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Showing items 86-110 of 313  (13 Page(s) Totally)
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Institution Date Title Author
臺大學術典藏 2018-09-10T15:00:24Z Method for Adjusting Status of Particle Beams for Patterning A Substrate and System Using the Same (於一基板上製作圖案時之粒子束狀態調整方法及其系統) Kuen-Yu Tsai;Sheng-Yung Chen; Kuen-Yu Tsai; Sheng-Yung Chen; KUEN-YU TSAI
臺大學術典藏 2018-09-10T15:00:24Z Method for Adjusting Status of Particle Beams for Patterning A Substrate and System Using the Same (於一基板上製作圖案時之粒子束狀態調整方法及其系統) Kuen-Yu Tsai;Sheng-Yung Chen; Kuen-Yu Tsai; Sheng-Yung Chen; KUEN-YU TSAI
臺大學術典藏 2018-09-10T15:00:24Z Method for Adjusting Status of Particle Beams for Patterning A Substrate and System Using the Same (於一基板上製作圖案時之粒子束狀態調整方法及其系統) Kuen-Yu Tsai;Sheng-Yung Chen; Kuen-Yu Tsai; Sheng-Yung Chen; KUEN-YU TSAI
臺大學術典藏 2018-09-10T15:00:24Z Method and Apparatus For Designing Patterning Systems Considering Patterning Fidelity (基於圖案製作真確度之圖案製作系統設計方法與裝置) Kuen-Yu Tsai;Sheng-Yung Chen;Hoi-Tou Ng;Shiau-Yi Ma; Kuen-Yu Tsai; Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; KUEN-YU TSAI
臺大學術典藏 2018-09-10T15:00:24Z Method and Apparatus For Designing Patterning Systems Considering Patterning Fidelity (基於圖案製作真確度之圖案製作系統設計方法與裝置) Kuen-Yu Tsai;Sheng-Yung Chen;Hoi-Tou Ng;Shiau-Yi Ma; Kuen-Yu Tsai; Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; KUEN-YU TSAI
臺大學術典藏 2018-09-10T15:00:24Z Method and Apparatus For Designing Patterning Systems Considering Patterning Fidelity (基於圖案製作真確度之圖案製作系統設計方法與裝置) Kuen-Yu Tsai;Sheng-Yung Chen;Hoi-Tou Ng;Shiau-Yi Ma; Kuen-Yu Tsai; Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; KUEN-YU TSAI
臺大學術典藏 2018-09-10T09:50:34Z Study of etching bias modeling and correction strategies for compensation of patterning process effects Philip C. W. Ng;Kuen-Yu Tsai;Lawrence S. Melvin III; Philip C. W. Ng; Kuen-Yu Tsai; Lawrence S. Melvin III; KUEN-YU TSAI
臺大學術典藏 2018-09-10T09:50:34Z Study of etching bias modeling and correction strategies for compensation of patterning process effects Philip C. W. Ng;Kuen-Yu Tsai;Lawrence S. Melvin III; Philip C. W. Ng; Kuen-Yu Tsai; Lawrence S. Melvin III; KUEN-YU TSAI
臺大學術典藏 2018-09-10T09:50:34Z Study of etching bias modeling and correction strategies for compensation of patterning process effects Philip C. W. Ng;Kuen-Yu Tsai;Lawrence S. Melvin III; Philip C. W. Ng; Kuen-Yu Tsai; Lawrence S. Melvin III; KUEN-YU TSAI
臺大學術典藏 2018-09-10T09:50:34Z Void-based photonic crystal mirror with high-reflectivity and low-dissipation for extreme-ultraviolet radiation Yen-Min Lee;Jia-Han Li;Kuen-Yu Tsai; Yen-Min Lee; Jia-Han Li; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏 2018-09-10T09:50:34Z Void-based photonic crystal mirror with high-reflectivity and low-dissipation for extreme-ultraviolet radiation Yen-Min Lee;Jia-Han Li;Kuen-Yu Tsai; Yen-Min Lee; Jia-Han Li; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏 2018-09-10T09:50:34Z Void-based photonic crystal mirror with high-reflectivity and low-dissipation for extreme-ultraviolet radiation Yen-Min Lee;Jia-Han Li;Kuen-Yu Tsai; Yen-Min Lee; Jia-Han Li; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏 2018-09-10T09:50:34Z Direct-scatterometry-enabled optical-proximity-correction-model calibration Chih-Yu Chen;Philip C. W. Ng;Chun-Hung Liu;Yu-Tian Shen;Kuen-Yu Tsai;Jia-Han Li;Jason J. Shieh;Alek C. Chen; Chih-Yu