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Showing items 236-260 of 313  (13 Page(s) Totally)
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Institution Date Title Author
臺大學術典藏 2018-09-10T07:42:07Z Using transmission line theory to calculate equivalent refractive index of EUV mask multilayer structures for efficient scattering simulation by finite-difference time-domain method Yen-Min Lee;Jia-Han Li;Philip C. W. Ng;Ting-Han Pei;Fu-Min Wang;Kuen-Yu Tsai;Alek C. Chen; Yen-Min Lee; Jia-Han Li; Philip C. W. Ng; Ting-Han Pei; Fu-Min Wang; Kuen-Yu Tsai; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏 2018-09-10T07:42:07Z Using transmission line theory to calculate equivalent refractive index of EUV mask multilayer structures for efficient scattering simulation by finite-difference time-domain method Yen-Min Lee;Jia-Han Li;Philip C. W. Ng;Ting-Han Pei;Fu-Min Wang;Kuen-Yu Tsai;Alek C. Chen; Yen-Min Lee; Jia-Han Li; Philip C. W. Ng; Ting-Han Pei; Fu-Min Wang; Kuen-Yu Tsai; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏 2018-09-10T07:42:07Z Determination of Gaussian beam and raster scan parameters in electron-beam-direct-write lithography considering device patterning and performance variability Hoi-Tou Ng;Chun-Hung Liu;Hsing-Hong Chen;Kuen-Yu Tsai; Hoi-Tou Ng; Chun-Hung Liu; Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏 2018-09-10T07:42:07Z Determination of Gaussian beam and raster scan parameters in electron-beam-direct-write lithography considering device patterning and performance variability Hoi-Tou Ng;Chun-Hung Liu;Hsing-Hong Chen;Kuen-Yu Tsai; Hoi-Tou Ng; Chun-Hung Liu; Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏 2018-09-10T07:42:07Z Determination of Gaussian beam and raster scan parameters in electron-beam-direct-write lithography considering device patterning and performance variability Hoi-Tou Ng;Chun-Hung Liu;Hsing-Hong Chen;Kuen-Yu Tsai; Hoi-Tou Ng; Chun-Hung Liu; Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏 2018-09-10T07:42:07Z High resolution electron beam direct write on ZEP520 at 5 KeV Fu-Min Wang;S. Ono;Hsing-Hong Su;Kuen-Yu Tsai;Chieh-Hsiung Kuan; Fu-Min Wang; S. Ono; Hsing-Hong Su; Kuen-Yu Tsai; Chieh-Hsiung Kuan; KUEN-YU TSAI
臺大學術典藏 2018-09-10T07:42:07Z High resolution electron beam direct write on ZEP520 at 5 KeV Fu-Min Wang;S. Ono;Hsing-Hong Su;Kuen-Yu Tsai;Chieh-Hsiung Kuan; Fu-Min Wang; S. Ono; Hsing-Hong Su; Kuen-Yu Tsai; Chieh-Hsiung Kuan; KUEN-YU TSAI
臺大學術典藏 2018-09-10T07:42:07Z High resolution electron beam direct write on ZEP520 at 5 KeV Fu-Min Wang;S. Ono;Hsing-Hong Su;Kuen-Yu Tsai;Chieh-Hsiung Kuan; Fu-Min Wang; S. Ono; Hsing-Hong Su; Kuen-Yu Tsai; Chieh-Hsiung Kuan; KUEN-YU TSAI
臺大學術典藏 2018-09-10T07:42:07Z Manufacturability analysis of a MEMS-based electron-optical system design for direct-write lithography Sheng-Yung Chen;Shin-Chuan Chen;Hsing-Hong Chen;Ting-Han Pei;Kuen-Yu Tsai;Hsin-Hung Pan; Sheng-Yung Chen; Shin-Chuan Chen; Hsing-Hong Chen; Ting-Han Pei; Kuen-Yu Tsai; Hsin-Hung Pan; KUEN-YU TSAI
臺大學術典藏 2018-09-10T07:42:07Z Manufacturability analysis of a MEMS-based electron-optical system design for direct-write lithography Sheng-Yung Chen;Shin-Chuan Chen;Hsing-Hong Chen;Ting-Han Pei;Kuen-Yu Tsai;Hsin-Hung Pan; Sheng-Yung Chen; Shin-Chuan Chen; Hsing-Hong Chen; Ting-Han Pei; Kuen-Yu Tsai; Hsin-Hung Pan; KUEN-YU TSAI
臺大學術典藏 2018-09-10T07:42:07Z Manufacturability analysis of a MEMS-based electron-optical system design for direct-write lithography Sheng-Yung Chen;Shin-Chuan Chen;Hsing-Hong Chen;Ting-Han Pei;Kuen-Yu Tsai;Hsin-Hung Pan; Sheng-Yung Chen; Shin-Chuan Chen; Hsing-Hong Chen; Ting-Han Pei; Kuen-Yu Tsai; Hsin-Hung Pan; KUEN-YU TSAI
