| 臺大學術典藏 |
2018-09-10T08:18:22Z |
Impacts of point spread function calibration methods on model-based proximity effect correction for electron-beam-direct-write lithography
|
Chun-Hung Liu;Philip Ng;Yu-Tian Shen;Hoi-Tou Ng;Kuen-Yu Tsai; Chun-Hung Liu; Philip Ng; Yu-Tian Shen; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:22Z |
Impacts of point spread function calibration methods on model-based proximity effect correction for electron-beam-direct-write lithography
|
Chun-Hung Liu;Philip Ng;Yu-Tian Shen;Hoi-Tou Ng;Kuen-Yu Tsai; Chun-Hung Liu; Philip Ng; Yu-Tian Shen; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:22Z |
Impacts of point spread function calibration methods on model-based proximity effect correction for electron-beam-direct-write lithography
|
Chun-Hung Liu;Philip Ng;Yu-Tian Shen;Hoi-Tou Ng;Kuen-Yu Tsai; Chun-Hung Liu; Philip Ng; Yu-Tian Shen; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:22Z |
10 nm lines with 14 nm half pitch grating written in HSQ by electron beam direct write at 5 keV
|
Fu-Min Wang;Susumu Ono;Hsin-Hung Su;Kuen-Yu Tsai;Chieh-Hsiung Kuan; Fu-Min Wang; Susumu Ono; Hsin-Hung Su; Kuen-Yu Tsai; Chieh-Hsiung Kuan; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:22Z |
10 nm lines with 14 nm half pitch grating written in HSQ by electron beam direct write at 5 keV
|
Fu-Min Wang;Susumu Ono;Hsin-Hung Su;Kuen-Yu Tsai;Chieh-Hsiung Kuan; Fu-Min Wang; Susumu Ono; Hsin-Hung Su; Kuen-Yu Tsai; Chieh-Hsiung Kuan; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:22Z |
10 nm lines with 14 nm half pitch grating written in HSQ by electron beam direct write at 5 keV
|
Fu-Min Wang;Susumu Ono;Hsin-Hung Su;Kuen-Yu Tsai;Chieh-Hsiung Kuan; Fu-Min Wang; Susumu Ono; Hsin-Hung Su; Kuen-Yu Tsai; Chieh-Hsiung Kuan; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:22Z |
A non-delta-chrome OPC methodology for nonlinear process models
|
Philip C. W. Ng;Kuen-Yu Tsai;Lawrence S. Melvin III; Philip C. W. Ng; Kuen-Yu Tsai; Lawrence S. Melvin III; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:22Z |
A non-delta-chrome OPC methodology for nonlinear process models
|
Philip C. W. Ng;Kuen-Yu Tsai;Lawrence S. Melvin III; Philip C. W. Ng; Kuen-Yu Tsai; Lawrence S. Melvin III; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:22Z |
A non-delta-chrome OPC methodology for nonlinear process models
|
Philip C. W. Ng;Kuen-Yu Tsai;Lawrence S. Melvin III; Philip C. W. Ng; Kuen-Yu Tsai; Lawrence S. Melvin III; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:21Z |
Stochastic simulation of photon scattering for EUV mask defect inspection
|
Ting-Hang Pei;Kuen-Yu Tsai;Jia-Han Li; Ting-Hang Pei; Kuen-Yu Tsai; Jia-Han Li; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:21Z |
Stochastic simulation of photon scattering for EUV mask defect inspection
|
Ting-Hang Pei;Kuen-Yu Tsai;Jia-Han Li; Ting-Hang Pei; Kuen-Yu Tsai; Jia-Han Li; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:21Z |
Stochastic simulation of photon scattering for EUV mask defect inspection
|
