| 臺大學術典藏 |
2018-09-10T09:50:34Z |
Method and Apparatus for Designing Patterning System Based on Patterning Fidelity
|
Kuen-Yu Tsai;Sheng-Yung Chen;Hoi-Tou Ng;Shiau-Yi Ma; Kuen-Yu Tsai; Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T09:50:34Z |
Electron Beam Exposure Apparatus, Electron Beam Generation Apparatus and Exposure Method (電子束曝光裝置、電子束產生裝置及曝光方法)
|
Kuen-Yu Tsai; KUEN-YU TSAI; Yu-Hsuan Kuo;Ming-Shing Su;Yi-Chang Lu;Kuen-Yu Tsai; Yu-Hsuan Kuo; Ming-Shing Su; Yi-Chang Lu |
| 臺大學術典藏 |
2018-09-10T09:50:34Z |
Electron Beam Exposure Apparatus, Electron Beam Generation Apparatus and Exposure Method (電子束曝光裝置、電子束產生裝置及曝光方法)
|
Kuen-Yu Tsai; KUEN-YU TSAI; Yu-Hsuan Kuo;Ming-Shing Su;Yi-Chang Lu;Kuen-Yu Tsai; Yu-Hsuan Kuo; Ming-Shing Su; Yi-Chang Lu |
| 臺大學術典藏 |
2018-09-10T09:50:34Z |
Electron Beam Exposure Apparatus, Electron Beam Generation Apparatus and Exposure Method (電子束曝光裝置、電子束產生裝置及曝光方法)
|
Kuen-Yu Tsai; KUEN-YU TSAI; Yu-Hsuan Kuo;Ming-Shing Su;Yi-Chang Lu;Kuen-Yu Tsai; Yu-Hsuan Kuo; Ming-Shing Su; Yi-Chang Lu |
| 臺大學術典藏 |
2018-09-10T09:50:34Z |
Method for Compensating Proximity Effects of Particle Beam Lithography Processes
|
Kuen-Yu Tsai;Chun-Hung Liu;Chooi-Wan Ng;Pei-Lin Tien; Kuen-Yu Tsai; Chun-Hung Liu; Chooi-Wan Ng; Pei-Lin Tien; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T09:50:34Z |
Method for Compensating Proximity Effects of Particle Beam Lithography Processes
|
Kuen-Yu Tsai;Chun-Hung Liu;Chooi-Wan Ng;Pei-Lin Tien; Kuen-Yu Tsai; Chun-Hung Liu; Chooi-Wan Ng; Pei-Lin Tien; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T09:50:34Z |
Method for Compensating Proximity Effects of Particle Beam Lithography Processes
|
Kuen-Yu Tsai;Chun-Hung Liu;Chooi-Wan Ng;Pei-Lin Tien; Kuen-Yu Tsai; Chun-Hung Liu; Chooi-Wan Ng; Pei-Lin Tien; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T09:50:34Z |
Method for Compensating Effect of Patterning Process and Apparatus Thereof
|
Yi-Sheng Su; KUEN-YU TSAI; Kuen-Yu Tsai; Chooi-Wan Ng; Kuen-Yu Tsai;Chooi-Wan Ng;Yi-Sheng Su |
| 臺大學術典藏 |
2018-09-10T09:50:34Z |
Method for Compensating Effect of Patterning Process and Apparatus Thereof
|
Yi-Sheng Su; KUEN-YU TSAI; Kuen-Yu Tsai; Chooi-Wan Ng; Kuen-Yu Tsai;Chooi-Wan Ng;Yi-Sheng Su |
| 臺大學術典藏 |
2018-09-10T09:50:34Z |
Method for Compensating Effect of Patterning Process and Apparatus Thereof
|
Yi-Sheng Su; KUEN-YU TSAI; Kuen-Yu Tsai; Chooi-Wan Ng; Kuen-Yu Tsai;Chooi-Wan Ng;Yi-Sheng Su |
| 臺大學術典藏 |
2018-09-10T09:50:33Z |
Impacts of point spread function accuracy on patterning prediction and proximity effect correction in low-voltage electron-beam-direct-write lithography
|
Chun-Hung Liu;Philip C. W. Ng;Yu-Tian Shen;Sheng-Wei Chien;Kuen-Yu Tsai; Chun-Hung Liu; Philip C. W. Ng; Yu-Tian Shen; Sheng-Wei Chien; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T09:50:33Z |
Impacts of point spread function accuracy on patterning prediction and proximity effect correction in low-voltage electron-beam-direct-write lithography
|
Chun-Hung Liu;Philip C. W. Ng;Yu-Tian Shen;Sheng-Wei Chien;Kuen-Yu Tsai; Chun-Hung Liu; Philip C. W. Ng; Yu-Tian Shen; Sheng-Wei Chien; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T09:50:33Z |
Impacts of point spread function accuracy on patterning prediction and proximity effect correction in low-voltage electron-beam-direct-write lithography
|
Chun-Hung Liu;Philip C. W. Ng;Yu-Tian Shen;Sheng-Wei Chien;Kuen-Yu Tsai; Chun-Hung Liu; Philip C. W. Ng; Yu-Tian Shen; Sheng-Wei Chien; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T09:43:35Z |
