| 臺大學術典藏 |
2022-01-03T08:01:26Z |
Method for calibrating a Manufacturing process model
|
Kuen-Yu Tsai*; Alek C. Chen; Jia-Han Li; JIA-HAN LI |
| 臺大學術典藏 |
2022-01-03T08:01:20Z |
Simulation and fabrication results of electron optical systems for massively parallel maskless lithography
|
Hoi-Tou Ng; Chien-Chieh Huang; Hsing-Hong Chen; Shin-Chuan Chen; Ken-Hsien Hsieh; Kuen-Yu Tsai*; Jia-Han Li; JIA-HAN LI |
| 臺大學術典藏 |
2022-01-03T08:01:19Z |
Effects of Fresnel zone plate fabrication errors on focusing performances
|
Ting-Hang Pei; Kuen-Yu Tsai*; Jia-Han Li; JIA-HAN LI |
| 臺大學術典藏 |
2022-01-03T08:01:18Z |
High spatial resolution and large field intensity by a set of two modified zone plates
|
Zhan-Yu Liu; Yao-Jen Tsai; Jia-Han Li; Kuen-Yu Tsai; JIA-HAN LI |
| 臺大學術典藏 |
2022-01-03T08:01:17Z |
Iterative finite-difference method for analyzing fabrication errors of lens-misaligned electron-beam direct-write lithography system
|
Yen-Min Lee; Jia-Han Li*; Sheng-Yung Chen; Shiau-Yi Ma; Kuen-Yu Tsai; Tony Wen-Hann Sheu; Jia-Yush Yen; JIA-HAN LI |
| 臺大學術典藏 |
2022-01-03T08:01:17Z |
Fabrication of metrology test structures with programmed line edge roughness using electron beam direct write
|
Fu-Min Wang; Kuen-Yu Tsai; Jia-Han Li; Alek C. Chen; Yen-Min Lee; Yu-Tian Shen; Hsin-Hung Cheng; Chieh-Hsiang Kuan; JIA-HAN LI |
| 臺大學術典藏 |
2022-01-03T08:01:15Z |
Optical metrology of shape-varying nano-patterned gratings by analyzing the scattering signals in their pupil images
|
Yen-Min Lee; Jia-Han Li*; Fu-Min Wang; Hsin-Hung Cheng; Yu-Tian Shen; Kuen-Yu Tsai; Alek C. Chen; JIA-HAN LI |
| 臺大學術典藏 |
2022-01-03T08:01:14Z |
Solution-refined method for solving large-scale computation problems: Taking the Laplace’s equation as an example
|
Yen-Min Lee; Jia-Han Li*; Tony Wen-Hann Sheu; Kuen-Yu Tsai; Jia-Yush Yen; JIA-HAN LI |
| 臺大學術典藏 |
2022-01-03T08:01:13Z |
Solution-refined method for solving large-scale electrostatic problems: Taking the electron-beam direct-write lithography system as an example
|
Yen-Min Lee; Jia-Han Li; Tony Wen-Hann Sheu; Kuen-Yu Tsai; Jia-Yu Yen; JIA-HAN LI |
| 臺大學術典藏 |
2022-01-03T08:01:10Z |
A new EUV mask blank defect inspection method with coherent diffraction imaging
|
Ding Qi; Kuen-Yu Tsai; Jia-Han Li; JIA-HAN LI |
| 臺大學術典藏 |
2022-01-03T08:01:08Z |
Supplementary zones-surrounded Fresnel zone plate
|
Yen-Min Lee; Szu-Hung Chen; Chen-Pin Hsu; Pei-Chuen Chiou; Kuen-Yu Tsai; Tien-Tung Chung; Cheng-Han Tsai; Zhan-Yu Liu; Jia-Han Li^*; JIA-HAN LI |
| 臺大學術典藏 |
2022-01-03T08:00:58Z |
Precision fabrication of EUVL programmed defects with helium ion beam patterning
|
Chien-Lin Lee; Jia-Syun Cai; Sheng-Wei Chien; Kuen-Yu Tsai*; Jia-Han Li; Chao-Te Lee; JIA-HAN LI |
| 臺大學術典藏 |
2021-10-21T23:27:35Z |
Efficient electrical characteristics estimation techniques for sub-20-nm FDSOI integrated circuits with nonrectangular gate patterning effects
|
Cai, Jia Syun; Chien, Sheng Wei; Zheng, Xin Yang; Lee, Chien Lin; KUEN-YU TSAI |
| 臺大學術典藏 |
2021-10-21T23:27:35Z |
Investigation on helium ion beam lithography with proximity effect correction
|
Lee, Chien Lin; Chien, Sheng Wei; KUEN-YU TSAI; Liu, Chun Hung |
| 臺大學術典藏 |
2021-07-21T23:20:52Z |
Precision fabrication of EUVL programmed defects with helium ion beam patterning
|
Lee, Chien Lin; Cai, Jia Syun; Chien, Sheng Wei; KUEN-YU TSAI; JIA-HAN LI; Lee, Chao Te |
| 臺大學術典藏 |
2020-06-16T06:34:48Z |
Supplementary zones-surrounded fresnel zone plate
|
