| 臺大學術典藏 |
2018-09-10T07:42:07Z |
High resolution electron beam direct write on ZEP520 at 5 KeV
|
Fu-Min Wang;S. Ono;Hsing-Hong Su;Kuen-Yu Tsai;Chieh-Hsiung Kuan; Fu-Min Wang; S. Ono; Hsing-Hong Su; Kuen-Yu Tsai; Chieh-Hsiung Kuan; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:07Z |
High resolution electron beam direct write on ZEP520 at 5 KeV
|
Fu-Min Wang;S. Ono;Hsing-Hong Su;Kuen-Yu Tsai;Chieh-Hsiung Kuan; Fu-Min Wang; S. Ono; Hsing-Hong Su; Kuen-Yu Tsai; Chieh-Hsiung Kuan; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:07Z |
High resolution electron beam direct write on ZEP520 at 5 KeV
|
Fu-Min Wang;S. Ono;Hsing-Hong Su;Kuen-Yu Tsai;Chieh-Hsiung Kuan; Fu-Min Wang; S. Ono; Hsing-Hong Su; Kuen-Yu Tsai; Chieh-Hsiung Kuan; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:07Z |
Manufacturability analysis of a MEMS-based electron-optical system design for direct-write lithography
|
Sheng-Yung Chen;Shin-Chuan Chen;Hsing-Hong Chen;Ting-Han Pei;Kuen-Yu Tsai;Hsin-Hung Pan; Sheng-Yung Chen; Shin-Chuan Chen; Hsing-Hong Chen; Ting-Han Pei; Kuen-Yu Tsai; Hsin-Hung Pan; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:07Z |
Manufacturability analysis of a MEMS-based electron-optical system design for direct-write lithography
|
Sheng-Yung Chen;Shin-Chuan Chen;Hsing-Hong Chen;Ting-Han Pei;Kuen-Yu Tsai;Hsin-Hung Pan; Sheng-Yung Chen; Shin-Chuan Chen; Hsing-Hong Chen; Ting-Han Pei; Kuen-Yu Tsai; Hsin-Hung Pan; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:07Z |
Manufacturability analysis of a MEMS-based electron-optical system design for direct-write lithography
|
Sheng-Yung Chen;Shin-Chuan Chen;Hsing-Hong Chen;Ting-Han Pei;Kuen-Yu Tsai;Hsin-Hung Pan; Sheng-Yung Chen; Shin-Chuan Chen; Hsing-Hong Chen; Ting-Han Pei; Kuen-Yu Tsai; Hsin-Hung Pan; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:06Z |
A new parametric proximity effect model calibration method for improving accuracy of post-lithography patterning prediction in sub-32-nm half-pitch low-voltage electron beam direct-write lithography
|
Chun-Hung Liu;Hoi-Tou Ng;Kuen-Yu Tsai; Chun-Hung Liu; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:06Z |
A new parametric proximity effect model calibration method for improving accuracy of post-lithography patterning prediction in sub-32-nm half-pitch low-voltage electron beam direct-write lithography
|
Chun-Hung Liu;Hoi-Tou Ng;Kuen-Yu Tsai; Chun-Hung Liu; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:06Z |
A new parametric proximity effect model calibration method for improving accuracy of post-lithography patterning prediction in sub-32-nm half-pitch low-voltage electron beam direct-write lithography
|
Chun-Hung Liu;Hoi-Tou Ng;Kuen-Yu Tsai; Chun-Hung Liu; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:06Z |
A simple design rule check for DP decomposition
|
Chih-Hsien Tang;Kuen-Yu Tsai; Chih-Hsien Tang; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:06Z |
A simple design rule check for DP decomposition
|
Chih-Hsien Tang;Kuen-Yu Tsai; Chih-Hsien Tang; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:06Z |
A simple design rule check for DP decomposition
|
Chih-Hsien Tang;Kuen-Yu Tsai; Chih-Hsien Tang; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:06Z |
