臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)

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显示项目 131-180 / 313 (共7页)
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机构	日期	题名	作者
臺大學術典藏	2018-09-10T09:25:00Z	Study of etching bias modeling and correction strategies for patterning processes	Philip C.W. Ng;Kuen-Yu Tsai;Lawrence S. Melvin III; Philip C.W. Ng; Kuen-Yu Tsai; Lawrence S. Melvin III; KUEN-YU TSAI
臺大學術典藏	2018-09-10T09:25:00Z	Solution-refined method for solving large-scale computation problems: Taking the Laplace's equation as an example	Yen-Min Lee;Jia-Han Li;Tony Wen-Hann Sheu;Kuen-Yu Tsai;Jia-Yush Yen; Yen-Min Lee; Jia-Han Li; Tony Wen-Hann Sheu; Kuen-Yu Tsai; Jia-Yush Yen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T09:25:00Z	Solution-refined method for solving large-scale computation problems: Taking the Laplace's equation as an example	Yen-Min Lee;Jia-Han Li;Tony Wen-Hann Sheu;Kuen-Yu Tsai;Jia-Yush Yen; Yen-Min Lee; Jia-Han Li; Tony Wen-Hann Sheu; Kuen-Yu Tsai; Jia-Yush Yen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T09:25:00Z	Solution-refined method for solving large-scale computation problems: Taking the Laplace's equation as an example	Yen-Min Lee;Jia-Han Li;Tony Wen-Hann Sheu;Kuen-Yu Tsai;Jia-Yush Yen; Yen-Min Lee; Jia-Han Li; Tony Wen-Hann Sheu; Kuen-Yu Tsai; Jia-Yush Yen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T09:25:00Z	The effect of NBTI on 3D integrated circuits	Cheng-Hong Lin;Yi-Chang Lu;Chin-Khai Tang;Kuen-Yu Tsai; Cheng-Hong Lin; Yi-Chang Lu; Chin-Khai Tang; Kuen-Yu Tsai; YI-CHANG LU; KUEN-YU TSAI
臺大學術典藏	2018-09-10T09:25:00Z	The effect of NBTI on 3D integrated circuits	Cheng-Hong Lin;Yi-Chang Lu;Chin-Khai Tang;Kuen-Yu Tsai; Cheng-Hong Lin; Yi-Chang Lu; Chin-Khai Tang; Kuen-Yu Tsai; YI-CHANG LU; KUEN-YU TSAI
臺大學術典藏	2018-09-10T09:25:00Z	The effect of NBTI on 3D integrated circuits	Cheng-Hong Lin;Yi-Chang Lu;Chin-Khai Tang;Kuen-Yu Tsai; Cheng-Hong Lin; Yi-Chang Lu; Chin-Khai Tang; Kuen-Yu Tsai; YI-CHANG LU; KUEN-YU TSAI
臺大學術典藏	2018-09-10T09:24:59Z	New parametric point spread function calibration methodology for improving the accuracy of patterning prediction in electron-beam lithography	Chun-Hung Liu;Hoi-Tou Ng;Kuen-Yu Tsai; Chun-Hung Liu; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T09:24:59Z	New parametric point spread function calibration methodology for improving the accuracy of patterning prediction in electron-beam lithography	Chun-Hung Liu;Hoi-Tou Ng;Kuen-Yu Tsai; Chun-Hung Liu; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T09:24:59Z	New parametric point spread function calibration methodology for improving the accuracy of patterning prediction in electron-beam lithography	Chun-Hung Liu;Hoi-Tou Ng;Kuen-Yu Tsai; Chun-Hung Liu; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:35Z	Method For Non-Resist Nanolithography	Miin-Jang Chen;Kuen-Yu Tsai;Chee-Wee Liu; Miin-Jang Chen; Kuen-Yu Tsai; Chee-Wee Liu; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:35Z	Method For Non-Resist Nanolithography	Miin-Jang Chen;Kuen-Yu Tsai;Chee-Wee Liu; Miin-Jang Chen; Kuen-Yu Tsai; Chee-Wee Liu; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:35Z	Method For Non-Resist Nanolithography	Miin-Jang Chen;Kuen-Yu Tsai;Chee-Wee Liu; Miin-Jang Chen; Kuen-Yu Tsai; Chee-Wee Liu; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:35Z	Charged-Particle-Beam Patterning Without Resist	Kuen-Yu Tsai;Miin-Jang Chen;Samuel C. Pan; Kuen-Yu Tsai; Miin-Jang Chen; Samuel C. Pan; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:35Z	Charged-Particle-Beam Patterning Without Resist	Kuen-Yu Tsai;Miin-Jang Chen;Samuel