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Showing items 206-230 of 313  (13 Page(s) Totally)
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Institution Date Title Author
臺大學術典藏 2018-09-10T08:18:22Z 10 nm lines with 14 nm half pitch grating written in HSQ by electron beam direct write at 5 keV Fu-Min Wang;Susumu Ono;Hsin-Hung Su;Kuen-Yu Tsai;Chieh-Hsiung Kuan; Fu-Min Wang; Susumu Ono; Hsin-Hung Su; Kuen-Yu Tsai; Chieh-Hsiung Kuan; KUEN-YU TSAI
臺大學術典藏 2018-09-10T08:18:22Z A non-delta-chrome OPC methodology for nonlinear process models Philip C. W. Ng;Kuen-Yu Tsai;Lawrence S. Melvin III; Philip C. W. Ng; Kuen-Yu Tsai; Lawrence S. Melvin III; KUEN-YU TSAI
臺大學術典藏 2018-09-10T08:18:22Z A non-delta-chrome OPC methodology for nonlinear process models Philip C. W. Ng;Kuen-Yu Tsai;Lawrence S. Melvin III; Philip C. W. Ng; Kuen-Yu Tsai; Lawrence S. Melvin III; KUEN-YU TSAI
臺大學術典藏 2018-09-10T08:18:22Z A non-delta-chrome OPC methodology for nonlinear process models Philip C. W. Ng;Kuen-Yu Tsai;Lawrence S. Melvin III; Philip C. W. Ng; Kuen-Yu Tsai; Lawrence S. Melvin III; KUEN-YU TSAI
臺大學術典藏 2018-09-10T08:18:21Z Stochastic simulation of photon scattering for EUV mask defect inspection Ting-Hang Pei;Kuen-Yu Tsai;Jia-Han Li; Ting-Hang Pei; Kuen-Yu Tsai; Jia-Han Li; KUEN-YU TSAI
臺大學術典藏 2018-09-10T08:18:21Z Stochastic simulation of photon scattering for EUV mask defect inspection Ting-Hang Pei;Kuen-Yu Tsai;Jia-Han Li; Ting-Hang Pei; Kuen-Yu Tsai; Jia-Han Li; KUEN-YU TSAI
臺大學術典藏 2018-09-10T08:18:21Z Stochastic simulation of photon scattering for EUV mask defect inspection Ting-Hang Pei;Kuen-Yu Tsai;Jia-Han Li; Ting-Hang Pei; Kuen-Yu Tsai; Jia-Han Li; KUEN-YU TSAI
臺大學術典藏 2018-09-10T08:18:21Z Model-based proximity effect correction for electron-beam direct-write lithography Yu-Tian Shen; Kuen-Yu Tsai; KUEN-YU TSAI; Chun-Hung Liu;Pei-Lin Tien;Philip C. W. Ng;Yu-Tian Shen;Kuen-Yu Tsai; Chun-Hung Liu; Pei-Lin Tien; Philip C. W. Ng
臺大學術典藏 2018-09-10T08:18:21Z Model-based proximity effect correction for electron-beam direct-write lithography Yu-Tian Shen; Kuen-Yu Tsai; KUEN-YU TSAI; Chun-Hung Liu;Pei-Lin Tien;Philip C. W. Ng;Yu-Tian Shen;Kuen-Yu Tsai; Chun-Hung Liu; Pei-Lin Tien; Philip C. W. Ng
臺大學術典藏 2018-09-10T08:18:21Z Model-based proximity effect correction for electron-beam direct-write lithography Yu-Tian Shen; Kuen-Yu Tsai; KUEN-YU TSAI; Chun-Hung Liu;Pei-Lin Tien;Philip C. W. Ng;Yu-Tian Shen;Kuen-Yu Tsai; Chun-Hung Liu; Pei-Lin Tien; Philip C. W. Ng
臺大學術典藏 2018-09-10T08:18:21Z A non-delta-chrome OPC methodology for process models with three-dimensional mask effects Philip C. W. Ng;Kuen-Yu Tsai;Chih-Hsien Tang;Lawrence S. Melvin III; Philip C. W. Ng; Kuen-Yu Tsai; Chih-Hsien Tang; Lawrence S. Melvin III; KUEN-YU TSAI
臺大學術典藏 2018-09-10T08:18:21Z A non-delta-chrome OPC methodology for process models with three-dimensional mask effects Philip C. W. Ng;Kuen-Yu Tsai;Chih-Hsien Tang;Lawrence S. Melvin III; Philip C. W. Ng; Kuen-Yu Tsai; Chih-Hsien Tang; Lawrence S. Melvin III; KUEN-YU TSAI
臺大學術典藏 2018-09-10T08:18:21Z A non-delta-chrome OPC methodology for process models with three-dimensional mask effects Philip C. W. Ng;Kuen-Yu Tsai;Chih-Hsien Tang;Lawrence S. Melvin III; Philip C. W. Ng; Kuen-Yu Tsai; Chih-Hsien Tang; Lawrence S. Melvin III; KUEN-YU TSAI
