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Institution	Date	Title	Author
國立交通大學	2014-12-08T15:49:00Z	Rugged surface polycrystalline silicon film formed by rapid thermal chemical vapor deposition for dynamic random access memory stacked capacitor application	Lin, M; Chang, CY; Huang, TY; Kuo, UJ

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	English \| 正體中文 \| 简体中文 \| 總筆數 :2822924
	造訪人次 : 29999229 線上人數 : 1136 教育部委託研究計畫計畫執行:國立臺灣大學圖書館