C. Pan; Kuen-Yu Tsai; Miin-Jang Chen; Samuel C. Pan; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:35Z	Charged-Particle-Beam Patterning Without Resist	Kuen-Yu Tsai;Miin-Jang Chen;Samuel C. Pan; Kuen-Yu Tsai; Miin-Jang Chen; Samuel C. Pan; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:35Z	Multilayer Mirror Structure	Jia-Han Li;Yen-Min Lee;Kuen-Yu Tsai; Jia-Han Li; Yen-Min Lee; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:35Z	Multilayer Mirror Structure	Jia-Han Li;Yen-Min Lee;Kuen-Yu Tsai; Jia-Han Li; Yen-Min Lee; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:35Z	Multilayer Mirror Structure	Jia-Han Li;Yen-Min Lee;Kuen-Yu Tsai; Jia-Han Li; Yen-Min Lee; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:34Z	Method for Adjusting Status of Particle Beams for Patterning A Substrate And System Using The Same	Kuen-Yu Tsai;Sheng-Yung Chen; Kuen-Yu Tsai; Sheng-Yung Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:34Z	Method for Adjusting Status of Particle Beams for Patterning A Substrate And System Using The Same	Kuen-Yu Tsai;Sheng-Yung Chen; Kuen-Yu Tsai; Sheng-Yung Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:34Z	Method for Adjusting Status of Particle Beams for Patterning A Substrate And System Using The Same	Kuen-Yu Tsai;Sheng-Yung Chen; Kuen-Yu Tsai; Sheng-Yung Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:34Z	Apparatus and Method for Estimating Change of Status of Particle Beams	Kuen-Yu Tsai;Sheng-Yung Chen; Kuen-Yu Tsai; Sheng-Yung Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:34Z	Apparatus and Method for Estimating Change of Status of Particle Beams	Kuen-Yu Tsai;Sheng-Yung Chen; Kuen-Yu Tsai; Sheng-Yung Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:34Z	Apparatus and Method for Estimating Change of Status of Particle Beams	Kuen-Yu Tsai;Sheng-Yung Chen; Kuen-Yu Tsai; Sheng-Yung Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:34Z	Method and Computer-Aided Design System Of Manufacturing An Optical System	Kuen-Yu Tsai;Sheng-Yung Chen;Shih-Chuan Chen; Kuen-Yu Tsai; Sheng-Yung Chen; Shih-Chuan Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:34Z	Method and Computer-Aided Design System Of Manufacturing An Optical System	Kuen-Yu Tsai;Sheng-Yung Chen;Shih-Chuan Chen; Kuen-Yu Tsai; Sheng-Yung Chen; Shih-Chuan Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:34Z	Method and Computer-Aided Design System Of Manufacturing An Optical System	Kuen-Yu Tsai;Sheng-Yung Chen;Shih-Chuan Chen; Kuen-Yu Tsai; Sheng-Yung Chen; Shih-Chuan Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:34Z	Method and System for Establishing Parametric Model (參數化模型的建立方法及系統)	Kuen-Yu Tsai;Chun-Hung Liu; Kuen-Yu Tsai; Chun-Hung Liu; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:34Z	Method and System for Establishing Parametric Model (參數化模型的建立方法及系統)	Kuen-Yu Tsai;Chun-Hung Liu; Kuen-Yu Tsai; Chun-Hung Liu; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:34Z	Method and System for Establishing Parametric Model (參數化模型的建立方法及系統)	Kuen-Yu Tsai;Chun-Hung Liu; Kuen-Yu Tsai; Chun-Hung Liu; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:34Z	Method for Calibrating A Manufacturing Process Model (National Taiwan University/ASML Holding N.V.)	Kuen-Yu Tsai;Alek C. Chen;Jia-Han Li; Kuen-Yu Tsai; Alek C. Chen; Jia-Han Li; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:34Z	Method for Calibrating A Manufacturing Process Model (National Taiwan University/ASML Holding N.V.)	Kuen-Yu Tsai;Alek C. Chen;Jia-Han Li; Kuen-Yu Tsai; Alek C. Chen; Jia-Han Li; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:34Z	Method for Calibrating A Manufacturing Process Model (National Taiwan University/ASML Holding N.V.)	