Ting-Hang Pei;Kuen-Yu Tsai;Jia-Han Li; Ting-Hang Pei; Kuen-Yu Tsai; Jia-Han Li; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:21Z |
Model-based proximity effect correction for electron-beam direct-write lithography
|
Yu-Tian Shen; Kuen-Yu Tsai; KUEN-YU TSAI; Chun-Hung Liu;Pei-Lin Tien;Philip C. W. Ng;Yu-Tian Shen;Kuen-Yu Tsai; Chun-Hung Liu; Pei-Lin Tien; Philip C. W. Ng |
| 臺大學術典藏 |
2018-09-10T08:18:21Z |
Model-based proximity effect correction for electron-beam direct-write lithography
|
Yu-Tian Shen; Kuen-Yu Tsai; KUEN-YU TSAI; Chun-Hung Liu;Pei-Lin Tien;Philip C. W. Ng;Yu-Tian Shen;Kuen-Yu Tsai; Chun-Hung Liu; Pei-Lin Tien; Philip C. W. Ng |
| 臺大學術典藏 |
2018-09-10T08:18:21Z |
Model-based proximity effect correction for electron-beam direct-write lithography
|
Yu-Tian Shen; Kuen-Yu Tsai; KUEN-YU TSAI; Chun-Hung Liu;Pei-Lin Tien;Philip C. W. Ng;Yu-Tian Shen;Kuen-Yu Tsai; Chun-Hung Liu; Pei-Lin Tien; Philip C. W. Ng |
| 臺大學術典藏 |
2018-09-10T08:18:21Z |
A non-delta-chrome OPC methodology for process models with three-dimensional mask effects
|
Philip C. W. Ng;Kuen-Yu Tsai;Chih-Hsien Tang;Lawrence S. Melvin III; Philip C. W. Ng; Kuen-Yu Tsai; Chih-Hsien Tang; Lawrence S. Melvin III; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:21Z |
A non-delta-chrome OPC methodology for process models with three-dimensional mask effects
|
Philip C. W. Ng;Kuen-Yu Tsai;Chih-Hsien Tang;Lawrence S. Melvin III; Philip C. W. Ng; Kuen-Yu Tsai; Chih-Hsien Tang; Lawrence S. Melvin III; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:21Z |
A non-delta-chrome OPC methodology for process models with three-dimensional mask effects
|
Philip C. W. Ng;Kuen-Yu Tsai;Chih-Hsien Tang;Lawrence S. Melvin III; Philip C. W. Ng; Kuen-Yu Tsai; Chih-Hsien Tang; Lawrence S. Melvin III; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:21Z |
Analysis of fabrication misalignment effects in a MEMS-based electron-optical system design for direct-write lithography
|
Sheng-Yung Chen;Chieh-Chien Huang;Shin-Chuan Chen;Ting-Han Pei;Kuen-Yu Tsai; Sheng-Yung Chen; Chieh-Chien Huang; Shin-Chuan Chen; Ting-Han Pei; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:21Z |
Analysis of fabrication misalignment effects in a MEMS-based electron-optical system design for direct-write lithography
|
Sheng-Yung Chen;Chieh-Chien Huang;Shin-Chuan Chen;Ting-Han Pei;Kuen-Yu Tsai; Sheng-Yung Chen; Chieh-Chien Huang; Shin-Chuan Chen; Ting-Han Pei; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:21Z |
Analysis of fabrication misalignment effects in a MEMS-based electron-optical system design for direct-write lithography
|
Sheng-Yung Chen;Chieh-Chien Huang;Shin-Chuan Chen;Ting-Han Pei;Kuen-Yu Tsai; Sheng-Yung Chen; Chieh-Chien Huang; Shin-Chuan Chen; Ting-Han Pei; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:20Z |
Fresnel zone plate manufacturability analysis for direct-write lithography by simulating focusing and patterning performance versus fabrication errors
|
Kuen-Yu Tsai; Sheng-Yung Chen; Ting-Han Pei; Jia-Han Li; KUEN-YU TSAI; Kuen-Yu Tsai;Sheng-Yung Chen;Ting-Han Pei;Jia-Han Li |
| 臺大學術典藏 |
2018-09-10T08:18:20Z |