Chen; Philip C. W. Ng; Chun-Hung Liu; Yu-Tian Shen; Kuen-Yu Tsai; Jia-Han Li; Jason J. Shieh; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏 2018-09-10T09:50:34Z Direct-scatterometry-enabled optical-proximity-correction-model calibration Chih-Yu Chen;Philip C. W. Ng;Chun-Hung Liu;Yu-Tian Shen;Kuen-Yu Tsai;Jia-Han Li;Jason J. Shieh;Alek C. Chen; Chih-Yu Chen; Philip C. W. Ng; Chun-Hung Liu; Yu-Tian Shen; Kuen-Yu Tsai; Jia-Han Li; Jason J. Shieh; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏 2018-09-10T09:50:34Z Direct-scatterometry-enabled optical-proximity-correction-model calibration Chih-Yu Chen;Philip C. W. Ng;Chun-Hung Liu;Yu-Tian Shen;Kuen-Yu Tsai;Jia-Han Li;Jason J. Shieh;Alek C. Chen; Chih-Yu Chen; Philip C. W. Ng; Chun-Hung Liu; Yu-Tian Shen; Kuen-Yu Tsai; Jia-Han Li; Jason J. Shieh; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏 2018-09-10T09:50:34Z Method for Improving Accuracy of Parasitics Extraction Considering Sub-Wavelength Lithography Effects KUEN-YU TSAI; Kuen-Yu Tsai;Wei-Jhih Hsieh;Bo-Sen Chang; Kuen-Yu Tsai; Wei-Jhih Hsieh; Bo-Sen Chang
臺大學術典藏 2018-09-10T09:50:34Z Method for Improving Accuracy of Parasitics Extraction Considering Sub-Wavelength Lithography Effects KUEN-YU TSAI; Kuen-Yu Tsai;Wei-Jhih Hsieh;Bo-Sen Chang; Kuen-Yu Tsai; Wei-Jhih Hsieh; Bo-Sen Chang
臺大學術典藏 2018-09-10T09:50:34Z Method for Improving Accuracy of Parasitics Extraction Considering Sub-Wavelength Lithography Effects KUEN-YU TSAI; Kuen-Yu Tsai;Wei-Jhih Hsieh;Bo-Sen Chang; Kuen-Yu Tsai; Wei-Jhih Hsieh; Bo-Sen Chang
臺大學術典藏 2018-09-10T09:50:34Z Method and Apparatus for Designing Patterning System Based on Patterning Fidelity Kuen-Yu Tsai;Sheng-Yung Chen;Hoi-Tou Ng;Shiau-Yi Ma; Kuen-Yu Tsai; Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; KUEN-YU TSAI
臺大學術典藏 2018-09-10T09:50:34Z Method and Apparatus for Designing Patterning System Based on Patterning Fidelity Kuen-Yu Tsai;Sheng-Yung Chen;Hoi-Tou Ng;Shiau-Yi Ma; Kuen-Yu Tsai; Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; KUEN-YU TSAI
臺大學術典藏 2018-09-10T09:50:34Z Method and Apparatus for Designing Patterning System Based on Patterning Fidelity Kuen-Yu Tsai;Sheng-Yung Chen;Hoi-Tou Ng;Shiau-Yi Ma; Kuen-Yu Tsai; Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; KUEN-YU TSAI
臺大學術典藏 2018-09-10T09:50:34Z Electron Beam Exposure Apparatus, Electron Beam Generation Apparatus and Exposure Method (電子束曝光裝置、電子束產生裝置及曝光方法) Kuen-Yu Tsai; KUEN-YU TSAI; Yu-Hsuan Kuo;Ming-Shing Su;Yi-Chang Lu;Kuen-Yu Tsai; Yu-Hsuan Kuo; Ming-Shing Su; Yi-Chang Lu
臺大學術典藏 2018-09-10T09:50:34Z Electron Beam Exposure Apparatus, Electron Beam Generation Apparatus and Exposure Method (電子束曝光裝置、電子束產生裝置及曝光方法) Kuen-Yu Tsai; KUEN-YU TSAI; Yu-Hsuan Kuo;Ming-Shing Su;Yi-Chang Lu;Kuen-Yu Tsai; Yu-Hsuan Kuo; Ming-Shing Su; Yi-Chang Lu
臺大學術典藏 2018-09-10T09:50:34Z Electron Beam Exposure Apparatus, Electron Beam Generation Apparatus and Exposure Method (電子束曝光裝置、電子束產生裝置及曝光方法) Kuen-Yu Tsai; KUEN-YU TSAI; Yu-Hsuan Kuo;Ming-Shing Su;Yi-Chang Lu;Kuen-Yu Tsai; Yu-Hsuan Kuo; Ming-Shing Su; Yi-Chang Lu
臺大學術典藏 2018-09-10T09:50:34Z Method for Compensating Proximity Effects of Particle Beam Lithography Processes Kuen-Yu Tsai;Chun-Hung Liu;Chooi-Wan Ng;Pei-Lin Tien; Kuen-Yu Tsai; Chun-Hung Liu; Chooi-Wan Ng; Pei-Lin Tien; KUEN-YU TSAI

Showing items 86-110 of 313  (13 Page(s) Totally)
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