Effects of Fresnel zone plate fabrication errors on focusing performances
|
Ting-Hang Pei;Kuen-Yu Tsai;Jia-Han Li; Ting-Hang Pei; Kuen-Yu Tsai; Jia-Han Li; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:06Z |
Effects of Fresnel zone plate fabrication errors on focusing performances
|
Ting-Hang Pei;Kuen-Yu Tsai;Jia-Han Li; Ting-Hang Pei; Kuen-Yu Tsai; Jia-Han Li; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:06Z |
Effects of Fresnel zone plate fabrication errors on focusing performances
|
Ting-Hang Pei;Kuen-Yu Tsai;Jia-Han Li; Ting-Hang Pei; Kuen-Yu Tsai; Jia-Han Li; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:06Z |
A fully model-based methodology for simultaneously correcting EUV mask shadowing and optical proximity effects with improved pattern transfer fidelity and process windows
|
Philip C. W. Ng;Kuen-Yu Tsai;Yen-Min Lee;Ting-Han Pei;Fu-Min Wang;Jia-Han Li;Alek C. Chen; Philip C. W. Ng; Kuen-Yu Tsai; Yen-Min Lee; Ting-Han Pei; Fu-Min Wang; Jia-Han Li; Alek C. Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:06Z |
A fully model-based methodology for simultaneously correcting EUV mask shadowing and optical proximity effects with improved pattern transfer fidelity and process windows
|
Philip C. W. Ng;Kuen-Yu Tsai;Yen-Min Lee;Ting-Han Pei;Fu-Min Wang;Jia-Han Li;Alek C. Chen; Philip C. W. Ng; Kuen-Yu Tsai; Yen-Min Lee; Ting-Han Pei; Fu-Min Wang; Jia-Han Li; Alek C. Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:06Z |
A fully model-based methodology for simultaneously correcting EUV mask shadowing and optical proximity effects with improved pattern transfer fidelity and process windows
|
Philip C. W. Ng;Kuen-Yu Tsai;Yen-Min Lee;Ting-Han Pei;Fu-Min Wang;Jia-Han Li;Alek C. Chen; Philip C. W. Ng; Kuen-Yu Tsai; Yen-Min Lee; Ting-Han Pei; Fu-Min Wang; Jia-Han Li; Alek C. Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:05Z |
Selection of Gaussian-beam and raster-scan parameters in electron-beam direct-write lithography considering device patterning and performance variability
|
Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI; Chun-Hung Liu; Hoi-Tou Ng;Chun-Hung Liu;Hsing-Hong Chen;Kuen-Yu Tsai; Hoi-Tou Ng |
| 臺大學術典藏 |
2018-09-10T07:42:05Z |
Selection of Gaussian-beam and raster-scan parameters in electron-beam direct-write lithography considering device patterning and performance variability
|
Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI; Chun-Hung Liu; Hoi-Tou Ng;Chun-Hung Liu;Hsing-Hong Chen;Kuen-Yu Tsai; Hoi-Tou Ng |
| 臺大學術典藏 |
2018-09-10T07:42:05Z |
Selection of Gaussian-beam and raster-scan parameters in electron-beam direct-write lithography considering device patterning and performance variability
|
Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI; Chun-Hung Liu; Hoi-Tou Ng;Chun-Hung Liu;Hsing-Hong Chen;Kuen-Yu Tsai; Hoi-Tou Ng |
| 臺大學術典藏 |
2018-09-10T07:42:05Z |
Servo system design of a high-resolution piezo-driven fine stage for step-and-repeat microlithography systems
|
Kuen-Yu Tsai; Jia-Yush Yen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:42:05Z |
Servo system design of a high-resolution piezo-driven fine stage for step-and-repeat microlithography systems
|
Kuen-Yu Tsai; Jia-Yush Yen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:36:10Z |
