| 臺大學術典藏 |
2018-09-10T08:46:34Z |
Projection Patterning With Exposure Mask
|
Kuen-Yu Tsai;Miin-Jang Chen;Si-Chen Lee; Kuen-Yu Tsai; Miin-Jang Chen; Si-Chen Lee; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:34Z |
Projection Patterning With Exposure Mask
|
Kuen-Yu Tsai;Miin-Jang Chen;Si-Chen Lee; Kuen-Yu Tsai; Miin-Jang Chen; Si-Chen Lee; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:33Z |
Non-delta-chrome optical proximity correction methodology for process models with three-dimensional mask effects
|
Philip C. W. Ng; Kuen-Yu Tsai; Lawrence S. Melvin III; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:33Z |
Non-delta-chrome optical proximity correction methodology for process models with three-dimensional mask effects
|
Philip C. W. Ng; Kuen-Yu Tsai; Lawrence S. Melvin III; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:33Z |
Lithography-patterning-fidelity-aware electron-optical system design optimization
|
Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; Hsing-Hong Chen; Chun-Hung Liu; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:33Z |
Lithography-patterning-fidelity-aware electron-optical system design optimization
|
Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; Hsing-Hong Chen; Chun-Hung Liu; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:33Z |
Lithography-patterning-fidelity-aware electron-optical system design optimization
|
Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:33Z |
Lithography-patterning-fidelity-aware electron-optical system design optimization
|
Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:33Z |
Optical metrology of shape-varying nano-patterned gratings by analyzing the scattering signals in their pupil images
|
Yen-Min Lee; Jia-Han Li; Fu-Min Wang; Hsin-Hung Cheng; Yu-Tian Shen; Kuen-Yu Tsai; Alek C. Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:33Z |
Optical metrology of shape-varying nano-patterned gratings by analyzing the scattering signals in their pupil images
|
Yen-Min Lee; Jia-Han Li; Fu-Min Wang; Hsin-Hung Cheng; Yu-Tian Shen; Kuen-Yu Tsai; Alek C. Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:33Z |
System and Method for Estimating Change of Status of Particle Beams
|
Kuen-Yu Tsai;Sheng-Yung Chen;Jia-Yush Yen;Yung-Yaw Chen;Chi-Hsiang Fan; Kuen-Yu Tsai; Sheng-Yung Chen; Jia-Yush Yen; Yung-Yaw Chen; Chi-Hsiang Fan; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:33Z |
System and Method for Estimating Change of Status of Particle Beams
|
Kuen-Yu Tsai;Sheng-Yung Chen;Jia-Yush Yen;Yung-Yaw Chen;Chi-Hsiang Fan; Kuen-Yu Tsai; Sheng-Yung Chen; Jia-Yush Yen; Yung-Yaw Chen; Chi-Hsiang Fan; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:33Z |
System and Method for Estimating Change of Status of Particle Beams
|
Kuen-Yu Tsai;Sheng-Yung Chen;Jia-Yush Yen;Yung-Yaw Chen;Chi-Hsiang Fan; Kuen-Yu Tsai; Sheng-Yung Chen; Jia-Yush Yen; Yung-Yaw Chen; Chi-Hsiang Fan; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:32Z |
Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects
|
Philip C. W. Ng; Kuen-Yu Tsai; Yen-Min Lee; Fu-Min Wang; Jia-Han Li; Alek C. Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:32Z |
Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects
|
Philip C. W. Ng; Kuen-Yu Tsai; Yen-Min Lee; Fu-Min Wang; Jia-Han Li; Alek C. Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:32Z |
Fabrication method of high-quality Ge nanocrystals on patterned Si substrates by local melting point control
