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Showing items 1-3 of 3 (1 Page(s) Totally)
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| 臺大學術典藏 |
2019-12-27T07:49:46Z |
Effect of Al incorporation in the thermal stability of atomic-layer- deposited HfO2 for gate dielectric applications
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Chiou, Y.-K.; Chang, C.-H.; Wang, C.-C.; Lee, K.-Y.; Wu, T.-B.; Kwo, R.; Hong, M.; MINGHWEI HONG |
| 臺大學術典藏 |
2019-12-27T07:49:45Z |
A novel approach of using a MBE template for ALD growth of high-庥 dielectrics
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Lee, K.Y.; Lee, W.C.; Huang, M.L.; Chang, C.H.; Lee, Y.J.; Chiu, Y.K.; Wu, T.B.; Hong, M.; Kwo, R.; MINGHWEI HONG |
| 臺大學術典藏 |
2018-09-10T06:28:12Z |
A novel approach of using a MBE template for ALD growth of high-$κ$ dielectrics
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Lee, KY; Lee, WC; Huang, ML; Chang, CH; Lee, YJ; Chiu, YK; Wu, TB; Hong, M; Kwo, R; MINGHWEI HONG |
Showing items 1-3 of 3 (1 Page(s) Totally)
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