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显示项目 66-90 / 313 (共13页)
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机构	日期	题名	作者
臺大學術典藏	2018-09-10T15:00:24Z	Refractive index and effective thickness measurement system for the RGB color filter coatings with absorption and scattering properties	Yen-Min Lee;Hsin-Hung Cheng;Jia-Han Li;Kuen-Yu Tsai;Yu-Tian Sheng; Yen-Min Lee; Hsin-Hung Cheng; Jia-Han Li; Kuen-Yu Tsai; Yu-Tian Sheng; KUEN-YU TSAI
臺大學術典藏	2018-09-10T15:00:24Z	Refractive index and effective thickness measurement system for the RGB color filter coatings with absorption and scattering properties	Yen-Min Lee;Hsin-Hung Cheng;Jia-Han Li;Kuen-Yu Tsai;Yu-Tian Sheng; Yen-Min Lee; Hsin-Hung Cheng; Jia-Han Li; Kuen-Yu Tsai; Yu-Tian Sheng; KUEN-YU TSAI
臺大學術典藏	2018-09-10T15:00:24Z	Optical scatterometry system for detecting specific line edge roughness of resist gratings subjected to detector noises	Yen-Min Lee;Jia-Han Li;Fu-Min Wang;Hsin-Hung Cheng;Yu-Tian Shen;Kuen-Yu Tsai;Jason Shieh;Alek Chen; Yen-Min Lee; Jia-Han Li; Fu-Min Wang; Hsin-Hung Cheng; Yu-Tian Shen; Kuen-Yu Tsai; Jason Shieh; Alek Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T15:00:24Z	Optical scatterometry system for detecting specific line edge roughness of resist gratings subjected to detector noises	Yen-Min Lee;Jia-Han Li;Fu-Min Wang;Hsin-Hung Cheng;Yu-Tian Shen;Kuen-Yu Tsai;Jason Shieh;Alek Chen; Yen-Min Lee; Jia-Han Li; Fu-Min Wang; Hsin-Hung Cheng; Yu-Tian Shen; Kuen-Yu Tsai; Jason Shieh; Alek Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T15:00:24Z	Optical scatterometry system for detecting specific line edge roughness of resist gratings subjected to detector noises	Yen-Min Lee;Jia-Han Li;Fu-Min Wang;Hsin-Hung Cheng;Yu-Tian Shen;Kuen-Yu Tsai;Jason Shieh;Alek Chen; Yen-Min Lee; Jia-Han Li; Fu-Min Wang; Hsin-Hung Cheng; Yu-Tian Shen; Kuen-Yu Tsai; Jason Shieh; Alek Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T15:00:24Z	Improvement in electron-beam lithography throughput by exploiting relaxed patterning fidelity requirements with directed self-assembly	Hao-Yun Yu;Chun-Hung Liu;Yu-Tian Shen;Hsuan-Ping Lee;Kuen-Yu Tsai; Hao-Yun Yu; Chun-Hung Liu; Yu-Tian Shen; Hsuan-Ping Lee; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T15:00:24Z	Improvement in electron-beam lithography throughput by exploiting relaxed patterning fidelity requirements with directed self-assembly	Hao-Yun Yu;Chun-Hung Liu;Yu-Tian Shen;Hsuan-Ping Lee;Kuen-Yu Tsai; Hao-Yun Yu; Chun-Hung Liu; Yu-Tian Shen; Hsuan-Ping Lee; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T15:00:24Z	Improvement in electron-beam lithography throughput by exploiting relaxed patterning fidelity requirements with directed self-assembly	Hao-Yun Yu;Chun-Hung Liu;Yu-Tian Shen;Hsuan-Ping Lee;Kuen-Yu Tsai; Hao-Yun Yu; Chun-Hung Liu; Yu-Tian Shen; Hsuan-Ping Lee; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T15:00:24Z	Direct-scatterometry-enabled PEC model calibration with two-dimensional layouts	Yi-Yeh Yang;Hsuan-Ping Lee;Chun-Hung Liu;Hao-Yun Yu;Kuen-Yu Tsai;Jia-Han Li; Yi-Yeh Yang; Hsuan-Ping Lee; Chun-Hung Liu; Hao-Yun Yu; Kuen-Yu Tsai; Jia-Han Li; KUEN-YU TSAI
臺大學術典藏	2018-09-10T15:00:24Z	Direct-scatterometry-enabled PEC model calibration with two-dimensional layouts	Yi-Yeh Yang;Hsuan-Ping Lee;Chun-Hung Liu;Hao-Yun Yu;Kuen-Yu Tsai;Jia-Han Li; Yi-Yeh Yang; Hsuan-Ping Lee; Chun-Hung Liu; Hao-Yun Yu; Kuen-Yu Tsai; Jia-Han Li; KUEN-YU TSAI
臺大學術典藏	2018-09-10T15:00:24Z	Direct-scatterometry-enabled PEC model calibration with two-dimensional layouts	Yi-Yeh Yang;Hsuan-Ping Lee;Chun-Hung Liu;Hao-Yun Yu;Kuen-Yu Tsai;Jia-Han Li; Yi-Yeh Yang; Hsuan-Ping Lee; Chun-Hung Liu; Hao-Yun Yu; Kuen-Yu Tsai; Jia-Han Li; KUEN-YU TSAI