Fresnel zone plate manufacturability analysis for direct-write lithography by simulating focusing and patterning performance versus fabrication errors
|
Kuen-Yu Tsai; Sheng-Yung Chen; Ting-Han Pei; Jia-Han Li; KUEN-YU TSAI; Kuen-Yu Tsai;Sheng-Yung Chen;Ting-Han Pei;Jia-Han Li |
| 臺大學術典藏 |
2018-09-10T08:18:20Z |
Fresnel zone plate manufacturability analysis for direct-write lithography by simulating focusing and patterning performance versus fabrication errors
|
Kuen-Yu Tsai; Sheng-Yung Chen; Ting-Han Pei; Jia-Han Li; KUEN-YU TSAI; Kuen-Yu Tsai;Sheng-Yung Chen;Ting-Han Pei;Jia-Han Li |
| 臺大學術典藏 |
2018-09-10T08:18:20Z |
Efficient scattering simulations for equivalent extreme ultraviolet mask multilayer structures by modified transmission line theory and finite-difference time-domain method
|
Yen-Min Lee;Jia-Han Li;Philip C. W. Ng;Ting-Hang Pei;Fu-Min Wang;Kuen-Yu Tsai;Alek C. Chen; Yen-Min Lee; Jia-Han Li; Philip C. W. Ng; Ting-Hang Pei; Fu-Min Wang; Kuen-Yu Tsai; Alek C. Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:20Z |
Efficient scattering simulations for equivalent extreme ultraviolet mask multilayer structures by modified transmission line theory and finite-difference time-domain method
|
Yen-Min Lee;Jia-Han Li;Philip C. W. Ng;Ting-Hang Pei;Fu-Min Wang;Kuen-Yu Tsai;Alek C. Chen; Yen-Min Lee; Jia-Han Li; Philip C. W. Ng; Ting-Hang Pei; Fu-Min Wang; Kuen-Yu Tsai; Alek C. Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:20Z |
Efficient scattering simulations for equivalent extreme ultraviolet mask multilayer structures by modified transmission line theory and finite-difference time-domain method
|
Yen-Min Lee;Jia-Han Li;Philip C. W. Ng;Ting-Hang Pei;Fu-Min Wang;Kuen-Yu Tsai;Alek C. Chen; Yen-Min Lee; Jia-Han Li; Philip C. W. Ng; Ting-Hang Pei; Fu-Min Wang; Kuen-Yu Tsai; Alek C. Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:20Z |
A new method to improve accuracy of parasitics extraction considering sub-wavelength lithography effects
|
Kuen-Yu Tsai;Wei-Jhih Hsieh;Yuan-Ching Lu;Bo-Sen Chang;Sheng-Wei Chien;Yi-Chang Lu; Kuen-Yu Tsai; Wei-Jhih Hsieh; Yuan-Ching Lu; Bo-Sen Chang; Sheng-Wei Chien; Yi-Chang Lu; YI-CHANG LU; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:20Z |
A new method to improve accuracy of parasitics extraction considering sub-wavelength lithography effects
|
Kuen-Yu Tsai;Wei-Jhih Hsieh;Yuan-Ching Lu;Bo-Sen Chang;Sheng-Wei Chien;Yi-Chang Lu; Kuen-Yu Tsai; Wei-Jhih Hsieh; Yuan-Ching Lu; Bo-Sen Chang; Sheng-Wei Chien; Yi-Chang Lu; YI-CHANG LU; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:20Z |
A new method to improve accuracy of parasitics extraction considering sub-wavelength lithography effects
|
Kuen-Yu Tsai;Wei-Jhih Hsieh;Yuan-Ching Lu;Bo-Sen Chang;Sheng-Wei Chien;Yi-Chang Lu; Kuen-Yu Tsai; Wei-Jhih Hsieh; Yuan-Ching Lu; Bo-Sen Chang; Sheng-Wei Chien; Yi-Chang Lu; YI-CHANG LU; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:19Z |
Manufacturability analysis of a micro-electro-mechanical systems–based electron-optical system design for direct-write lithography
|