Lee, Y.-M.;Chen, S.-H.;Hsu, C.-P.;Chiou, P.-C.;Tsai, K.-Y.;Chung, T.-T.;Cheng-Han-Tsai, Liu, Z.-Y.;Li, J.-H.; Lee, Y.-M.; Chen, S.-H.; Hsu, C.-P.; Chiou, P.-C.; Tsai, K.-Y.; Chung, T.-T.; Cheng-Han-Tsai, Liu, Z.-Y.; Li, J.-H.; KUEN-YU TSAI |
| 臺大學術典藏 |
2020-06-16T06:34:48Z |
Non-delta-chrome optical proximity correction methodology for process models with three-dimensional mask effects (vol 10, 033010, 2011)
|
Ng, Philip C. W.;Tsai, Kuen-Yu;Melvin, Lawrence S.; Ng, Philip C. W.; Tsai, Kuen-Yu; Melvin, Lawrence S.; KUEN-YU TSAI |
| 臺大學術典藏 |
2020-06-16T06:34:48Z |
Design of automatic controllers for model-based OPC with optimal resist threshold determination for improving correction convergence
|
Su, Y.-S.;Ng, P.C.W.;Tsai, K.-Y.;Chen, Y.-Y.; Su, Y.-S.; Ng, P.C.W.; Tsai, K.-Y.; Chen, Y.-Y.; KUEN-YU TSAI |
| 臺大學術典藏 |
2020-06-16T06:34:48Z |
The electrostatic potential inside the electron-optical systen with periodic boundary-value conditions
|
Pei, T.-H.;Tsai, K.-Y.;Li, J.-H.; Pei, T.-H.; Tsai, K.-Y.; Li, J.-H.; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:58:05Z |
Investigation on MBOPC convergence improvement with location-dependent correction factors aided by machine learning
|
KUEN-YU TSAI;Matt St. John;James P. Shiely;Kuen-Yu Tsai*;Chien-Lin Lee;Sheng-Wei Chien;Jia-Syun Cai; Jia-Syun Cai; Sheng-Wei Chien; Chien-Lin Lee; Kuen-Yu Tsai*; James P. Shiely; Matt St. John; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:58:05Z |
Investigation on MBOPC convergence improvement with location-dependent correction factors aided by machine learning
|
KUEN-YU TSAI;Matt St. John;James P. Shiely;Kuen-Yu Tsai*;Chien-Lin Lee;Sheng-Wei Chien;Jia-Syun Cai; Jia-Syun Cai; Sheng-Wei Chien; Chien-Lin Lee; Kuen-Yu Tsai*; James P. Shiely; Matt St. John; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:58:05Z |
Investigation on MBOPC convergence improvement with location-dependent correction factors aided by machine learning
|
KUEN-YU TSAI;Matt St. John;James P. Shiely;Kuen-Yu Tsai*;Chien-Lin Lee;Sheng-Wei Chien;Jia-Syun Cai; Jia-Syun Cai; Sheng-Wei Chien; Chien-Lin Lee; Kuen-Yu Tsai*; James P. Shiely; Matt St. John; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:58:05Z |
Investigation on MBOPC convergence improvement with location-dependent correction factors aided by machine learning
|
KUEN-YU TSAI;Matt St. John;James P. Shiely;Kuen-Yu Tsai*;Chien-Lin Lee;Sheng-Wei Chien;Jia-Syun Cai; Jia-Syun Cai; Sheng-Wei Chien; Chien-Lin Lee; Kuen-Yu Tsai*; James P. Shiely; Matt St. John; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:58:05Z |
Accuracy improvement of electrical characteristics estimation for sub-20nm FDSOI devices with non-rectangular gates
|
KUEN-YU TSAI;Kuen-Yu Tsai*;Chien-Lin Lee;Xin-Yang Zheng;Sheng-Wei Chien;Jia-Syun Cai; Jia-Syun Cai; Sheng-Wei Chien; Xin-Yang Zheng; Chien-Lin Lee; Kuen-Yu Tsai*; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:58:05Z |
Accuracy improvement of electrical characteristics estimation for sub-20nm FDSOI devices with non-rectangular gates
|
KUEN-YU TSAI;Kuen-Yu Tsai*;Chien-Lin Lee;Xin-Yang Zheng;Sheng-Wei Chien;Jia-Syun Cai; Jia-Syun Cai; Sheng-Wei Chien; Xin-Yang Zheng; Chien-Lin Lee; Kuen-Yu Tsai*; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:58:05Z |
Accuracy improvement of electrical characteristics estimation for sub-20nm FDSOI devices with non-rectangular gates
|
KUEN-YU TSAI;Kuen-Yu Tsai*;Chien-Lin Lee;Xin-Yang Zheng;Sheng-Wei Chien;Jia-Syun Cai; Jia-Syun Cai; Sheng-Wei Chien; Xin-Yang Zheng; Chien-Lin Lee; Kuen-Yu Tsai*; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:58:05Z |
