen-Yu Tsai;Alek C. Chen; Yen-Min Lee; Jia-Han Li; Philip C. W. Ng; Ting-Hang Pei; Fu-Min Wang; Kuen-Yu Tsai; Alek C. Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:20Z |
A new method to improve accuracy of parasitics extraction considering sub-wavelength lithography effects
|
Kuen-Yu Tsai;Wei-Jhih Hsieh;Yuan-Ching Lu;Bo-Sen Chang;Sheng-Wei Chien;Yi-Chang Lu; Kuen-Yu Tsai; Wei-Jhih Hsieh; Yuan-Ching Lu; Bo-Sen Chang; Sheng-Wei Chien; Yi-Chang Lu; YI-CHANG LU; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:20Z |
A new method to improve accuracy of parasitics extraction considering sub-wavelength lithography effects
|
Kuen-Yu Tsai;Wei-Jhih Hsieh;Yuan-Ching Lu;Bo-Sen Chang;Sheng-Wei Chien;Yi-Chang Lu; Kuen-Yu Tsai; Wei-Jhih Hsieh; Yuan-Ching Lu; Bo-Sen Chang; Sheng-Wei Chien; Yi-Chang Lu; YI-CHANG LU; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:20Z |
A new method to improve accuracy of parasitics extraction considering sub-wavelength lithography effects
|
Kuen-Yu Tsai;Wei-Jhih Hsieh;Yuan-Ching Lu;Bo-Sen Chang;Sheng-Wei Chien;Yi-Chang Lu; Kuen-Yu Tsai; Wei-Jhih Hsieh; Yuan-Ching Lu; Bo-Sen Chang; Sheng-Wei Chien; Yi-Chang Lu; YI-CHANG LU; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:19Z |
Manufacturability analysis of a micro-electro-mechanical systems–based electron-optical system design for direct-write lithography
|
Sheng-Yung Chen;Shin-Chuan Chen;Hsing-Hong Chen;Kuen-Yu Tsai;Hsin-Hung Pan; Sheng-Yung Chen; Shin-Chuan Chen; Hsing-Hong Chen; Kuen-Yu Tsai; Hsin-Hung Pan; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:19Z |
Manufacturability analysis of a micro-electro-mechanical systems–based electron-optical system design for direct-write lithography
|
Sheng-Yung Chen;Shin-Chuan Chen;Hsing-Hong Chen;Kuen-Yu Tsai;Hsin-Hung Pan; Sheng-Yung Chen; Shin-Chuan Chen; Hsing-Hong Chen; Kuen-Yu Tsai; Hsin-Hung Pan; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:19Z |
Manufacturability analysis of a micro-electro-mechanical systems–based electron-optical system design for direct-write lithography
|
Sheng-Yung Chen;Shin-Chuan Chen;Hsing-Hong Chen;Kuen-Yu Tsai;Hsin-Hung Pan; Sheng-Yung Chen; Shin-Chuan Chen; Hsing-Hong Chen; Kuen-Yu Tsai; Hsin-Hung Pan; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:08:47Z |
Architecture for next generation massively parallel maskless lithography system (MPML2)
|
Su, M.-S.;Tsai, K.-Y.;Lu, Y.-C.;Kuo, Y.-H.;Pei, T.-H.;Yen, J.-Y.; Su, M.-S.; Tsai, K.-Y.; Lu, Y.-C.; Kuo, Y.-H.; Pei, T.-H.; Yen, J.-Y.; YI-CHANG LU; KUEN-YU TSAI; JIA-YUSH YEN |
| 臺大學術典藏 |
2018-09-10T07:42:07Z |
Using transmission line theory to calculate equivalent refractive index of EUV mask multilayer structures for efficient scattering simulation by finite-difference time-domain method
|
Yen-Min Lee;Jia-Han Li;Philip C. W. Ng;Ting-Han Pei;Fu-Min Wang;Kuen-Yu Tsai;Alek C. Chen; Yen-Min Lee; Jia-Han Li; Philip C. W. Ng; Ting-Han Pei; Fu-Min Wang; Kuen-Yu Tsai; Alek C. Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:07Z |
Using transmission line theory to calculate equivalent refractive index of EUV mask multilayer structures for efficient scattering simulation by finite-difference time-domain method
|
Yen-Min Lee;Jia-Han Li;Philip C. W. Ng;Ting-Han Pei;Fu-Min Wang;Kuen-Yu Tsai;Alek C. Chen; Yen-Min Lee; Jia-Han Li; Philip C. W. Ng; Ting-Han Pei; Fu-Min Wang; Kuen-Yu Tsai; Alek C. Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:07Z |
