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Taiwan Academic Institutional Repository >
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"lai fu der"
Showing items 11-20 of 24 (3 Page(s) Totally)
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| 國立高雄第一科技大學 |
2007.11 |
Proposed single layer composite film used as high transmission phase shifting masks for the 32, 45, and 65 nm technology nodes
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Lai, Fu-Der;Huang, Jian Long |
| 國立高雄第一科技大學 |
2007.1 |
Application of an alternating phase-shifting mask design method to near-field photolithography for fabricating more than 2 GHz SAW devices
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Lai, Fu-Der;Hua, Jui-Ming;Huang, Hao-Min |
| 國立高雄第一科技大學 |
2007.08 |
The GHz surface acoustic wave filters fabricated by using an alternating phase-shifting mask design method
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Lai, Fu-Der;Hua, Jui-Ming;H.M.Huang |
| 國立高雄第一科技大學 |
2006/04/28 |
光學微影用之高穿透衰減式相位偏移光罩(三)
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Lai, Fu-Der; 賴富德 |
| 國立高雄第一科技大學 |
2006.4-9 |
Fabrication of high frequency and low-cost surface-acoustic wave filters using near field phase shift photolithography
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Lai, Fu-Der;H.M.Huang |
| 國立高雄第一科技大學 |
2006.02 |
ArF-line high transmittance attenuated phase shift mask blanks using amorphous Al2O3–ZrO2–SiO2 composite thin films for the 65-, 45- and 32-nm technology nodes
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Lai, Fu-Der;Hu, Jui-Ming;Huang, C.Y.;Ko, Fu-Hsiang;Wang, L.A.;Lin, C.H.;Chang, C.M.;Lee, S.;Chern, Gia-Wei |
| 國立臺灣大學 |
2006 |
ArF-line high transmittance attenuated phase shift mask blanks using amorphous Al2O3–ZrO2–SiO2 composite thin films for the 65-, 45- and 32-nm technology nodes
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Lai, Fu-Der; Hua, Jui-Ming; Huang, C.Y.; Ko, Fu-Hsiang; Wang, L.A.; Lin, C.H.; Chang, C.M.; Lee, S.; Chern, Gia-Wei |
| 國立高雄第一科技大學 |
2005/10/06 |
High-transmittance attenuated phase-shift mask blank
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Lai, Fu-Der; 賴富德 |
| 國立高雄第一科技大學 |
2005/05/27 |
光學微影用之高穿透衰減式相位偏移光罩
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Lai, Fu-Der; 賴富德 |
| 國立高雄第一科技大學 |
2005.11 |
Optical simulation, optimized design and fabrication of (ZrO2)x–(Al2O3)1-x composite films with thin inserted TiO2 layers for ArF-line high transmission attenuated phase shift mask blank applications
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Lai, Fu-Der |
Showing items 11-20 of 24 (3 Page(s) Totally)
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