| 臺大學術典藏 |
2020-06-16T06:34:48Z |
Supplementary zones-surrounded fresnel zone plate
|
Lee, Y.-M.;Chen, S.-H.;Hsu, C.-P.;Chiou, P.-C.;Tsai, K.-Y.;Chung, T.-T.;Cheng-Han-Tsai, Liu, Z.-Y.;Li, J.-H.; Lee, Y.-M.; Chen, S.-H.; Hsu, C.-P.; Chiou, P.-C.; Tsai, K.-Y.; Chung, T.-T.; Cheng-Han-Tsai, Liu, Z.-Y.; Li, J.-H.; KUEN-YU TSAI |
| 臺大學術典藏 |
2020-06-16T06:34:48Z |
Non-delta-chrome optical proximity correction methodology for process models with three-dimensional mask effects (vol 10, 033010, 2011)
|
Ng, Philip C. W.;Tsai, Kuen-Yu;Melvin, Lawrence S.; Ng, Philip C. W.; Tsai, Kuen-Yu; Melvin, Lawrence S.; KUEN-YU TSAI |
| 臺大學術典藏 |
2020-06-16T06:34:48Z |
Design of automatic controllers for model-based OPC with optimal resist threshold determination for improving correction convergence
|
Su, Y.-S.;Ng, P.C.W.;Tsai, K.-Y.;Chen, Y.-Y.; Su, Y.-S.; Ng, P.C.W.; Tsai, K.-Y.; Chen, Y.-Y.; KUEN-YU TSAI |
| 臺大學術典藏 |
2020-06-16T06:34:48Z |
The electrostatic potential inside the electron-optical systen with periodic boundary-value conditions
|
Pei, T.-H.;Tsai, K.-Y.;Li, J.-H.; Pei, T.-H.; Tsai, K.-Y.; Li, J.-H.; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:58:05Z |
Investigation on MBOPC convergence improvement with location-dependent correction factors aided by machine learning
|
KUEN-YU TSAI;Matt St. John;James P. Shiely;Kuen-Yu Tsai*;Chien-Lin Lee;Sheng-Wei Chien;Jia-Syun Cai; Jia-Syun Cai; Sheng-Wei Chien; Chien-Lin Lee; Kuen-Yu Tsai*; James P. Shiely; Matt St. John; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:58:05Z |
Investigation on MBOPC convergence improvement with location-dependent correction factors aided by machine learning
|
KUEN-YU TSAI;Matt St. John;James P. Shiely;Kuen-Yu Tsai*;Chien-Lin Lee;Sheng-Wei Chien;Jia-Syun Cai; Jia-Syun Cai; Sheng-Wei Chien; Chien-Lin Lee; Kuen-Yu Tsai*; James P. Shiely; Matt St. John; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:58:05Z |
Investigation on MBOPC convergence improvement with location-dependent correction factors aided by machine learning
|
KUEN-YU TSAI;Matt St. John;James P. Shiely;Kuen-Yu Tsai*;Chien-Lin Lee;Sheng-Wei Chien;Jia-Syun Cai; Jia-Syun Cai; Sheng-Wei Chien; Chien-Lin Lee; Kuen-Yu Tsai*; James P. Shiely; Matt St. John; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:58:05Z |
Investigation on MBOPC convergence improvement with location-dependent correction factors aided by machine learning
|
KUEN-YU TSAI;Matt St. John;James P. Shiely;Kuen-Yu Tsai*;Chien-Lin Lee;Sheng-Wei Chien;Jia-Syun Cai; Jia-Syun Cai; Sheng-Wei Chien; Chien-Lin Lee; Kuen-Yu Tsai*; James P. Shiely; Matt St. John; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:58:05Z |
Accuracy improvement of electrical characteristics estimation for sub-20nm FDSOI devices with non-rectangular gates
|
KUEN-YU TSAI;Kuen-Yu Tsai*;Chien-Lin Lee;Xin-Yang Zheng;Sheng-Wei Chien;Jia-Syun Cai; Jia-Syun Cai; Sheng-Wei Chien; Xin-Yang Zheng; Chien-Lin Lee; Kuen-Yu Tsai*; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:58:05Z |
Accuracy improvement of electrical characteristics estimation for sub-20nm FDSOI devices with non-rectangular gates
|
KUEN-YU TSAI;Kuen-Yu Tsai*;Chien-Lin Lee;Xin-Yang Zheng;Sheng-Wei Chien;Jia-Syun Cai; Jia-Syun Cai; Sheng-Wei Chien; Xin-Yang Zheng; Chien-Lin Lee; Kuen-Yu Tsai*; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:58:05Z |
Accuracy improvement of electrical characteristics estimation for sub-20nm FDSOI devices with non-rectangular gates
|
KUEN-YU TSAI;Kuen-Yu Tsai*;Chien-Lin Lee;Xin-Yang Zheng;Sheng-Wei Chien;Jia-Syun Cai; Jia-Syun Cai; Sheng-Wei Chien; Xin-Yang Zheng; Chien-Lin Lee; Kuen-Yu Tsai*; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:58:05Z |
Accuracy improvement of electrical characteristics estimation for sub-20nm FDSOI devices with non-rectangular gates
|