Preliminary design of a two-dimensional electron beam position monitor system for multiple-electron-beam-direct-write lithography
|
Chen, S.-Y.;Tsai, K.-Y.;Ng, H.-T.;Fan, C.-H.;Pei, T.-H.;Kuan, C.-H.;Chen, Y.-Y.;Yen, J.-Y.; Chen, S.-Y.; Tsai, K.-Y.; Ng, H.-T.; Fan, C.-H.; Pei, T.-H.; Kuan, C.-H.; Chen, Y.-Y.; Yen, J.-Y.; CHIEH-HSIUNG KUAN; YUNG-YAW CHEN; KUEN-YU TSAI; JIA-YUSH YEN |
| 臺大學術典藏 |
2018-09-10T07:27:47Z |
Hybrid servo design for large area nano pattern stitching
|
Yen, J.-Y.;Chen, C.-H.;Chen, L.-S.;Tsai, K.-Y.;Chang, S.-H.; Yen, J.-Y.; Chen, C.-H.; Chen, L.-S.; Tsai, K.-Y.; Chang, S.-H.; KUEN-YU TSAI; JIA-YUSH YEN |
| 臺大學術典藏 |
2018-09-10T07:08:40Z |
A new method to improve accuracy of leakage current estimation for transistors with non-rectangular gates due to sub-wavelength lithography effects
|
Meng-Fu You; Yi-Chang Lu; Philip C. W. Ng; YI-CHANG LU; KUEN-YU TSAI; Kuen-Yu Tsai;Meng-Fu You;Yi-Chang Lu;Philip C. W. Ng; Kuen-Yu Tsai |
| 臺大學術典藏 |
2018-09-10T07:08:40Z |
A new method to improve accuracy of leakage current estimation for transistors with non-rectangular gates due to sub-wavelength lithography effects
|
Meng-Fu You; Yi-Chang Lu; Philip C. W. Ng; YI-CHANG LU; KUEN-YU TSAI; Kuen-Yu Tsai;Meng-Fu You;Yi-Chang Lu;Philip C. W. Ng; Kuen-Yu Tsai |
| 臺大學術典藏 |
2018-09-10T07:08:40Z |
A new method to improve accuracy of leakage current estimation for transistors with non-rectangular gates due to sub-wavelength lithography effects
|
Meng-Fu You; Yi-Chang Lu; Philip C. W. Ng; YI-CHANG LU; KUEN-YU TSAI; Kuen-Yu Tsai;Meng-Fu You;Yi-Chang Lu;Philip C. W. Ng; Kuen-Yu Tsai |
| 臺大學術典藏 |
2018-09-10T07:08:40Z |
A novel curve-fitting procedure for determining proximity effect parameters in electron beam lithography
|
Chun-Hung Liu;Hoi-Tou Ng;Philip C. W. Ng;Kuen-Yu Tsai;Shy-Jay Lin;Jeng-Horng Chen; Chun-Hung Liu; Hoi-Tou Ng; Philip C. W. Ng; Kuen-Yu Tsai; Shy-Jay Lin; Jeng-Horng Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:08:40Z |
A novel curve-fitting procedure for determining proximity effect parameters in electron beam lithography
|
Chun-Hung Liu;Hoi-Tou Ng;Philip C. W. Ng;Kuen-Yu Tsai;Shy-Jay Lin;Jeng-Horng Chen; Chun-Hung Liu; Hoi-Tou Ng; Philip C. W. Ng; Kuen-Yu Tsai; Shy-Jay Lin; Jeng-Horng Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T07:08:40Z |
A novel curve-fitting procedure for determining proximity effect parameters in electron beam lithography
|
Chun-Hung Liu;Hoi-Tou Ng;Philip C. W. Ng;Kuen-Yu Tsai;Shy-Jay Lin;Jeng-Horng Chen; Chun-Hung Liu; Hoi-Tou Ng; Philip C. W. Ng; Kuen-Yu Tsai; Shy-Jay Lin; Jeng-Horng Chen; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T06:35:26Z |
Real-time spatial control of photoresist development rate
|
Arthur Tay; Weng-Khuen Ho; Ni Hu; Choon-Meng Kiew; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T06:35:26Z |
Real-time spatial control of photoresist development rate
|
Arthur Tay; Weng-Khuen Ho; Ni Hu; Choon-Meng Kiew; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T06:35:26Z |
Servo System Design of a High-Resolution Piezo-Driven Three Degree-of-Freedom Fine Stage for Integrated-Circuit Wafer Step-and-Repeat Lithography Systems
|
Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T06:35:26Z |