Kuen-Yu Tsai;Alek C. Chen;Jia-Han Li; Kuen-Yu Tsai; Alek C. Chen; Jia-Han Li; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:34Z	Projection Patterning With Exposure Mask	Kuen-Yu Tsai;Miin-Jang Chen;Si-Chen Lee; Kuen-Yu Tsai; Miin-Jang Chen; Si-Chen Lee; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:34Z	Projection Patterning With Exposure Mask	Kuen-Yu Tsai;Miin-Jang Chen;Si-Chen Lee; Kuen-Yu Tsai; Miin-Jang Chen; Si-Chen Lee; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:34Z	Projection Patterning With Exposure Mask	Kuen-Yu Tsai;Miin-Jang Chen;Si-Chen Lee; Kuen-Yu Tsai; Miin-Jang Chen; Si-Chen Lee; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:33Z	Non-delta-chrome optical proximity correction methodology for process models with three-dimensional mask effects	Philip C. W. Ng; Kuen-Yu Tsai; Lawrence S. Melvin III; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:33Z	Non-delta-chrome optical proximity correction methodology for process models with three-dimensional mask effects	Philip C. W. Ng; Kuen-Yu Tsai; Lawrence S. Melvin III; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:33Z	Lithography-patterning-fidelity-aware electron-optical system design optimization	Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; Hsing-Hong Chen; Chun-Hung Liu; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:33Z	Lithography-patterning-fidelity-aware electron-optical system design optimization	Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; Hsing-Hong Chen; Chun-Hung Liu; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:33Z	Lithography-patterning-fidelity-aware electron-optical system design optimization	Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:33Z	Lithography-patterning-fidelity-aware electron-optical system design optimization	Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:33Z	Optical metrology of shape-varying nano-patterned gratings by analyzing the scattering signals in their pupil images	Yen-Min Lee; Jia-Han Li; Fu-Min Wang; Hsin-Hung Cheng; Yu-Tian Shen; Kuen-Yu Tsai; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:33Z	Optical metrology of shape-varying nano-patterned gratings by analyzing the scattering signals in their pupil images	Yen-Min Lee; Jia-Han Li; Fu-Min Wang; Hsin-Hung Cheng; Yu-Tian Shen; Kuen-Yu Tsai; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:33Z	System and Method for Estimating Change of Status of Particle Beams	Kuen-Yu Tsai;Sheng-Yung Chen;Jia-Yush Yen;Yung-Yaw Chen;Chi-Hsiang Fan; Kuen-Yu Tsai; Sheng-Yung Chen; Jia-Yush Yen; Yung-Yaw Chen; Chi-Hsiang Fan; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:33Z	System and Method for Estimating Change of Status of Particle Beams	Kuen-Yu Tsai;Sheng-Yung Chen;Jia-Yush Yen;Yung-Yaw Chen;Chi-Hsiang Fan; Kuen-Yu Tsai; Sheng-Yung Chen; Jia-Yush Yen; Yung-Yaw Chen; Chi-Hsiang Fan; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:33Z	System and Method for Estimating Change of Status of Particle Beams	Kuen-Yu Tsai;Sheng-Yung Chen;Jia-Yush Yen;Yung-Yaw Chen;Chi-Hsiang Fan; Kuen-Yu Tsai; Sheng-Yung Chen; Jia-Yush Yen; Yung-Yaw Chen; Chi-Hsiang Fan; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:32Z	Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects	Philip C. W. Ng; Kuen-Yu Tsai; Yen-Min Lee; Fu-Min Wang; Jia-Han Li; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:32Z	Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects	Philip C. W. Ng; Kuen-Yu Tsai; Yen-Min Lee; Fu-Min Wang; Jia-Han Li; Alek C. Chen; KUEN-YU TSAI

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