| 臺大學術典藏 |
2018-09-10T08:46:33Z |
System and Method for Estimating Change of Status of Particle Beams
|
Kuen-Yu Tsai;Sheng-Yung Chen;Jia-Yush Yen;Yung-Yaw Chen;Chi-Hsiang Fan; Kuen-Yu Tsai; Sheng-Yung Chen; Jia-Yush Yen; Yung-Yaw Chen; Chi-Hsiang Fan; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:33Z |
System and Method for Estimating Change of Status of Particle Beams
|
Kuen-Yu Tsai;Sheng-Yung Chen;Jia-Yush Yen;Yung-Yaw Chen;Chi-Hsiang Fan; Kuen-Yu Tsai; Sheng-Yung Chen; Jia-Yush Yen; Yung-Yaw Chen; Chi-Hsiang Fan; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:33Z |
System and Method for Estimating Change of Status of Particle Beams
|
Kuen-Yu Tsai;Sheng-Yung Chen;Jia-Yush Yen;Yung-Yaw Chen;Chi-Hsiang Fan; Kuen-Yu Tsai; Sheng-Yung Chen; Jia-Yush Yen; Yung-Yaw Chen; Chi-Hsiang Fan; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:32Z |
Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects
|
Philip C. W. Ng; Kuen-Yu Tsai; Yen-Min Lee; Fu-Min Wang; Jia-Han Li; Alek C. Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:32Z |
Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects
|
Philip C. W. Ng; Kuen-Yu Tsai; Yen-Min Lee; Fu-Min Wang; Jia-Han Li; Alek C. Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:32Z |
Fabrication method of high-quality Ge nanocrystals on patterned Si substrates by local melting point control
|
Chien-Wei Chiu; Ting-Wei Liao; Kuen-Yu Tsai; Fu-Min Wang; Yuen-Wuu Suen; Chieh-Hsiung Kuan; KUEN-YU TSAI; CHIEH-HSIUNG KUAN |
| 臺大學術典藏 |
2018-09-10T08:46:32Z |
Fabrication method of high-quality Ge nanocrystals on patterned Si substrates by local melting point control
|
Chien-Wei Chiu; Ting-Wei Liao; Kuen-Yu Tsai; Fu-Min Wang; Yuen-Wuu Suen; Chieh-Hsiung Kuan; KUEN-YU TSAI; CHIEH-HSIUNG KUAN |
| 臺大學術典藏 |
2018-09-10T08:46:32Z |
Impact of process-effect correction strategies on variability of critical dimension and electrical characteristics in extreme ultraviolet lithography
|
Ng, Sheng-Wei ; Chien, Bo-Sen ; Chang, Kuen-Yu ; Tsai*, Yi-Chang ; Lu, Jia-Han ; Li,Alek C.; ChenNg, Philip C.W.; Chien, Sheng-Wei; Chang, Bo-Sen; Tsai, Kuen-Yu; Lu, Yi-Chang; Li, Jia-Han; Chen, Alek C.; Ng, Philip C.W.; Chien, Sheng-Wei; Chang, Bo-Sen; Tsai, Kuen-Yu; Lu, Yi-Chang; Li, Jia-Han; Chen, Alek C.; YI-CHANG LU; KUEN-YU TSAI; Li, Jia-Han |
| 臺大學術典藏 |
2018-09-10T08:46:32Z |
Silicon photodiodes for electron beam position and drift detection in scanning electron microscopy and electron beam lithography system
|
Kuen-Yu Tsai; Yung-Yaw Chen; KUEN-YU TSAI; YUNG-YAW CHEN; JIA-YUSH YEN; Sheng-Yung Chen; Jia-Yush Yen; Cheng-Ju Wu; Yi-Hung Kuo |
| 臺大學術典藏 |
2018-09-10T08:46:32Z |
Silicon photodiodes for electron beam position and drift detection in scanning electron microscopy and electron beam lithography system
|
Kuen-Yu Tsai; Yung-Yaw Chen; KUEN-YU TSAI; YUNG-YAW CHEN; JIA-YUSH YEN; Sheng-Yung Chen; Jia-Yush Yen; Cheng-Ju Wu; Yi-Hung Kuo |
