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"kuen yu tsai"的相关文件
显示项目 111-120 / 313 (共32页)
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每页显示[10|25|50]项目
| 臺大學術典藏 |
2018-09-10T09:50:34Z |
Method for Compensating Proximity Effects of Particle Beam Lithography Processes
|
Kuen-Yu Tsai;Chun-Hung Liu;Chooi-Wan Ng;Pei-Lin Tien; Kuen-Yu Tsai; Chun-Hung Liu; Chooi-Wan Ng; Pei-Lin Tien; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T09:50:34Z |
Method for Compensating Proximity Effects of Particle Beam Lithography Processes
|
Kuen-Yu Tsai;Chun-Hung Liu;Chooi-Wan Ng;Pei-Lin Tien; Kuen-Yu Tsai; Chun-Hung Liu; Chooi-Wan Ng; Pei-Lin Tien; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T09:50:34Z |
Method for Compensating Effect of Patterning Process and Apparatus Thereof
|
Yi-Sheng Su; KUEN-YU TSAI; Kuen-Yu Tsai; Chooi-Wan Ng; Kuen-Yu Tsai;Chooi-Wan Ng;Yi-Sheng Su |
| 臺大學術典藏 |
2018-09-10T09:50:34Z |
Method for Compensating Effect of Patterning Process and Apparatus Thereof
|
Yi-Sheng Su; KUEN-YU TSAI; Kuen-Yu Tsai; Chooi-Wan Ng; Kuen-Yu Tsai;Chooi-Wan Ng;Yi-Sheng Su |
| 臺大學術典藏 |
2018-09-10T09:50:34Z |
Method for Compensating Effect of Patterning Process and Apparatus Thereof
|
Yi-Sheng Su; KUEN-YU TSAI; Kuen-Yu Tsai; Chooi-Wan Ng; Kuen-Yu Tsai;Chooi-Wan Ng;Yi-Sheng Su |
| 臺大學術典藏 |
2018-09-10T09:50:33Z |
Impacts of point spread function accuracy on patterning prediction and proximity effect correction in low-voltage electron-beam-direct-write lithography
|
Chun-Hung Liu;Philip C. W. Ng;Yu-Tian Shen;Sheng-Wei Chien;Kuen-Yu Tsai; Chun-Hung Liu; Philip C. W. Ng; Yu-Tian Shen; Sheng-Wei Chien; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T09:50:33Z |
Impacts of point spread function accuracy on patterning prediction and proximity effect correction in low-voltage electron-beam-direct-write lithography
|
Chun-Hung Liu;Philip C. W. Ng;Yu-Tian Shen;Sheng-Wei Chien;Kuen-Yu Tsai; Chun-Hung Liu; Philip C. W. Ng; Yu-Tian Shen; Sheng-Wei Chien; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T09:50:33Z |
Impacts of point spread function accuracy on patterning prediction and proximity effect correction in low-voltage electron-beam-direct-write lithography
|
Chun-Hung Liu;Philip C. W. Ng;Yu-Tian Shen;Sheng-Wei Chien;Kuen-Yu Tsai; Chun-Hung Liu; Philip C. W. Ng; Yu-Tian Shen; Sheng-Wei Chien; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T09:43:35Z |
Solution-refined method for electrostatic potential distribution of large-scale electron optics
|
Lee, Y.-M.;Li, J.-H.;Sheu, T.-W.-H.;Tsai, K.-Y.;Yen, J.-Y.; Lee, Y.-M.; Li, J.-H.; Sheu, T.-W.-H.; Tsai, K.-Y.; Yen, J.-Y.; KUEN-YU TSAI; JIA-YUSH YEN |
| 臺大學術典藏 |
2018-09-10T09:25:00Z |
New method of optimizing writing parameters in electron beam lithography systems for throughput improvement considering patterning fidelity constraints
|
Hoi-Tou Ng;Yu-Tian Shen;Sheng-Yung Chen;Chun-Hung Liu;Philip C. W. Ng;Kuen-Yu Tsai; Hoi-Tou Ng; Yu-Tian Shen; Sheng-Yung Chen; Chun-Hung Liu; Philip C. W. Ng; Kuen-Yu Tsai; KUEN-YU TSAI |
显示项目 111-120 / 313 (共32页)
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每页显示[10|25|50]项目
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