|
Chien-Wei Chiu; Ting-Wei Liao; Kuen-Yu Tsai; Fu-Min Wang; Yuen-Wuu Suen; Chieh-Hsiung Kuan; KUEN-YU TSAI; CHIEH-HSIUNG KUAN |
| 臺大學術典藏 |
2018-09-10T08:46:32Z |
Fabrication method of high-quality Ge nanocrystals on patterned Si substrates by local melting point control
|
Chien-Wei Chiu; Ting-Wei Liao; Kuen-Yu Tsai; Fu-Min Wang; Yuen-Wuu Suen; Chieh-Hsiung Kuan; KUEN-YU TSAI; CHIEH-HSIUNG KUAN |
| 臺大學術典藏 |
2018-09-10T08:46:32Z |
Impact of process-effect correction strategies on variability of critical dimension and electrical characteristics in extreme ultraviolet lithography
|
Ng, Sheng-Wei ; Chien, Bo-Sen ; Chang, Kuen-Yu ; Tsai*, Yi-Chang ; Lu, Jia-Han ; Li,Alek C.; ChenNg, Philip C.W.; Chien, Sheng-Wei; Chang, Bo-Sen; Tsai, Kuen-Yu; Lu, Yi-Chang; Li, Jia-Han; Chen, Alek C.; Ng, Philip C.W.; Chien, Sheng-Wei; Chang, Bo-Sen; Tsai, Kuen-Yu; Lu, Yi-Chang; Li, Jia-Han; Chen, Alek C.; YI-CHANG LU; KUEN-YU TSAI; Li, Jia-Han |
| 臺大學術典藏 |
2018-09-10T08:46:32Z |
Silicon photodiodes for electron beam position and drift detection in scanning electron microscopy and electron beam lithography system
|
Kuen-Yu Tsai; Yung-Yaw Chen; KUEN-YU TSAI; YUNG-YAW CHEN; JIA-YUSH YEN; Sheng-Yung Chen; Jia-Yush Yen; Cheng-Ju Wu; Yi-Hung Kuo |
| 臺大學術典藏 |
2018-09-10T08:46:32Z |
Silicon photodiodes for electron beam position and drift detection in scanning electron microscopy and electron beam lithography system
|
Kuen-Yu Tsai; Yung-Yaw Chen; KUEN-YU TSAI; YUNG-YAW CHEN; JIA-YUSH YEN; Sheng-Yung Chen; Jia-Yush Yen; Cheng-Ju Wu; Yi-Hung Kuo |
| 臺大學術典藏 |
2018-09-10T08:18:26Z |
Impact of process effects correction strategies on critical dimension and electrical characteristics variabilities in extreme ultraviolet lithography
|
Philip C. W. Ng;Sheng-Wei Chien;Bo-Sen Chang;Kuen-Yu Tsai;Yi-Chang Lu; Philip C. W. Ng; Sheng-Wei Chien; Bo-Sen Chang; Kuen-Yu Tsai; Yi-Chang Lu; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:26Z |
Impact of process effects correction strategies on critical dimension and electrical characteristics variabilities in extreme ultraviolet lithography
|
Philip C. W. Ng;Sheng-Wei Chien;Bo-Sen Chang;Kuen-Yu Tsai;Yi-Chang Lu; Philip C. W. Ng; Sheng-Wei Chien; Bo-Sen Chang; Kuen-Yu Tsai; Yi-Chang Lu; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:26Z |
Impact of process effects correction strategies on critical dimension and electrical characteristics variabilities in extreme ultraviolet lithography
|
Philip C. W. Ng;Sheng-Wei Chien;Bo-Sen Chang;Kuen-Yu Tsai;Yi-Chang Lu; Philip C. W. Ng; Sheng-Wei Chien; Bo-Sen Chang; Kuen-Yu Tsai; Yi-Chang Lu; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:26Z |
Fabrication of metrology test structures with programmed line edge roughness using electron beam direct write
|
Fu-Min Wang;Kuen-Yu Tsai;Jia-Han Li;Alek C. Chen;Yen-Min Lee;Yu-Tian Shen;Hsin-Hung Cheng;Chieh-Hsiang Kuan; Fu-Min Wang; Kuen-Yu Tsai; Jia-Han Li; Alek C. Chen; Yen-Min Lee; Yu-Tian Shen; Hsin-Hung Cheng; Chieh-Hsiang Kuan; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:26Z |
Fabrication of metrology test structures with programmed line edge roughness using electron beam direct write
|
Fu-Min Wang;Kuen-Yu Tsai;Jia-Han Li;Alek C. Chen;Yen-Min Lee;Yu-Tian Shen;Hsin-Hung Cheng;Chieh-Hsiang Kuan; Fu-Min Wang; Kuen-Yu Tsai; Jia-Han Li; Alek C. Chen; Yen-Min Lee; Yu-Tian Shen; Hsin-Hung Cheng; Chieh-Hsiang Kuan; KUEN-YU TSAI |