KUEN-YU TSAI;Kuen-Yu Tsai*;Chien-Lin Lee;Xin-Yang Zheng;Sheng-Wei Chien;Jia-Syun Cai; Jia-Syun Cai; Sheng-Wei Chien; Xin-Yang Zheng; Chien-Lin Lee; Kuen-Yu Tsai*; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:58:04Z |
Simulation-based proximity effect correction for helium ion beam lithography
|
KUEN-YU TSAI;Kuen-Yu Tsai*;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai*; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:58:04Z |
Simulation-based proximity effect correction for helium ion beam lithography
|
KUEN-YU TSAI;Kuen-Yu Tsai*;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai*; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:58:04Z |
Simulation-based proximity effect correction for helium ion beam lithography
|
KUEN-YU TSAI;Kuen-Yu Tsai*;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai*; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:58:04Z |
Simulation-based proximity effect correction for helium ion beam lithography
|
KUEN-YU TSAI;Kuen-Yu Tsai*;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai*; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:58:03Z |
Model-based proximity effect correction for helium ion beam lithography
|
KUEN-YU TSAI;Kuen-Yu Tsai*;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai*; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:58:03Z |
Model-based proximity effect correction for helium ion beam lithography
|
KUEN-YU TSAI;Kuen-Yu Tsai*;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai*; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:58:03Z |
Model-based proximity effect correction for helium ion beam lithography
|
KUEN-YU TSAI;Kuen-Yu Tsai*;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai*; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:58:03Z |
Model-based proximity effect correction for helium ion beam lithography
|
KUEN-YU TSAI;Kuen-Yu Tsai*;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai*; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:58:01Z |
Fabrication of metrology test structures with helium ion beam direct write
|
KUEN-YU TSAI;Chao-Te Lee;Chit-Sung Hong;Bor-Yuan Shew;Jia-Han Li;Kuen-Yu Tsai*;Chun-Hung Liu;Sheng-Yung Chen;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Sheng-Yung Chen; Chun-Hung Liu; Kuen-Yu Tsai*; Jia-Han Li; Bor-Yuan Shew; Chit-Sung Hong; Chao-Te Lee; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:58:01Z |
Fabrication of metrology test structures with helium ion beam direct write
|
KUEN-YU TSAI;Chao-Te Lee;Chit-Sung Hong;Bor-Yuan Shew;Jia-Han Li;Kuen-Yu Tsai*;Chun-Hung Liu;Sheng-Yung Chen;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Sheng-Yung Chen; Chun-Hung Liu; Kuen-Yu Tsai*; Jia-Han Li; Bor-Yuan Shew; Chit-Sung Hong; Chao-Te Lee; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:58:01Z |
Fabrication of metrology test structures with helium ion beam direct write
|
KUEN-YU TSAI;Chao-Te Lee;Chit-Sung Hong;Bor-Yuan Shew;Jia-Han Li;Kuen-Yu Tsai*;Chun-Hung Liu;Sheng-Yung Chen;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Sheng-Yung Chen; Chun-Hung Liu; Kuen-Yu Tsai*; Jia-Han Li; Bor-Yuan Shew; Chit-Sung Hong; Chao-Te Lee; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:58:01Z |
Fabrication of metrology test structures with helium ion beam direct write
|
KUEN-YU TSAI;Chao-Te Lee;Chit-Sung Hong;Bor-Yuan Shew;Jia-Han Li;Kuen-Yu Tsai*;Chun-Hung Liu;Sheng-Yung Chen;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Sheng-Yung Chen; Chun-Hung Liu; Kuen-Yu Tsai*; Jia-Han Li; Bor-Yuan Shew; Chit-Sung Hong; Chao-Te Lee; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-31T07:58:00Z |
Fabrication of metrology test structures with helium ion beam direct write
|
KUEN-YU TSAI;Chao-Te Lee;Chit-Sung Hong;Bor-Yuan Shew;Jia-Han Li;Kuen-Yu Tsai*;Chun-Hung Liu;Sheng-Yung Chen;Sheng-Wei Chien;Chien-Lin Lee; Chien-Lin Lee; Sheng-Wei Chien; Sheng-Yung Chen; Chun-Hung Liu; Kuen-Yu Tsai*; Jia-Han Li; Bor-Yuan Shew; Chit-Sung Hong; Chao-Te Lee; KUEN-YU TSAI |