Solution-refined method for electrostatic potential distribution of large-scale electron optics
|
Lee, Y.-M.;Li, J.-H.;Sheu, T.-W.-H.;Tsai, K.-Y.;Yen, J.-Y.; Lee, Y.-M.; Li, J.-H.; Sheu, T.-W.-H.; Tsai, K.-Y.; Yen, J.-Y.; KUEN-YU TSAI; JIA-YUSH YEN |
| 臺大學術典藏 |
2018-09-10T09:25:00Z |
New method of optimizing writing parameters in electron beam lithography systems for throughput improvement considering patterning fidelity constraints
|
Hoi-Tou Ng;Yu-Tian Shen;Sheng-Yung Chen;Chun-Hung Liu;Philip C. W. Ng;Kuen-Yu Tsai; Hoi-Tou Ng; Yu-Tian Shen; Sheng-Yung Chen; Chun-Hung Liu; Philip C. W. Ng; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T09:25:00Z |
New method of optimizing writing parameters in electron beam lithography systems for throughput improvement considering patterning fidelity constraints
|
Hoi-Tou Ng;Yu-Tian Shen;Sheng-Yung Chen;Chun-Hung Liu;Philip C. W. Ng;Kuen-Yu Tsai; Hoi-Tou Ng; Yu-Tian Shen; Sheng-Yung Chen; Chun-Hung Liu; Philip C. W. Ng; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T09:25:00Z |
New method of optimizing writing parameters in electron beam lithography systems for throughput improvement considering patterning fidelity constraints
|
Hoi-Tou Ng;Yu-Tian Shen;Sheng-Yung Chen;Chun-Hung Liu;Philip C. W. Ng;Kuen-Yu Tsai; Hoi-Tou Ng; Yu-Tian Shen; Sheng-Yung Chen; Chun-Hung Liu; Philip C. W. Ng; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T09:25:00Z |
Direct-scatterometry-enabled lithography model calibration
|
Chih-Yu Chen;Kuen-Yu Tsai;Yu-Tian Shen;Yen-Min Lee;Jia-Han Li;Jason J. Shieh;Alek C. Chen; Chih-Yu Chen; Kuen-Yu Tsai; Yu-Tian Shen; Yen-Min Lee; Jia-Han Li; Jason J. Shieh; Alek C. Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T09:25:00Z |
Direct-scatterometry-enabled lithography model calibration
|
Chih-Yu Chen;Kuen-Yu Tsai;Yu-Tian Shen;Yen-Min Lee;Jia-Han Li;Jason J. Shieh;Alek C. Chen; Chih-Yu Chen; Kuen-Yu Tsai; Yu-Tian Shen; Yen-Min Lee; Jia-Han Li; Jason J. Shieh; Alek C. Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T09:25:00Z |
Direct-scatterometry-enabled lithography model calibration
|
Chih-Yu Chen;Kuen-Yu Tsai;Yu-Tian Shen;Yen-Min Lee;Jia-Han Li;Jason J. Shieh;Alek C. Chen; Chih-Yu Chen; Kuen-Yu Tsai; Yu-Tian Shen; Yen-Min Lee; Jia-Han Li; Jason J. Shieh; Alek C. Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T09:25:00Z |
Architecture and EOS Design Flow of a Multiple-Electron-Beam–Direct-Write System Considering Patterning Fidelity, Breakdown Effect
|
Sheng-Yung Chen;Shiau-Yi Ma;Kuen-Yu Tsai; Sheng-Yung Chen; Shiau-Yi Ma; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T09:25:00Z |
Architecture and EOS Design Flow of a Multiple-Electron-Beam–Direct-Write System Considering Patterning Fidelity, Breakdown Effect
|
Sheng-Yung Chen;Shiau-Yi Ma;Kuen-Yu Tsai; Sheng-Yung Chen; Shiau-Yi Ma; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T09:25:00Z |
Architecture and EOS Design Flow of a Multiple-Electron-Beam–Direct-Write System Considering Patterning Fidelity, Breakdown Effect
|
Sheng-Yung Chen;Shiau-Yi Ma;Kuen-Yu Tsai; Sheng-Yung Chen; Shiau-Yi Ma; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T09:25:00Z |
Study of etching bias modeling and correction strategies for patterning processes
|
Philip C.W. Ng;Kuen-Yu Tsai;Lawrence S. Melvin III; Philip C.W. Ng; Kuen-Yu Tsai; Lawrence S. Melvin III; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T09:25:00Z |
Study of etching bias modeling and correction strategies for patterning processes
|
Philip C.W. Ng;Kuen-Yu Tsai;Lawrence S. Melvin III; Philip C.W. Ng; Kuen-Yu Tsai; Lawrence S. Melvin III; KUEN-YU TSAI |