Accuracy improvement of electrical characteristics estimation for sub-20nm FDSOI devices with non-rectangular gates
|
KUEN-YU TSAI;Kuen-Yu Tsai*;Chien-Lin Lee;Xin-Yang Zheng;Sheng-Wei Chien;Jia-Syun Cai; Jia-Syun Cai; Sheng-Wei Chien; Xin-Yang Zheng; Chien-Lin Lee; Kuen-Yu Tsai*; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:58:04Z |
Simulation-based proximity effect correction for helium ion beam lithography
|
KUEN-YU TSAI;Kuen-Yu Tsai*;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai*; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:58:04Z |
Simulation-based proximity effect correction for helium ion beam lithography
|
KUEN-YU TSAI;Kuen-Yu Tsai*;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai*; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:58:04Z |
Simulation-based proximity effect correction for helium ion beam lithography
|
KUEN-YU TSAI;Kuen-Yu Tsai*;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai*; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:58:04Z |
Simulation-based proximity effect correction for helium ion beam lithography
|
KUEN-YU TSAI;Kuen-Yu Tsai*;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai*; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:58:03Z |
Model-based proximity effect correction for helium ion beam lithography
|
KUEN-YU TSAI;Kuen-Yu Tsai*;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai*; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:58:03Z |
Model-based proximity effect correction for helium ion beam lithography
|
KUEN-YU TSAI;Kuen-Yu Tsai*;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai*; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:58:03Z |
Model-based proximity effect correction for helium ion beam lithography
|
KUEN-YU TSAI;Kuen-Yu Tsai*;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai*; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:58:03Z |
Model-based proximity effect correction for helium ion beam lithography
|
KUEN-YU TSAI;Kuen-Yu Tsai*;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai*; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:58:01Z |
Fabrication of metrology test structures with helium ion beam direct write
|
KUEN-YU TSAI;Chao-Te Lee;Chit-Sung Hong;Bor-Yuan Shew;Jia-Han Li;Kuen-Yu Tsai*;Chun-Hung Liu;Sheng-Yung Chen;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Sheng-Yung Chen; Chun-Hung Liu; Kuen-Yu Tsai*; Jia-Han Li; Bor-Yuan Shew; Chit-Sung Hong; Chao-Te Lee; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:58:01Z |
Fabrication of metrology test structures with helium ion beam direct write
|
KUEN-YU TSAI;Chao-Te Lee;Chit-Sung Hong;Bor-Yuan Shew;Jia-Han Li;Kuen-Yu Tsai*;Chun-Hung Liu;Sheng-Yung Chen;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Sheng-Yung Chen; Chun-Hung Liu; Kuen-Yu Tsai*; Jia-Han Li; Bor-Yuan Shew; Chit-Sung Hong; Chao-Te Lee; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:58:01Z |
Fabrication of metrology test structures with helium ion beam direct write
|
KUEN-YU TSAI;Chao-Te Lee;Chit-Sung Hong;Bor-Yuan Shew;Jia-Han Li;Kuen-Yu Tsai*;Chun-Hung Liu;Sheng-Yung Chen;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Sheng-Yung Chen; Chun-Hung Liu; Kuen-Yu Tsai*; Jia-Han Li; Bor-Yuan Shew; Chit-Sung Hong; Chao-Te Lee; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:58:01Z |
Fabrication of metrology test structures with helium ion beam direct write
|