Using transmission line theory to calculate equivalent refractive index of EUV mask multilayer structures for efficient scattering simulation by finite-difference time-domain method
|
Yen-Min Lee;Jia-Han Li;Philip C. W. Ng;Ting-Han Pei;Fu-Min Wang;Kuen-Yu Tsai;Alek C. Chen; Yen-Min Lee; Jia-Han Li; Philip C. W. Ng; Ting-Han Pei; Fu-Min Wang; Kuen-Yu Tsai; Alek C. Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:07Z |
Determination of Gaussian beam and raster scan parameters in electron-beam-direct-write lithography considering device patterning and performance variability
|
Hoi-Tou Ng;Chun-Hung Liu;Hsing-Hong Chen;Kuen-Yu Tsai; Hoi-Tou Ng; Chun-Hung Liu; Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:07Z |
Determination of Gaussian beam and raster scan parameters in electron-beam-direct-write lithography considering device patterning and performance variability
|
Hoi-Tou Ng;Chun-Hung Liu;Hsing-Hong Chen;Kuen-Yu Tsai; Hoi-Tou Ng; Chun-Hung Liu; Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:07Z |
Determination of Gaussian beam and raster scan parameters in electron-beam-direct-write lithography considering device patterning and performance variability
|
Hoi-Tou Ng;Chun-Hung Liu;Hsing-Hong Chen;Kuen-Yu Tsai; Hoi-Tou Ng; Chun-Hung Liu; Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:07Z |
High resolution electron beam direct write on ZEP520 at 5 KeV
|
Fu-Min Wang;S. Ono;Hsing-Hong Su;Kuen-Yu Tsai;Chieh-Hsiung Kuan; Fu-Min Wang; S. Ono; Hsing-Hong Su; Kuen-Yu Tsai; Chieh-Hsiung Kuan; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:07Z |
High resolution electron beam direct write on ZEP520 at 5 KeV
|
Fu-Min Wang;S. Ono;Hsing-Hong Su;Kuen-Yu Tsai;Chieh-Hsiung Kuan; Fu-Min Wang; S. Ono; Hsing-Hong Su; Kuen-Yu Tsai; Chieh-Hsiung Kuan; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:07Z |
High resolution electron beam direct write on ZEP520 at 5 KeV
|
Fu-Min Wang;S. Ono;Hsing-Hong Su;Kuen-Yu Tsai;Chieh-Hsiung Kuan; Fu-Min Wang; S. Ono; Hsing-Hong Su; Kuen-Yu Tsai; Chieh-Hsiung Kuan; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:07Z |
Manufacturability analysis of a MEMS-based electron-optical system design for direct-write lithography
|
Sheng-Yung Chen;Shin-Chuan Chen;Hsing-Hong Chen;Ting-Han Pei;Kuen-Yu Tsai;Hsin-Hung Pan; Sheng-Yung Chen; Shin-Chuan Chen; Hsing-Hong Chen; Ting-Han Pei; Kuen-Yu Tsai; Hsin-Hung Pan; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:07Z |
Manufacturability analysis of a MEMS-based electron-optical system design for direct-write lithography
|
Sheng-Yung Chen;Shin-Chuan Chen;Hsing-Hong Chen;Ting-Han Pei;Kuen-Yu Tsai;Hsin-Hung Pan; Sheng-Yung Chen; Shin-Chuan Chen; Hsing-Hong Chen; Ting-Han Pei; Kuen-Yu Tsai; Hsin-Hung Pan; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:07Z |
Manufacturability analysis of a MEMS-based electron-optical system design for direct-write lithography
|
Sheng-Yung Chen;Shin-Chuan Chen;Hsing-Hong Chen;Ting-Han Pei;Kuen-Yu Tsai;Hsin-Hung Pan; Sheng-Yung Chen; Shin-Chuan Chen; Hsing-Hong Chen; Ting-Han Pei; Kuen-Yu Tsai; Hsin-Hung Pan; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:06Z |
A new parametric proximity effect model calibration method for improving accuracy of post-lithography patterning prediction in sub-32-nm half-pitch low-voltage electron beam direct-write lithography