臺大學術典藏	2018-09-10T15:00:24Z	A New EUV Mask Blank Defect Inspection Method with Coherent Diffraction Imaging	Ding Qi;Kuen-Yu Tsai;Jia-Han Li; Ding Qi; Kuen-Yu Tsai; Jia-Han Li; KUEN-YU TSAI
臺大學術典藏	2018-09-10T15:00:24Z	A New EUV Mask Blank Defect Inspection Method with Coherent Diffraction Imaging	Ding Qi;Kuen-Yu Tsai;Jia-Han Li; Ding Qi; Kuen-Yu Tsai; Jia-Han Li; KUEN-YU TSAI
臺大學術典藏	2018-09-10T15:00:24Z	A New EUV Mask Blank Defect Inspection Method with Coherent Diffraction Imaging	Ding Qi;Kuen-Yu Tsai;Jia-Han Li; Ding Qi; Kuen-Yu Tsai; Jia-Han Li; KUEN-YU TSAI
臺大學術典藏	2018-09-10T15:00:24Z	Electron-Beam Lithographic Method, System and Method For Controlling Electron-Beam Servo (電子束微影方法、電子束微影伺服控制方法及系統)	Jia-Yush Yen;Kuen-Yu Tsai;Lien-Sheng Chen;Pablo Chiu;Hsin-Fan Tsai; Jia-Yush Yen; Kuen-Yu Tsai; Lien-Sheng Chen; Pablo Chiu; Hsin-Fan Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T15:00:24Z	Electron-Beam Lithographic Method, System and Method For Controlling Electron-Beam Servo (電子束微影方法、電子束微影伺服控制方法及系統)	Jia-Yush Yen;Kuen-Yu Tsai;Lien-Sheng Chen;Pablo Chiu;Hsin-Fan Tsai; Jia-Yush Yen; Kuen-Yu Tsai; Lien-Sheng Chen; Pablo Chiu; Hsin-Fan Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T15:00:24Z	Electron-Beam Lithographic Method, System and Method For Controlling Electron-Beam Servo (電子束微影方法、電子束微影伺服控制方法及系統)	Jia-Yush Yen;Kuen-Yu Tsai;Lien-Sheng Chen;Pablo Chiu;Hsin-Fan Tsai; Jia-Yush Yen; Kuen-Yu Tsai; Lien-Sheng Chen; Pablo Chiu; Hsin-Fan Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T15:00:24Z	Apparatus and Method for Estimating Change of Status of Particle Beams (粒子束狀態改變之估測裝置及其方法)	Kuen-Yu Tsai;Sheng-Yung Chen; Kuen-Yu Tsai; Sheng-Yung Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T15:00:24Z	Apparatus and Method for Estimating Change of Status of Particle Beams (粒子束狀態改變之估測裝置及其方法)	Kuen-Yu Tsai;Sheng-Yung Chen; Kuen-Yu Tsai; Sheng-Yung Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T15:00:24Z	Apparatus and Method for Estimating Change of Status of Particle Beams (粒子束狀態改變之估測裝置及其方法)	Kuen-Yu Tsai;Sheng-Yung Chen; Kuen-Yu Tsai; Sheng-Yung Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T15:00:24Z	Method for Adjusting Status of Particle Beams for Patterning A Substrate and System Using the Same (於一基板上製作圖案時之粒子束狀態調整方法及其系統)	Kuen-Yu Tsai;Sheng-Yung Chen; Kuen-Yu Tsai; Sheng-Yung Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T15:00:24Z	Method for Adjusting Status of Particle Beams for Patterning A Substrate and System Using the Same (於一基板上製作圖案時之粒子束狀態調整方法及其系統)	Kuen-Yu Tsai;Sheng-Yung Chen; Kuen-Yu Tsai; Sheng-Yung Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T15:00:24Z	Method for Adjusting Status of Particle Beams for Patterning A Substrate and System Using the Same (於一基板上製作圖案時之粒子束狀態調整方法及其系統)	Kuen-Yu Tsai;Sheng-Yung Chen; Kuen-Yu Tsai; Sheng-Yung Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T15:00:24Z	Method and Apparatus For Designing Patterning Systems Considering Patterning Fidelity (基於圖案製作真確度之圖案製作系統設計方法與裝置)	Kuen-Yu Tsai;Sheng-Yung Chen;Hoi-Tou Ng;Shiau-Yi Ma; Kuen-Yu Tsai; Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; KUEN-YU TSAI
臺大學術典藏	2018-09-10T15:00:24Z	Method and Apparatus For Designing Patterning Systems Considering Patterning Fidelity (基於圖案製作真確度之圖案製作系統設計方法與裝置)	Kuen-Yu Tsai;Sheng-Yung Chen;Hoi-Tou Ng;Shiau-Yi Ma; Kuen-Yu Tsai; Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; KUEN-YU TSAI

显示项目 66-90 / 313 (共13页)
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