Sheng-Yung Chen;Shin-Chuan Chen;Hsing-Hong Chen;Kuen-Yu Tsai;Hsin-Hung Pan; Sheng-Yung Chen; Shin-Chuan Chen; Hsing-Hong Chen; Kuen-Yu Tsai; Hsin-Hung Pan; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:19Z |
Manufacturability analysis of a micro-electro-mechanical systems–based electron-optical system design for direct-write lithography
|
Sheng-Yung Chen;Shin-Chuan Chen;Hsing-Hong Chen;Kuen-Yu Tsai;Hsin-Hung Pan; Sheng-Yung Chen; Shin-Chuan Chen; Hsing-Hong Chen; Kuen-Yu Tsai; Hsin-Hung Pan; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:18:19Z |
Manufacturability analysis of a micro-electro-mechanical systems–based electron-optical system design for direct-write lithography
|
Sheng-Yung Chen;Shin-Chuan Chen;Hsing-Hong Chen;Kuen-Yu Tsai;Hsin-Hung Pan; Sheng-Yung Chen; Shin-Chuan Chen; Hsing-Hong Chen; Kuen-Yu Tsai; Hsin-Hung Pan; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:08:47Z |
Architecture for next generation massively parallel maskless lithography system (MPML2)
|
Su, M.-S.;Tsai, K.-Y.;Lu, Y.-C.;Kuo, Y.-H.;Pei, T.-H.;Yen, J.-Y.; Su, M.-S.; Tsai, K.-Y.; Lu, Y.-C.; Kuo, Y.-H.; Pei, T.-H.; Yen, J.-Y.; YI-CHANG LU; KUEN-YU TSAI; JIA-YUSH YEN |
| 臺大學術典藏 |
2018-09-10T07:42:07Z |
Using transmission line theory to calculate equivalent refractive index of EUV mask multilayer structures for efficient scattering simulation by finite-difference time-domain method
|
Yen-Min Lee;Jia-Han Li;Philip C. W. Ng;Ting-Han Pei;Fu-Min Wang;Kuen-Yu Tsai;Alek C. Chen; Yen-Min Lee; Jia-Han Li; Philip C. W. Ng; Ting-Han Pei; Fu-Min Wang; Kuen-Yu Tsai; Alek C. Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:07Z |
Using transmission line theory to calculate equivalent refractive index of EUV mask multilayer structures for efficient scattering simulation by finite-difference time-domain method
|
Yen-Min Lee;Jia-Han Li;Philip C. W. Ng;Ting-Han Pei;Fu-Min Wang;Kuen-Yu Tsai;Alek C. Chen; Yen-Min Lee; Jia-Han Li; Philip C. W. Ng; Ting-Han Pei; Fu-Min Wang; Kuen-Yu Tsai; Alek C. Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:07Z |
Using transmission line theory to calculate equivalent refractive index of EUV mask multilayer structures for efficient scattering simulation by finite-difference time-domain method
|
Yen-Min Lee;Jia-Han Li;Philip C. W. Ng;Ting-Han Pei;Fu-Min Wang;Kuen-Yu Tsai;Alek C. Chen; Yen-Min Lee; Jia-Han Li; Philip C. W. Ng; Ting-Han Pei; Fu-Min Wang; Kuen-Yu Tsai; Alek C. Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:07Z |
Determination of Gaussian beam and raster scan parameters in electron-beam-direct-write lithography considering device patterning and performance variability
|
Hoi-Tou Ng;Chun-Hung Liu;Hsing-Hong Chen;Kuen-Yu Tsai; Hoi-Tou Ng; Chun-Hung Liu; Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:07Z |
Determination of Gaussian beam and raster scan parameters in electron-beam-direct-write lithography considering device patterning and performance variability
|
Hoi-Tou Ng;Chun-Hung Liu;Hsing-Hong Chen;Kuen-Yu Tsai; Hoi-Tou Ng; Chun-Hung Liu; Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:07Z |