臺大學術典藏 2018-09-10T08:18:21Z Analysis of fabrication misalignment effects in a MEMS-based electron-optical system design for direct-write lithography Sheng-Yung Chen;Chieh-Chien Huang;Shin-Chuan Chen;Ting-Han Pei;Kuen-Yu Tsai; Sheng-Yung Chen; Chieh-Chien Huang; Shin-Chuan Chen; Ting-Han Pei; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏 2018-09-10T08:18:21Z Analysis of fabrication misalignment effects in a MEMS-based electron-optical system design for direct-write lithography Sheng-Yung Chen;Chieh-Chien Huang;Shin-Chuan Chen;Ting-Han Pei;Kuen-Yu Tsai; Sheng-Yung Chen; Chieh-Chien Huang; Shin-Chuan Chen; Ting-Han Pei; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏 2018-09-10T08:18:21Z Analysis of fabrication misalignment effects in a MEMS-based electron-optical system design for direct-write lithography Sheng-Yung Chen;Chieh-Chien Huang;Shin-Chuan Chen;Ting-Han Pei;Kuen-Yu Tsai; Sheng-Yung Chen; Chieh-Chien Huang; Shin-Chuan Chen; Ting-Han Pei; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏 2018-09-10T08:18:20Z Fresnel zone plate manufacturability analysis for direct-write lithography by simulating focusing and patterning performance versus fabrication errors Kuen-Yu Tsai; Sheng-Yung Chen; Ting-Han Pei; Jia-Han Li; KUEN-YU TSAI; Kuen-Yu Tsai;Sheng-Yung Chen;Ting-Han Pei;Jia-Han Li
臺大學術典藏 2018-09-10T08:18:20Z Fresnel zone plate manufacturability analysis for direct-write lithography by simulating focusing and patterning performance versus fabrication errors Kuen-Yu Tsai; Sheng-Yung Chen; Ting-Han Pei; Jia-Han Li; KUEN-YU TSAI; Kuen-Yu Tsai;Sheng-Yung Chen;Ting-Han Pei;Jia-Han Li
臺大學術典藏 2018-09-10T08:18:20Z Fresnel zone plate manufacturability analysis for direct-write lithography by simulating focusing and patterning performance versus fabrication errors Kuen-Yu Tsai; Sheng-Yung Chen; Ting-Han Pei; Jia-Han Li; KUEN-YU TSAI; Kuen-Yu Tsai;Sheng-Yung Chen;Ting-Han Pei;Jia-Han Li
臺大學術典藏 2018-09-10T08:18:20Z Efficient scattering simulations for equivalent extreme ultraviolet mask multilayer structures by modified transmission line theory and finite-difference time-domain method Yen-Min Lee;Jia-Han Li;Philip C. W. Ng;Ting-Hang Pei;Fu-Min Wang;Kuen-Yu Tsai;Alek C. Chen; Yen-Min Lee; Jia-Han Li; Philip C. W. Ng; Ting-Hang Pei; Fu-Min Wang; Kuen-Yu Tsai; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏 2018-09-10T08:18:20Z Efficient scattering simulations for equivalent extreme ultraviolet mask multilayer structures by modified transmission line theory and finite-difference time-domain method Yen-Min Lee;Jia-Han Li;Philip C. W. Ng;Ting-Hang Pei;Fu-Min Wang;Kuen-Yu Tsai;Alek C. Chen; Yen-Min Lee; Jia-Han Li; Philip C. W. Ng; Ting-Hang Pei; Fu-Min Wang; Kuen-Yu Tsai; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏 2018-09-10T08:18:20Z Efficient scattering simulations for equivalent extreme ultraviolet mask multilayer structures by modified transmission line theory and finite-difference time-domain method Yen-Min Lee;Jia-Han Li;Philip C. W. Ng;Ting-Hang Pei;Fu-Min Wang;Kuen-Yu Tsai;Alek C. Chen; Yen-Min Lee; Jia-Han Li; Philip C. W. Ng; Ting-Hang Pei; Fu-Min Wang; Kuen-Yu Tsai; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏 2018-09-10T08:18:20Z A new method to improve accuracy of parasitics extraction considering sub-wavelength lithography effects Kuen-Yu Tsai;Wei-Jhih Hsieh;Yuan-Ching Lu;Bo-Sen Chang;Sheng-Wei Chien;Yi-Chang Lu; Kuen-Yu Tsai; Wei-Jhih Hsieh; Yuan-Ching Lu; Bo-Sen Chang; Sheng-Wei Chien; Yi-Chang Lu; YI-CHANG LU; KUEN-YU TSAI
臺大學術典藏 2018-09-10T08:18:20Z A new method to improve accuracy of parasitics extraction considering sub-wavelength lithography effects Kuen-Yu Tsai;Wei-Jhih Hsieh;Yuan-Ching Lu;Bo-Sen Chang;Sheng-Wei Chien;Yi-Chang Lu; Kuen-Yu Tsai; Wei-Jhih Hsieh; Yuan-Ching Lu; Bo-Sen Chang; Sheng-Wei Chien; Yi-Chang Lu; YI-CHANG LU; KUEN-YU TSAI
臺大學術典藏 2018-09-10T08:18:20Z A new method to improve accuracy of parasitics extraction considering sub-wavelength lithography effects Kuen-Yu Tsai;Wei-Jhih Hsieh;Yuan-Ching Lu;Bo-Sen Chang;Sheng-Wei Chien;Yi-Chang Lu; Kuen-Yu Tsai; Wei-Jhih Hsieh; Yuan-Ching Lu; Bo-Sen Chang; Sheng-Wei Chien; Yi-Chang Lu; YI-CHANG LU; KUEN-YU TSAI

Showing items 206-230 of 313  (13 Page(s) Totally)
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