|
Chun-Hung Liu;Hoi-Tou Ng;Kuen-Yu Tsai; Chun-Hung Liu; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:06Z |
A new parametric proximity effect model calibration method for improving accuracy of post-lithography patterning prediction in sub-32-nm half-pitch low-voltage electron beam direct-write lithography
|
Chun-Hung Liu;Hoi-Tou Ng;Kuen-Yu Tsai; Chun-Hung Liu; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:06Z |
A new parametric proximity effect model calibration method for improving accuracy of post-lithography patterning prediction in sub-32-nm half-pitch low-voltage electron beam direct-write lithography
|
Chun-Hung Liu;Hoi-Tou Ng;Kuen-Yu Tsai; Chun-Hung Liu; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:06Z |
A simple design rule check for DP decomposition
|
Chih-Hsien Tang;Kuen-Yu Tsai; Chih-Hsien Tang; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:06Z |
A simple design rule check for DP decomposition
|
Chih-Hsien Tang;Kuen-Yu Tsai; Chih-Hsien Tang; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:06Z |
A simple design rule check for DP decomposition
|
Chih-Hsien Tang;Kuen-Yu Tsai; Chih-Hsien Tang; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:06Z |
Effects of Fresnel zone plate fabrication errors on focusing performances
|
Ting-Hang Pei;Kuen-Yu Tsai;Jia-Han Li; Ting-Hang Pei; Kuen-Yu Tsai; Jia-Han Li; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:06Z |
Effects of Fresnel zone plate fabrication errors on focusing performances
|
Ting-Hang Pei;Kuen-Yu Tsai;Jia-Han Li; Ting-Hang Pei; Kuen-Yu Tsai; Jia-Han Li; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:06Z |
Effects of Fresnel zone plate fabrication errors on focusing performances
|
Ting-Hang Pei;Kuen-Yu Tsai;Jia-Han Li; Ting-Hang Pei; Kuen-Yu Tsai; Jia-Han Li; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:06Z |
A fully model-based methodology for simultaneously correcting EUV mask shadowing and optical proximity effects with improved pattern transfer fidelity and process windows
|
Philip C. W. Ng;Kuen-Yu Tsai;Yen-Min Lee;Ting-Han Pei;Fu-Min Wang;Jia-Han Li;Alek C. Chen; Philip C. W. Ng; Kuen-Yu Tsai; Yen-Min Lee; Ting-Han Pei; Fu-Min Wang; Jia-Han Li; Alek C. Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:06Z |
A fully model-based methodology for simultaneously correcting EUV mask shadowing and optical proximity effects with improved pattern transfer fidelity and process windows
|
Philip C. W. Ng;Kuen-Yu Tsai;Yen-Min Lee;Ting-Han Pei;Fu-Min Wang;Jia-Han Li;Alek C. Chen; Philip C. W. Ng; Kuen-Yu Tsai; Yen-Min Lee; Ting-Han Pei; Fu-Min Wang; Jia-Han Li; Alek C. Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:06Z |
A fully model-based methodology for simultaneously correcting EUV mask shadowing and optical proximity effects with improved pattern transfer fidelity and process windows
|
Philip C. W. Ng;Kuen-Yu Tsai;Yen-Min Lee;Ting-Han Pei;Fu-Min Wang;Jia-Han Li;Alek C. Chen; Philip C. W. Ng; Kuen-Yu Tsai; Yen-Min Lee; Ting-Han Pei; Fu-Min Wang; Jia-Han Li; Alek C. Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:05Z |
Selection of Gaussian-beam and raster-scan parameters in electron-beam direct-write lithography considering device patterning and performance variability
|
Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI; Chun-Hung Liu; Hoi-Tou Ng;Chun-Hung Liu;Hsing-Hong Chen;Kuen-Yu Tsai; Hoi-Tou Ng |