Determination of Gaussian beam and raster scan parameters in electron-beam-direct-write lithography considering device patterning and performance variability
|
Hoi-Tou Ng;Chun-Hung Liu;Hsing-Hong Chen;Kuen-Yu Tsai; Hoi-Tou Ng; Chun-Hung Liu; Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:07Z |
High resolution electron beam direct write on ZEP520 at 5 KeV
|
Fu-Min Wang;S. Ono;Hsing-Hong Su;Kuen-Yu Tsai;Chieh-Hsiung Kuan; Fu-Min Wang; S. Ono; Hsing-Hong Su; Kuen-Yu Tsai; Chieh-Hsiung Kuan; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:07Z |
High resolution electron beam direct write on ZEP520 at 5 KeV
|
Fu-Min Wang;S. Ono;Hsing-Hong Su;Kuen-Yu Tsai;Chieh-Hsiung Kuan; Fu-Min Wang; S. Ono; Hsing-Hong Su; Kuen-Yu Tsai; Chieh-Hsiung Kuan; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:07Z |
High resolution electron beam direct write on ZEP520 at 5 KeV
|
Fu-Min Wang;S. Ono;Hsing-Hong Su;Kuen-Yu Tsai;Chieh-Hsiung Kuan; Fu-Min Wang; S. Ono; Hsing-Hong Su; Kuen-Yu Tsai; Chieh-Hsiung Kuan; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:07Z |
Manufacturability analysis of a MEMS-based electron-optical system design for direct-write lithography
|
Sheng-Yung Chen;Shin-Chuan Chen;Hsing-Hong Chen;Ting-Han Pei;Kuen-Yu Tsai;Hsin-Hung Pan; Sheng-Yung Chen; Shin-Chuan Chen; Hsing-Hong Chen; Ting-Han Pei; Kuen-Yu Tsai; Hsin-Hung Pan; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:07Z |
Manufacturability analysis of a MEMS-based electron-optical system design for direct-write lithography
|
Sheng-Yung Chen;Shin-Chuan Chen;Hsing-Hong Chen;Ting-Han Pei;Kuen-Yu Tsai;Hsin-Hung Pan; Sheng-Yung Chen; Shin-Chuan Chen; Hsing-Hong Chen; Ting-Han Pei; Kuen-Yu Tsai; Hsin-Hung Pan; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:07Z |
Manufacturability analysis of a MEMS-based electron-optical system design for direct-write lithography
|
Sheng-Yung Chen;Shin-Chuan Chen;Hsing-Hong Chen;Ting-Han Pei;Kuen-Yu Tsai;Hsin-Hung Pan; Sheng-Yung Chen; Shin-Chuan Chen; Hsing-Hong Chen; Ting-Han Pei; Kuen-Yu Tsai; Hsin-Hung Pan; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:06Z |
A new parametric proximity effect model calibration method for improving accuracy of post-lithography patterning prediction in sub-32-nm half-pitch low-voltage electron beam direct-write lithography
|
Chun-Hung Liu;Hoi-Tou Ng;Kuen-Yu Tsai; Chun-Hung Liu; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:06Z |
A new parametric proximity effect model calibration method for improving accuracy of post-lithography patterning prediction in sub-32-nm half-pitch low-voltage electron beam direct-write lithography
|
Chun-Hung Liu;Hoi-Tou Ng;Kuen-Yu Tsai; Chun-Hung Liu; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:06Z |
A new parametric proximity effect model calibration method for improving accuracy of post-lithography patterning prediction in sub-32-nm half-pitch low-voltage electron beam direct-write lithography
|
Chun-Hung Liu;Hoi-Tou Ng;Kuen-Yu Tsai; Chun-Hung Liu; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:06Z |
A simple design rule check for DP decomposition
|
Chih-Hsien Tang;Kuen-Yu Tsai; Chih-Hsien Tang; Kuen-Yu Tsai; KUEN-YU TSAI |
