| 臺大學術典藏 |
2018-09-10T07:42:06Z |
A fully model-based methodology for simultaneously correcting EUV mask shadowing and optical proximity effects with improved pattern transfer fidelity and process windows
|
Philip C. W. Ng;Kuen-Yu Tsai;Yen-Min Lee;Ting-Han Pei;Fu-Min Wang;Jia-Han Li;Alek C. Chen; Philip C. W. Ng; Kuen-Yu Tsai; Yen-Min Lee; Ting-Han Pei; Fu-Min Wang; Jia-Han Li; Alek C. Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:06Z |
A fully model-based methodology for simultaneously correcting EUV mask shadowing and optical proximity effects with improved pattern transfer fidelity and process windows
|
Philip C. W. Ng;Kuen-Yu Tsai;Yen-Min Lee;Ting-Han Pei;Fu-Min Wang;Jia-Han Li;Alek C. Chen; Philip C. W. Ng; Kuen-Yu Tsai; Yen-Min Lee; Ting-Han Pei; Fu-Min Wang; Jia-Han Li; Alek C. Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:06Z |
A fully model-based methodology for simultaneously correcting EUV mask shadowing and optical proximity effects with improved pattern transfer fidelity and process windows
|
Philip C. W. Ng;Kuen-Yu Tsai;Yen-Min Lee;Ting-Han Pei;Fu-Min Wang;Jia-Han Li;Alek C. Chen; Philip C. W. Ng; Kuen-Yu Tsai; Yen-Min Lee; Ting-Han Pei; Fu-Min Wang; Jia-Han Li; Alek C. Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:05Z |
Selection of Gaussian-beam and raster-scan parameters in electron-beam direct-write lithography considering device patterning and performance variability
|
Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI; Chun-Hung Liu; Hoi-Tou Ng;Chun-Hung Liu;Hsing-Hong Chen;Kuen-Yu Tsai; Hoi-Tou Ng |
| 臺大學術典藏 |
2018-09-10T07:42:05Z |
Selection of Gaussian-beam and raster-scan parameters in electron-beam direct-write lithography considering device patterning and performance variability
|
Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI; Chun-Hung Liu; Hoi-Tou Ng;Chun-Hung Liu;Hsing-Hong Chen;Kuen-Yu Tsai; Hoi-Tou Ng |
| 臺大學術典藏 |
2018-09-10T07:42:05Z |
Selection of Gaussian-beam and raster-scan parameters in electron-beam direct-write lithography considering device patterning and performance variability
|
Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI; Chun-Hung Liu; Hoi-Tou Ng;Chun-Hung Liu;Hsing-Hong Chen;Kuen-Yu Tsai; Hoi-Tou Ng |
| 臺大學術典藏 |
2018-09-10T07:42:05Z |
Servo system design of a high-resolution piezo-driven fine stage for step-and-repeat microlithography systems
|
Kuen-Yu Tsai; Jia-Yush Yen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:05Z |
Servo system design of a high-resolution piezo-driven fine stage for step-and-repeat microlithography systems
|
Kuen-Yu Tsai; Jia-Yush Yen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:36:10Z |
Preliminary design of a two-dimensional electron beam position monitor system for multiple-electron-beam-direct-write lithography
|
Chen, S.-Y.;Tsai, K.-Y.;Ng, H.-T.;Fan, C.-H.;Pei, T.-H.;Kuan, C.-H.;Chen, Y.-Y.;Yen, J.-Y.; Chen, S.-Y.; Tsai, K.-Y.; Ng, H.-T.; Fan, C.-H.; Pei, T.-H.; Kuan, C.-H.; Chen, Y.-Y.; Yen, J.-Y.; CHIEH-HSIUNG KUAN; YUNG-YAW CHEN; KUEN-YU TSAI; JIA-YUSH YEN |
| 臺大學術典藏 |
2018-09-10T07:27:47Z |
Hybrid servo design for large area nano pattern stitching
|
Yen, J.-Y.;Chen, C.-H.;Chen, L.-S.;Tsai, K.-Y.;Chang, S.-H.; Yen, J.-Y.; Chen, C.-H.; Chen, L.-S.; Tsai, K.-Y.; Chang, S.-H.; KUEN-YU TSAI; JIA-YUSH YEN |