| 臺大學術典藏 |
2018-09-10T07:42:05Z |
Selection of Gaussian-beam and raster-scan parameters in electron-beam direct-write lithography considering device patterning and performance variability
|
Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI; Chun-Hung Liu; Hoi-Tou Ng;Chun-Hung Liu;Hsing-Hong Chen;Kuen-Yu Tsai; Hoi-Tou Ng |
| 臺大學術典藏 |
2018-09-10T07:42:05Z |
Selection of Gaussian-beam and raster-scan parameters in electron-beam direct-write lithography considering device patterning and performance variability
|
Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI; Chun-Hung Liu; Hoi-Tou Ng;Chun-Hung Liu;Hsing-Hong Chen;Kuen-Yu Tsai; Hoi-Tou Ng |
| 臺大學術典藏 |
2018-09-10T07:42:05Z |
Servo system design of a high-resolution piezo-driven fine stage for step-and-repeat microlithography systems
|
Kuen-Yu Tsai; Jia-Yush Yen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:05Z |
Servo system design of a high-resolution piezo-driven fine stage for step-and-repeat microlithography systems
|
Kuen-Yu Tsai; Jia-Yush Yen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:36:10Z |
Preliminary design of a two-dimensional electron beam position monitor system for multiple-electron-beam-direct-write lithography
|
Chen, S.-Y.;Tsai, K.-Y.;Ng, H.-T.;Fan, C.-H.;Pei, T.-H.;Kuan, C.-H.;Chen, Y.-Y.;Yen, J.-Y.; Chen, S.-Y.; Tsai, K.-Y.; Ng, H.-T.; Fan, C.-H.; Pei, T.-H.; Kuan, C.-H.; Chen, Y.-Y.; Yen, J.-Y.; CHIEH-HSIUNG KUAN; YUNG-YAW CHEN; KUEN-YU TSAI; JIA-YUSH YEN |
| 臺大學術典藏 |
2018-09-10T07:27:47Z |
Hybrid servo design for large area nano pattern stitching
|
Yen, J.-Y.;Chen, C.-H.;Chen, L.-S.;Tsai, K.-Y.;Chang, S.-H.; Yen, J.-Y.; Chen, C.-H.; Chen, L.-S.; Tsai, K.-Y.; Chang, S.-H.; KUEN-YU TSAI; JIA-YUSH YEN |
| 臺大學術典藏 |
2018-09-10T07:08:40Z |
A new method to improve accuracy of leakage current estimation for transistors with non-rectangular gates due to sub-wavelength lithography effects
|
Meng-Fu You; Yi-Chang Lu; Philip C. W. Ng; YI-CHANG LU; KUEN-YU TSAI; Kuen-Yu Tsai;Meng-Fu You;Yi-Chang Lu;Philip C. W. Ng; Kuen-Yu Tsai |
| 臺大學術典藏 |
2018-09-10T07:08:40Z |
A new method to improve accuracy of leakage current estimation for transistors with non-rectangular gates due to sub-wavelength lithography effects
|
Meng-Fu You; Yi-Chang Lu; Philip C. W. Ng; YI-CHANG LU; KUEN-YU TSAI; Kuen-Yu Tsai;Meng-Fu You;Yi-Chang Lu;Philip C. W. Ng; Kuen-Yu Tsai |
| 臺大學術典藏 |
2018-09-10T07:08:40Z |
A new method to improve accuracy of leakage current estimation for transistors with non-rectangular gates due to sub-wavelength lithography effects
|
Meng-Fu You; Yi-Chang Lu; Philip C. W. Ng; YI-CHANG LU; KUEN-YU TSAI; Kuen-Yu Tsai;Meng-Fu You;Yi-Chang Lu;Philip C. W. Ng; Kuen-Yu Tsai |
| 臺大學術典藏 |
2018-09-10T07:08:40Z |
A novel curve-fitting procedure for determining proximity effect parameters in electron beam lithography
|
Chun-Hung Liu;Hoi-Tou Ng;Philip C. W. Ng;Kuen-Yu Tsai;Shy-Jay Lin;Jeng-Horng Chen; Chun-Hung Liu; Hoi-Tou Ng; Philip C. W. Ng; Kuen-Yu Tsai; Shy-Jay Lin; Jeng-Horng Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:08:40Z |
A novel curve-fitting procedure for determining proximity effect parameters in electron beam lithography
|
Chun-Hung Liu;Hoi-Tou Ng;Philip C. W. Ng;Kuen-Yu Tsai;Shy-Jay Lin;Jeng-Horng Chen; Chun-Hung Liu; Hoi-Tou Ng; Philip C. W. Ng; Kuen-Yu Tsai; Shy-Jay Lin; Jeng-Horng Chen; KUEN-YU TSAI |