Servo System Design of a High-Resolution Piezo-Driven Three Degree-of-Freedom Fine Stage for Integrated-Circuit Wafer Step-and-Repeat Lithography Systems
|
Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T06:35:25Z |
Impacts of optical proximity correction settings on electrical performances
|
Meng-Fu You; Philip C. W. Ng; Yi-Sheng Su; Kuen-Yu Tsai; Yi-Chang Lu; YI-CHANG LU; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T06:35:25Z |
Impacts of optical proximity correction settings on electrical performances
|
Meng-Fu You; Philip C. W. Ng; Yi-Sheng Su; Kuen-Yu Tsai; Yi-Chang Lu; YI-CHANG LU; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T06:02:40Z |
Method for Fast Design of Multi-objective Frequency-shaping Equalizers
|
Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T06:02:40Z |
Method for Fast Design of Multi-objective Frequency-shaping Equalizers
|
Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T06:02:39Z |
A fast in situ approach to estimating wafer warpage profile during thermal processing in microlithography
|
Ni Hu; Arthur Tay; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T06:02:39Z |
A fast in situ approach to estimating wafer warpage profile during thermal processing in microlithography
|
Ni Hu; Arthur Tay; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T06:02:39Z |
Real-time spatial control of steady-state wafer temperature during thermal processing in microlithography
|
Arthur Tay; Weng-Khuen Ho; Ni Hu; Kuen-Yu Tsai; Ying Zhou; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T06:02:39Z |
Real-time spatial control of steady-state wafer temperature during thermal processing in microlithography
|
Arthur Tay; Weng-Khuen Ho; Ni Hu; Kuen-Yu Tsai; Ying Zhou; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T06:02:39Z |
Identifications of the PZT Actuated Novel Optical Scanning System
|
Yea-Chin Yeh; Chun-Hung Liu; Kuen-Yu Tsai; Yu-Chen Kung; Jia-Yush Yen; Jyh-Fa Lee; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T06:02:39Z |
Identifications of the PZT Actuated Novel Optical Scanning System
|
Yea-Chin Yeh; Chun-Hung Liu; Kuen-Yu Tsai; Yu-Chen Kung; Jia-Yush Yen; Jyh-Fa Lee; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T06:02:39Z |
Feedback control of piezo-based nanopositioning systems for semiconductor manufacturing
|
Kuen-Yu Tsai; Jia-Yush Yen; Arthur Tay; Jyh-Fa Lee; KUEN-YU TSAI; Yea-Chin Yeh; Chun-Hung Liu |
| 臺大學術典藏 |
2018-09-10T06:02:39Z |
Feedback control of piezo-based nanopositioning systems for semiconductor manufacturing
|
Kuen-Yu Tsai; Jia-Yush Yen; Arthur Tay; Jyh-Fa Lee; KUEN-YU TSAI; Yea-Chin Yeh; Chun-Hung Liu |
| 臺大學術典藏 |
2018-09-10T05:27:09Z |
In-situ fault detection of wafer warpage in lithography
|
Arthur Tay; Weng Khuen Ho; Christopher Yap; Chen Wei; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T05:27:09Z |
In-situ fault detection of wafer warpage in lithography
|
Arthur Tay; Weng Khuen Ho; Christopher Yap; Chen Wei; Kuen-Yu Tsai; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T05:27:09Z |
On the sensitivity improvement and cross-correlation methodology for confocal EUV mask blank defect inspection tool fleet
|
Kuen-Yu Tsai; Eric M. Gullikson; Patrick Kearney; Alan R. Stivers; KUEN-YU TSAI |