臺大學術典藏 2018-09-10T07:42:06Z A new parametric proximity effect model calibration method for improving accuracy of post-lithography patterning prediction in sub-32-nm half-pitch low-voltage electron beam direct-write lithography Chun-Hung Liu;Hoi-Tou Ng;Kuen-Yu Tsai; Chun-Hung Liu; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏 2018-09-10T07:42:06Z A new parametric proximity effect model calibration method for improving accuracy of post-lithography patterning prediction in sub-32-nm half-pitch low-voltage electron beam direct-write lithography Chun-Hung Liu;Hoi-Tou Ng;Kuen-Yu Tsai; Chun-Hung Liu; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏 2018-09-10T07:42:06Z A new parametric proximity effect model calibration method for improving accuracy of post-lithography patterning prediction in sub-32-nm half-pitch low-voltage electron beam direct-write lithography Chun-Hung Liu;Hoi-Tou Ng;Kuen-Yu Tsai; Chun-Hung Liu; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏 2018-09-10T07:42:06Z A simple design rule check for DP decomposition Chih-Hsien Tang;Kuen-Yu Tsai; Chih-Hsien Tang; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏 2018-09-10T07:42:06Z A simple design rule check for DP decomposition Chih-Hsien Tang;Kuen-Yu Tsai; Chih-Hsien Tang; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏 2018-09-10T07:42:06Z A simple design rule check for DP decomposition Chih-Hsien Tang;Kuen-Yu Tsai; Chih-Hsien Tang; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏 2018-09-10T07:42:06Z Effects of Fresnel zone plate fabrication errors on focusing performances Ting-Hang Pei;Kuen-Yu Tsai;Jia-Han Li; Ting-Hang Pei; Kuen-Yu Tsai; Jia-Han Li; KUEN-YU TSAI
臺大學術典藏 2018-09-10T07:42:06Z Effects of Fresnel zone plate fabrication errors on focusing performances Ting-Hang Pei;Kuen-Yu Tsai;Jia-Han Li; Ting-Hang Pei; Kuen-Yu Tsai; Jia-Han Li; KUEN-YU TSAI
臺大學術典藏 2018-09-10T07:42:06Z Effects of Fresnel zone plate fabrication errors on focusing performances Ting-Hang Pei;Kuen-Yu Tsai;Jia-Han Li; Ting-Hang Pei; Kuen-Yu Tsai; Jia-Han Li; KUEN-YU TSAI
臺大學術典藏 2018-09-10T07:42:06Z A fully model-based methodology for simultaneously correcting EUV mask shadowing and optical proximity effects with improved pattern transfer fidelity and process windows Philip C. W. Ng;Kuen-Yu Tsai;Yen-Min Lee;Ting-Han Pei;Fu-Min Wang;Jia-Han Li;Alek C. Chen; Philip C. W. Ng; Kuen-Yu Tsai; Yen-Min Lee; Ting-Han Pei; Fu-Min Wang; Jia-Han Li; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏 2018-09-10T07:42:06Z A fully model-based methodology for simultaneously correcting EUV mask shadowing and optical proximity effects with improved pattern transfer fidelity and process windows Philip C. W. Ng;Kuen-Yu Tsai;Yen-Min Lee;Ting-Han Pei;Fu-Min Wang;Jia-Han Li;Alek C. Chen; Philip C. W. Ng; Kuen-Yu Tsai; Yen-Min Lee; Ting-Han Pei; Fu-Min Wang; Jia-Han Li; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏 2018-09-10T07:42:06Z A fully model-based methodology for simultaneously correcting EUV mask shadowing and optical proximity effects with improved pattern transfer fidelity and process windows Philip C. W. Ng;Kuen-Yu Tsai;Yen-Min Lee;Ting-Han Pei;Fu-Min Wang;Jia-Han Li;Alek C. Chen; Philip C. W. Ng; Kuen-Yu Tsai; Yen-Min Lee; Ting-Han Pei; Fu-Min Wang; Jia-Han Li; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏 2018-09-10T07:42:05Z Selection of Gaussian-beam and raster-scan parameters in electron-beam direct-write lithography considering device patterning and performance variability Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI; Chun-Hung Liu; Hoi-Tou Ng;Chun-Hung Liu;Hsing-Hong Chen;Kuen-Yu Tsai; Hoi-Tou Ng
臺大學術典藏 2018-09-10T07:42:05Z Selection of Gaussian-beam and raster-scan parameters in electron-beam direct-write lithography considering device patterning and performance variability Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI; Chun-Hung Liu; Hoi-Tou Ng;Chun-Hung Liu;Hsing-Hong Chen;Kuen-Yu Tsai; Hoi-Tou Ng

Showing items 236-260 of 313  (13 Page(s) Totally)
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