KUEN-YU TSAI;Chao-Te Lee;Chit-Sung Hong;Bor-Yuan Shew;Jia-Han Li;Kuen-Yu Tsai*;Chun-Hung Liu;Sheng-Yung Chen;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Sheng-Yung Chen; Chun-Hung Liu; Kuen-Yu Tsai*; Jia-Han Li; Bor-Yuan Shew; Chit-Sung Hong; Chao-Te Lee; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:58:00Z |
Fabrication of metrology test structures with helium ion beam direct write
|
KUEN-YU TSAI;Chao-Te Lee;Chit-Sung Hong;Bor-Yuan Shew;Jia-Han Li;Kuen-Yu Tsai*;Chun-Hung Liu;Sheng-Yung Chen;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Sheng-Yung Chen; Chun-Hung Liu; Kuen-Yu Tsai*; Jia-Han Li; Bor-Yuan Shew; Chit-Sung Hong; Chao-Te Lee; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:58:00Z |
Fabrication of metrology test structures with helium ion beam direct write
|
KUEN-YU TSAI;Chao-Te Lee;Chit-Sung Hong;Bor-Yuan Shew;Jia-Han Li;Kuen-Yu Tsai*;Chun-Hung Liu;Sheng-Yung Chen;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Sheng-Yung Chen; Chun-Hung Liu; Kuen-Yu Tsai*; Jia-Han Li; Bor-Yuan Shew; Chit-Sung Hong; Chao-Te Lee; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:58:00Z |
Fabrication of metrology test structures with helium ion beam direct write
|
KUEN-YU TSAI;Chao-Te Lee;Chit-Sung Hong;Bor-Yuan Shew;Jia-Han Li;Kuen-Yu Tsai*;Chun-Hung Liu;Sheng-Yung Chen;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Sheng-Yung Chen; Chun-Hung Liu; Kuen-Yu Tsai*; Jia-Han Li; Bor-Yuan Shew; Chit-Sung Hong; Chao-Te Lee; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:58:00Z |
Fabrication of metrology test structures with helium ion beam direct write
|
KUEN-YU TSAI;Chao-Te Lee;Chit-Sung Hong;Bor-Yuan Shew;Jia-Han Li;Kuen-Yu Tsai*;Chun-Hung Liu;Sheng-Yung Chen;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Sheng-Yung Chen; Chun-Hung Liu; Kuen-Yu Tsai*; Jia-Han Li; Bor-Yuan Shew; Chit-Sung Hong; Chao-Te Lee; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:57:58Z |
Fabrication of metrology test structures with programmed imperfection using helium ion beam direct write
|
KUEN-YU TSAI;Jia-Han Li;Kuen-Yu Tsai*;Sheng-Wei Chien; Sheng-Wei Chien; Kuen-Yu Tsai*; Jia-Han Li; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:57:58Z |
Fabrication of metrology test structures with programmed imperfection using helium ion beam direct write
|
KUEN-YU TSAI;Jia-Han Li;Kuen-Yu Tsai*;Sheng-Wei Chien; Sheng-Wei Chien; Kuen-Yu Tsai*; Jia-Han Li; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:57:58Z |
Fabrication of metrology test structures with programmed imperfection using helium ion beam direct write
|
KUEN-YU TSAI;Jia-Han Li;Kuen-Yu Tsai*;Sheng-Wei Chien; Sheng-Wei Chien; Kuen-Yu Tsai*; Jia-Han Li; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:57:58Z |
Fabrication of metrology test structures with programmed imperfection using helium ion beam direct write
|
KUEN-YU TSAI;Jia-Han Li;Kuen-Yu Tsai*;Sheng-Wei Chien; Sheng-Wei Chien; Kuen-Yu Tsai*; Jia-Han Li; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T15:36:26Z |
Method and System for Establishing Parametric Model
|
Kuen-Yu Tsai; Chun-Hung Liu; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T15:36:26Z |
Method and System for Establishing Parametric Model
|
Kuen-Yu Tsai; Chun-Hung Liu; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T15:26:03Z |
Design of an electron-optical system with a ball-tip emission source through a numerical optimization method for high-throughput electron-beam–direct-write lithography
|
Yu-Tian Shen; Kuen-Yu Tsai; KUEN-YU TSAI; Hsuan-Ping Lee;Sheng-Yung Chen;Chun-Hung Liu;Ding-Qi;Yu-Tian Shen;Kuen-Yu Tsai; Hsuan-Ping Lee; Sheng-Yung Chen; Chun-Hung Liu; Ding-Qi |
