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Institution Date Title Author
國立交通大學 2019-04-02T05:58:26Z Effect of Cu-Ion Concentration in Concentrated H3PO4 Electrolyte on Cu Electrochemical Mechanical Planarization Kung, Te-Ming; Liu, Chuan-Pu; Chang, Shih-Chieh; Chen, Kei-Wei; Wang, Ying-Lang
國立交通大學 2014-12-12T02:26:51Z 頭相關轉換函數的量測和重建三度空間聲音的模擬 龔德明; Kung Te-Ming; 杭學鳴; Hsueh-Ming Hang
國立交通大學 2014-12-08T15:21:51Z Effect of Electric Potential and Mechanical Force on Copper Electro-Chemical Mechanical Planarization Chen, Sheng-Wen; Kung, Te-Ming; Liu, Chuan-Pu; Chang, Shih-Chieh; Cheng, Yi-Lung; Wang, Ying-Lang
國立交通大學 2014-12-08T15:07:51Z Effect of Cu-Ion Concentration in Concentrated H(3)PO(4) Electrolyte on Cu Electrochemical Mechanical Planarization Kung, Te-Ming; Liu, Chuan-Pu; Chang, Shih-Chieh; Chen, Kei-Wei; Wang, Ying-Lang
國立交通大學 2014-12-08T15:07:06Z Microstructure and Formation of Copper Oxide in the Cu Electro-Polishing Process Kung, Te-Ming; Huang, Michael Rong-Shie; Tsao, Jung-Chih; Liu, Chuan-Pu; Wang, Ying-Lang
國立成功大學 2010-07-06 銅電化學機械研磨形成機制在奈米半導體積體電路製程之研究 孔德明; Kung, Te-Ming
國立成功大學 2010-07-06 銅電化學機械研磨形成機制在奈米半導體積體電路製程之研究 孔德明; Kung, Te-Ming

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